Linearly modulated multi-focal diffractive lens for multi-sheet excitation of flow driven samples in a light-sheet fluorescence microscope. - In: Journal of the European Optical Society, ISSN 1990-2573, Bd. 19 (2023), 1, 26, S. 1-8
Light sheet fluorescence microscope with single light sheet illumination enables rapid 3D imaging of living cells. In this paper we show the design, fabrication and characterization of a diffractive optical element producing several light sheets along a 45˚ inclined tube. The element, which is based on a multi-focal diffractive lens and a linear grating, generates five thin light sheets with equal intensities when combined with a refractive cylindrical lens. The generated uniform light sheets can be applied for the scanning of samples in tubes enabling flow-driven 3-dimensional imaging.
Micro-diffractive optical element arrays for beam shaping. - In: EOS Annual Meeting (EOSAM 2022), Bd. 266 (2022), 13013, S. 1-2
We describe the design of Fourier type array generators and beam shapers as periodic configurations of refractive-diffractive optical elements in microscale to provide specific beam shaping and imaging functionaliies. We investigate how the addition of micro-nanostructures to regular microstructure arrays enables new degrees of freedom for the design of micro-optical systems, in combination with adapted fabrication techniques yields a better optical performance and leads to enhancement of the array concept, uniformity and efficiency.
Approaches for the RCWA-based non-destructive characterization of subwavelength-structured gratings. - In: EOS Annual Meeting (EOSAM 2022), (2022), 05012, S. 1-2
Nano-structuring enables us to add additional degrees of freedom to the design of optical elements. Especially the possibility of controlling the polarization is of great interest in the field of nano-structured optics. For being able to exploit the whole range of form-birefringent phase shifts, the aspect ratios of the resulting element are typically much higher than the aspect ratios of conventional diffractive optical elements (DOEs), which does not only pose a challenge on fabrication but also on characterization. We evaluate several well-established approaches for the nondestructive characterization, including Müller-Matrix-Ellipsometry, measurement of the diffraction efficiencies, scattering measurements and calibration with rigorous coupled-wave modelling. The goal is to understand the challenges with all these techniques and combine them to a reliable method for structural reconnaisance of high aspect ratio nanostructures.
Mikrostrukturierte Spezialgläser für mikromechanische und mikrooptische Anwendungen. - In: Mikrosystemtechnik, (2022), S. 35-38
2.5D etching of silicon dioxide for optical and photonic structures. - In: 2022 IEEE Photonics Conference (IPC), (2022), insges. 2 S.
We investigated the ability to control the sidewall-angle for the etching of SiO2 by tuning process parameters. We found a strong correlation between sidewall-angle and temperature, enabling control of the sidewall-angle from 60˚-90˚, and found a curved etch profile which was named quasi-isotropic.
Manufacturing of nanostructures in silicon carbide using UV-nanoimprint lithography in combination with fluorine-based plasma etching. - In: 2022 IEEE Photonics Conference (IPC), (2022), insges. 2 S.
The combination of a multi-layer resist system for soft UV-NIL with a fluorine-based plasma etching is investigated to elaborate homogeneously distributed nanosized features in silicon carbide. Initial studies substantiate that this approach can be a timesaving and cost-effective alternative to generate nanostructures in SiC.
Simulation model and dimensioning of a photoacoustic sensor for the detection of radiation-induced pressure surges. - In: MikroSystemTechnik, (2021), S. 523-526
Whispering Gallery Resonators with diffractive coupling elements. - In: MikroSystemTechnik, (2021), S. 230-233
Vergleich zur Plasmastrukturierbarkeit von Materialien mit sehr geringer thermischer Ausdehnung. - In: MikroSystemTechnik, (2021), S. 51-54
Efficient and cost-effective manufacturing of nanostructures with high aspect ratios using Soft UV-Nanoimprint Lithography with bi- and trilayer resist systems. - In: MikroSystemTechnik, (2021), S. 35-38