In addition to combining the FE-SPL technique with NMPM, the most important goal of the 2nd generation is to ensure stable long-term emission of the tips, to further elucidate the relationship between tip geometry and FE-SPL, and to explore technological strategies for controlled, large-area and reproducible nanostructuring. FE-SPL is suitable to be integrated into technological process flows to reproducibly generate functional structures and devices. Primarily, the focus is currently on 2D semiconductor materials (e.g. MoS2, graphene flakes) and thus the fabrication of the corresponding nanoelectronic devices from 2D materials.
Project leader: Prof. Strehle, Dr. Zöllner, Prof. Gutschmidt
The main goal of the 2nd generation is to transfer scanning probe lithography (SPL) from previous small-area (10 μm x 10 μm) AFM systems to the NFM-100, i.e., to an area 78 million times larger (7800 mm²). The great potential of the technique based on metrologically traceable laser interferometric nanometrology will be demonstrated in this project. An important goal is to work out conditions and strategies under which the fabrication of sub-10 nm structures on the enormous area is temporally (economically) reasonable. The relationships between processing length, scanning speed, reproducibility, precision and tip wear, including the use of special cantilever materials, are to be intensively investigated. In particular, it will be demonstrated that the combination of nanoscale SPL and high-resolution interferometric AFM metrology has the potential for new innovative nanofabrication techniques and their implementation in corresponding -machines. For the first time, metrologically traceable nanofabrication processes will be demonstrated for reproducible large-scale fabrication, e.g. of new quantum structures and complex nanoelectronic circuits.
Project leader: Prof. Manske, Dr. Ortlepp, Prof. Strehle
In subproject A3, the second-generation PhD student is to devote himself to new design fundamentals for the realization of linear positioning systems with previously unattainable resolution in the picometer range. This is intended to create the prerequisites for the next generations of nanopositioning and fabrication systems. The solution approach is based on the use of compliant mechanisms in combination with electrostatic drive systems. In order to meet the very high demands on the mechanical and electrical properties, the realization is to take place in the form of a planar, monolithic structure, which is micro-engineered on a silicon basis. This will ensure backlash- and friction-free operation with maximum repeatability. A successful and target-oriented application of compliant mechanisms requires the understanding and prediction of their behavior. Therefore it is necessary to describe the static and dynamic behavior of compliant mechanisms in a model-based way. Accurate as well as fast state-based behavior prediction is of utmost importance for control. The fundamentals are achieved by the development and application of new, preferably model-based analytical but also numerical and experimental methods.
Project leader: Prof. Theska, Prof. Zentner