Technische Universität Ilmenau

Micro/Nanofabrication Laboratory - Modultafeln of TU Ilmenau

The Modultafeln have a pure informational character. The legally binding information can be found in the corresponding Studienplan and Modulhandbuch, which are served on the pages of the course offers. Please also pay attention to this legal advice (german only). Information on place and time of the actual lectures is served in the Vorlesungsverzeichnis.

subject properties subject number 101728 - common information
subject number101728
ID of group2142 (Nanotechnology Group)
subject leaderProf. Dr. Heiko Jacobs
languageEnglish (Deutsch)
term Sommersemester
previous knowledge and experience

Physics, Chemistry, Materials, and Electronics at the Bachelor level

learning outcome

The participant obtains hands-on experience in the fabrication of micro and nanotechnological devices.
The majority of the experiments will be carried out within am educational laboratory setting which houses the required equipment.
The student get familiar with the equipment and the process flow commonly used in the fabrication of micro and nanotechnological devices.
Learning Goals:
The participant gains basic skills on the technological steps used in the manufacturing of modern micro/nanofabricated devices which integrate electronic and sensing elements in a small form factor integrated system.
The participant gets to know the equipment, measuring techniques, and principles of operation.
The lab-course mimics the main steps of semiconductor processing as it is used in the industry today and provide an important link to the theory which was provided in the lectures.
The lab-course provides an entry to the fabrication and processing of modern semiconductor devices which includes the fields of MEMS, NEMS, Sensors, Electronics, Photovoltaics, Bioelectronics, Nanoelectronics to name the most relevant today.


Lab course on selected problems:
You will apply the technology to fabricate a micro mechanical pressure sensor based on a Si membrane integrated on a Si - chip.
You will study the influence of technological processing parameters on device properties.
The processing you will carry out includes: Wafer cleaning, Thermal Oxidation, Sputtering and Evaporation, Dry Etching, Spin Coating, and Electrical contact formation
Characterisation methods include: Optical Microscopy, Ellipsometric measurements, and Electrical characterisation/probe station.
You will also get a brief introduction to the operation of vacuum pumps and vacuum measurement equipment commonly used in the industry.

media of instruction

Lab course instruction manual

literature / references

Menz, W.; Mohr, J.; Paul, O.: Mikrosystemtechnik für Ingenieure. – 3., vollst. überarb. und erw. Aufl. –Weinheim: Wiley-VCH, 2005

evaluation of teaching
Details in major Master Micro- and Nanotechnologies 2016
subject nameMicro/Nanofabrication Laboratory
examination number2100558
credit points3
on-campus program (h)22
self-study (h)68
examoral pass-fail certificate, 30 minutes
details of the certificate

lab attestations and lab reports

maximum number of participants25