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Prof. Ivo W. Rangelow

Teamleiter

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Ihre Position

INHALTE

Patente

2018

2018

2017

2017

2016

2016

2015

2015

Vorrichtung und Verfahren zur ortsaufgelösten Platzierung von Nanoclustern
B. Burchard, I.W. Rangelow, J. Meijer and H. Wiggers
DE 10 2004 032 451 B4 2015.11.19

2014

2014

"MICROSCOPE PROBE AND METHOD FOR USE OF SAME" US 20140338074
V. Aksyuk (US), K. Srinivasan (US), H. Miao (US), I.W. Rangelow and T. Michels (DE)

 

 

2013

2013

2012

2012

Compact Ion Source Neutron Generator
Erfinder: Th. Schenkel (U.S.A), A. Persaud (GE), R. Kapadia (INDIA), A. Javey (U.S.A), C. Chang-Hasnain (U.S.A), I.W. Rangelow (DE), J. Kwan (U.S.A)
Publication info: U.S. patent application serial no. 13/451,475 filed on 19-Apr-2012

Microsystem component with a device deformable under the effect of temperature changes
Erfinder: Rangelow, Ivo W. (DE); Ivanov, Tzvetan (DE); Ivanova, Katerina (DE)
Publication info: US 8. 128, 282 (B2)

Method for Forming a Through Via in a Semiconductor Element and Semiconductor Element Comprising the Same
Erfinder: Kolb, Stefan (DE); Winkler Bernhard (DE); Rangelow, Ivo W. (DE); Blom, Hans-Olof (SE); Bjurstroem Johan (SE)
Publication info: US2012074570 (A1)

Device for scanning surfaces using atomic force microscopy, utilized in sensor for e.g. biological detection of various mediums, has static and dynamic actuators electrically connected with cantilever
Erfinder: Frank, Andreas (DE); Zoellner, Jens-Peter (DE); Rangelow, Ivo W. (DE)
Publication info: DE102010026703 (A1)

2011

2011

APPARATUS AND METHOD FOR INVESTIGATING SURFACE PROPERTIES OF DIFFERENT MATERIALS
Erfinder: Ivo W. Rangelow, Tzv. Ivanov
Publication info: US2011047662 (A1), 2011-02-24

DEVICE AND METHOD FOR AN ATOMIC FORCE MICROSKOPE FOR THE STUDY AND MODIFICATION OF SURFACE PROPERTIES
Erfinder: S. Kubsky, D. Olynick, Ivo W. Rangelow
Publication info: US2011055985 (A1), 2011-03-03

A METHOD OF ALIGNING A FIRST ARTICLE RELATIVE TO A SECOND ARTICLE AND AN APPARATUS FOR ALIGNING A FIRST ARTICLE RELATIVE TO SECOND ARTICLE
Erfinder: Ivo W. Rangelow
Publication info: US7946029 (B2), 2011-05-24

2010

2010

Process and structure for realization of trough vias in comination with integrated processes
Erfinder: J. Bjurstrom, H.-O. Blom, St. Kolb, I. W. Rangelow, B. Winkler.
E-Nummer: 2008E52159 DE  25.11.2008
E-Nummer: 2010E50953 DE  13.07.2010

DEVICE AND METHOD FOR THE MICROMECHANICAL POSITIONING AND HANDLING OF AN OBJECT
Erfinder: Ivo W. Rangelow
Publication info: US2010017921 (A1), 2010-01-21

METHOD FOR PRODUCING NANO-WIRES
Erfinder: P. Grabiec (PL), M. Zaborowski (PL), Ivo W. Rangelow (DE)
Publication info: PL359839 (A1), 2004-11-02; PL204689 (B1), 2010-02-26

Process for producing a carbon film on a substrate
Erfinder: P. Hrkut, P. Hudek, Ivo W. Rangelow
Publication info: US6136160 (A), 2000-10-24

2009

2009

  • Vorrichtung und Verfahren zur Untersuchung von Oberflächeneigenschaften verschiedenartiger Materialien
    Erfinder: I.W. Rangelow, Tzv. Ivanov, B. Volland, M. Woszczyna, T. Gotszalk, J. Mielczarski , Y. Sarov
    Publication info: DE102007031112 (A1), 2009.01.02
    WO 2009/000885 A1

  • MICROSYSTEM COMPONENT WITH A DEVICE DEFORMABLE UNDER THE EFFECT OF TEMPERATURE CHANGES
    Erfinder: Ivo W. Rangelow, Tzv. Ivanov
    Publication info: US2009213900 (A1), 2009-08-27

  • MICROMECHANICAL SENSOR SWITCH FOR THRESHOLD-RELATED SWITCHING OF ELECTRICAL CONTACTS
    Erfinder: Ivo W. Rangelow, G. Gerlach
    Publication info: WO20099077446 (A1), 2009-06-25

  • CIRCUIT ARRANGEMENT FOR PARALLEL CANTILEVER ARRAYS FOR THE SCANNING FORCE MICROSCOPY
    Erfinder: Ivo W. Rangelow, Tzv. Ivanov
    Publication info: WO2009040236 (A1), 2009-04-02

2008

2008

  • Vorrichtung und Verfahren zum mikromechanischen Positionieren und Manipulieren eines Objektes
    Erfinder: Univ.-Prof. Dr.-Ing. habil. Ivo W. Rangelow, Dr.-Ing. Stefan Klett, Dipl.-Ing. Elshad Guliyev, Dr.rer.nat. Tzvetan Ivanov und Dr.rer.nat. Burkhard Volland
    Publication info: DE102007005293 (A1), 2008-08-07
  • FIELD EFFECT TRANSISTOR SENSOR
    Erfinder: Klaus Edinger (US), Ivo W. Rangelow (DE), Piotr Grabiec (PL), John Melngailis (US) United States Patent, Patent No.: US 7,335,942 B2
    Publication info: US2005062116 (A1), 2005-03-21; US7335942 (B2), 2008-02-26
  • High resolution scanning thermal probe and method of manufacturing thereof
    Erfinder: Klaus Edinger (US), Ivo W. Rangelow (DE)
    Publication info: US Patent 6518872; US6518872 (B1), 2003-02-11

  • METHOD FOR MANUFACTURING PUNCH FOR IMPRESSION NANOLITHOGRAPHY
    Erfinder: P. Grabiec (PL), Ivo W. Rangelow (DE)
    Publication info: PL362344 (A1), 2005-04-04; PL199400 (B1), 2008-09-30

2007

2007

  • Mikrosystemtechnisches Bauelement mit einer unter dem Einfluss von Temperaturänderungen verformbaren Einrichtung
    Erfinder: Ivo W. Rangelow
    Patent Nr. 06705760.4-2217-DE2006000016
  • METHOD FOR THE ELECTROSTATIC STRUCTURING OF A SUBSTRATE SURFACE AND RASTER PROBE
    Erfinder: Ivo W. Rangelow (DE), R. Pedrak (PL)
    Publication info: EP1759247 (A2), 2007-03-07

  • ETCHING RADICAL CONTROLLED GAS CHOPPED DEEP REACTIVE ION ETCHING
    Erfinder: Olynick Deirdre (US); Ivo W. Rangelow (DE); Chao Wellun (US)
    Publication info: US2007015371 (A1), 2007-01-18

  • SHADOW MASK AND METHOD FOR PRODUCING A SHADOW MASK
    Erfinder: J. Meijer, A. Stephan, Ivo W. Rangelow
    Publication info: US2004219465 (A1), 2004-11-04; US7183043 (B2), 2007-02-27

2006

2006

  • VERFAHREN ZUR LAGEGENAUEN POSITIONIERUNG EINZELNER TEILCHEN
    IN ODER AUF EINER SUBSTRATOBERFLÄCHE UND ANWENDUNG EINER DAZU
    GEEIGNETEN VORRICHTUNG

    Erfinder: I.W. Rangelow, J. Meijer, Th. Schenkel
    Patent Nr.: 103 47 969; IPC B82B 3/00 (2006.01)

  • DEVICE AND METHOD OF POSITIONALLY ACCURATE IMPLANTATION OF
    INDIVIDUAL PARTICLES IN A SUBSTRATE SURFACE

    Inventors: Th. Schenkel, I.W. Rangelow, J. Meijer
    Publication info: US2005077486 (A1), 2005-04-14; US7126139 (B2), 2006-10-24

  • A MIKROSYSTEM COMPONENT WITH A DEVICE DEFORMABLE UNDER THE
    INFLUENCE OF TEMPERATURE CHANGES

    Inventors: K. Ivanova, Tzv. Ivanov, I.W. Rangelow
    Publication Info: DE102005001116 - 2006-07-20

  • SUBSTRATE LOADING APPARATUS
    Inventors: J.W. Roger, I.W. Rangelow, L. Andrew
    Publication Info: DE60026476D -2006-05-04

  • A METHOD OF ALIGNING A FIRST ARTICLE RELATIVE TO A SECOND
    ARTICLE AND AN APPARATUS FOR ALIGNING A FIRST ARTICLE RELATIVE TO
    A SECOND ARTICLE

    Inventor: I.W. Rangelow
    Publication Info: WO2006005619 -2006-01-19

  • ION OR OPTICAL DEVICE FOR PRECISION PLACING AND MANIPULATION OF
    NANOSCOPIC OBJECTS SUCH AS AN AFM FOR QUANTUM COMPUTERS

    Inventors: B. Burchard, M. Burchard, I.W. Rangelow
    Publication Info: DE102004031250 -2006-01-19

  • ASSEMBLY TO CREATIVE NANOCLUSTERS COMBINES POSITIONING STAGE
    BASED ON A DRILLED ATOMIC FORCE MICROSCOPE TIP AND THE NANOOPTICAL SOURCE

    Inventors: B. Burchard, I.W. Rangelow
    Publication Info: DE102004032451 (A1), 2006-01-26

  • ETCHING RADICAL CONTROLLED GAS CHOPPED DEEP REACTIVE ION
    ETCHING

    Inventors: D. Olynick, I. W. Rangelow, W. Chao
    Publication Info: U.S. patent application serial no. 11/421,958, filed on 2006-06- 02

  • DEVICE AND METHOD FOR MASKLESS AFM MICROLITHOGRAPHY
    Inventor: Ivo W. Rangelow, Tzv. Ivanov
    Publication info: US2005225011 (A1), 2005-10-13; US7141808 (B2), 2006-11-28

  • TECHNIQUE FOR NANO-LINES FABRICATION
    Inventor: Ivo W. Rangelow (DE), P. Grabiec (PL)
    Publication info: EP1473760 (A2), 2004-11-03; EP1473760 (A3), 2006-03-29

  • MEASURING SYSTEM FOR THE COMBINED SCANNING AND ANALYSIS OF MICROTECHNICAL COMPONENTS COMPRISING ELECTRICAL CONTACTS
    Inventor: L. M. Eng, Ivo W. Rangelow
    Publication info: US2006238206 (A1), 2006-10-26

  • DEVICE FOR ACCURATELY POSITIONING IONDIVIDUAL PARTICLES ON SUBSTRATE SURFACE, E.G. FOR QUANTUM COMPUTER, HAS APERTURE AT TIP OF END PORTION OF CANTILEVER BEAM
    Inventor: Ivo W. Rangelow, J. Meijer
    Publication info: DE10347969 (A1), 2005-05-19; DE10347969 (B4), 2006-08-31

2005

2005

  • Device and method for maskless afm microlithography
    Inventors: I.W.Rangelow , Tzv. Ivanov
    Publication Info: US2005225011 – 2005-10-13
  • A method for the electrostatic structuring of a substrate surface and raster probe
    lithography method

    Inventors: I.W.Rangelow(DE),R. Pedrak(PL)
    Applicant: UNIV KASSEL (DE); Publication info: WO2005088399 - 2005-09-22
  • Device and method of positionally accurate implantation of individual particles in a
    substrate surface

    Inventors: Th. Schenkel (US), I.W. Rangelow (DE)
    Applicant: UNIV KASSEL (DE); Publication info: US2005077486 - 2005-04-14
  • Device for accurately positioning individual particles on substrate surface, e.g. for
    quantum computer, has aperture at tip of end portion of cantilever beam

    Inventors: I.W. Rangelow, J. Meijer
    Applicant: UNIV KASSEL (DE) UNIV CALIFORNIA (US) PC: B82B3/00; G06N1/00;
    B82B3/00+2; Publication info: DE10347969 - 2005-05-19
  • Method for manufacturing punch for impression nanolithography
    Inventors: P. Grabiec (PL), I.W. Rangelow (DE)
    Applicant: INST TECH ELEKTRONOWEJ (PL)
    Publication Info: PL362344 -2005-04-04
  • MICROMECHANICALLY ACTUATABLE OPTOELECTRONIC COMPONENT
    Inventor: H. Hillmer, J. Daleiden, Ivo W. Rangelow
    Publication info: WO2004096695 (A2), 2004-11-11; WO200496695 (A3), 2005-03-24

2004

2004

  • Technique for nano-lines fabrication
    Inventors: I.W. Rangelow (DE), P.Grabiec (PL)
    Applicant: INST TECH ELEKTRONOWEJ (PL) EC: H01L21/027B6; H01L21/033F4;
    (+3) IPC: H01L21/027; H01L21/033; H01L21/308 (+3)
    Publication Info: EP1473760 - 2004-11-03

  • Measuring system for the combined scanning and analysis of microtechnical
    components comprising electrical contacts

    Inventors: M. Eng Lukas (DE), I.W. Rangelow (DE)
    Applicant: UNIV KASSEL (DE); UNIV DRESDEN TECH (DE); (+2) C: B81B1/00;
    B81B3/00; G12B21/02 (+9)
    Publication Info: WO2004075204 – 2004-09-02

  • Shadow mask and method for producing a shadow mask
    Inventors: J. Meijer (DE), A. Stephan (DE), I.W. Rangelow
    Applicant: IPC: G03F1/16; G03F1/14; G03F1/16 (+3)
    Publication Info: US2004219465 - 2004-11-04

  • Method for producing nano-wires
    Inventors: P. Grabiec (PL); I.W. Rangelow (DE,) M. Zaborawski (PL)
    Applicant: INST TECH ELEKTRONOWEJ (PL)
    Publication Info: PL359839 - 2004-11-02

  • Deutsche Patentanmeldung Juli 2004: „Vorrichtung zur lagegenauen Platzierung und Manipulation nanoskopischer Objekte“
    Inventors: B. Burchard, J. Meijer, I.W. Rangelow, M.Burchard, assignee: Diatronic
    GmbH

  • MICROPROBE
    Inventor: P. Grabiec (PL), Ivo W. Rangelow
    Publication info: PL328752 (A1), 200-03-27; PL187366 (B1), 2004-06-30

  • METHOD OF A FIELD-EFFECT MICRO-EMITTER AND MATRIX OF MICRO-EMITTERS FORMED OF EMITTERS OBTAINED THEREBY
    Inventor: P. Grabiec (PL), Ivo W. Rangelow
    Publication info: PL328751 (A1), 200-03-27; PL187444 (B1), 2004-07-30

2003

2003

  • High resolution scanning thermal probe and method of manufacturing thereof
    Inventor: K. Edinger (US), I.W. Rangelow (DE)
    Applicant: UNIV MARYLAND (US) IPC: G12B21/02; G12B21/00; (IPC1-7) H01L3/04
    Publication info: US6518872(B1), 2003-02-11

  • Field effect transistor sensor for a screen probe microscope
    Inventor: K. Edinger, I.W. Rangelow
    Applicant: UNI KASSEL IPC: G01N27/82; G01R1/07; G01R33/06 (+6)
    Publication info: AU2002358004 -2003-05-26

  • VORRICHTUNG UND VERFAHREN ZUR MASKENLOSEN MIKROLITHOGRAPHIE
    Inventor: Ivo W. Rangelow, Tzv. Ivanov
    Publication info: DE10303040 (A1), 2003-10-02

  • METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS
    Inventor: Ivo W. Rangelow, Tzv. Ivanov
    Publication info: WO02053489 (A2), 2002-07-11; WO02053489 (A3), 2003-08-07

2002

2002

  • Method for producing microstructured components
    Inventors: I.W. Rangelow (DE), Tzv. Ivanov (BG)
    Applicant: m SEN MIKROSYSTEMTECHNIK GMBH (DE); UNIV KASSEL (DE);
    G12B21/02; H01J9/02 (+4); Publication info: WO02053489 - 2002-07-11
  • Mask for ion beams used during structuring substrates consists of a silicon wafer with a perforated pattern and a metal coating on the side facing the ion beams for stopping ion beams and deflecting heat
    Inventors: M. BURCHARD (DE), J. Meijer(DE), I.W. Rangelow
    Applicant: RUBITEC GES FUER INNOVATION UN (DE); UNIV KASSEL
    IPC: B81C1/00; G03F1/16; B81C1/00 (+6) (DE) B81C1/00F2D4M6; G03F1/16
    Publication Info: DE10039645 (A1), 2002-03-28
  • Structuring device for processing a substrate
    Inventors: I. Shvets (IE), I.W. Rangelow (DE)
    Applicant: TRINITY COLLEGE DUBLIN (IE); UNI KASSEL (DE); (+1)
    IPC: H01L21/302; B81C1/00; C23C16/04 (+13)
    Publication Info: US6419752(B1), 2002-07-16
  • SUBSTRATE LOADING APPARATUS
    Inventor: B. Volland, I. W. Rangelow
    Publication info: CA2364995 (A1), 2002-06-21

2000

2000

  • International patent submitted Aug. 2000:
    "Hochauflösende Materialstrukturierung mittels Partikelstrahlung hoher
    Leistungsdichte unter Verwendung von freitragenden Lochmasken"
    [ lateral structuring of materials with particle beams of high power densities using free standing stencil masks ]

    Inventors: I.W.Rangelow, U.Weidenmüller, J.Meijer, A.Stephan, assignee: Universität Kassel.
  • Process for producing a carbon film on a substrate
    Inventors: P. Hrkut (SK), P. Hudek (SK), I.W. Rangelow (DE)
    Applicant: IMS IONEN MIKROFAB SYST (AT); UNIV KASSEL (DE); (+1),
    IPC: C23C14/34; C23C14/06; C23C14/35 EC: C23C14/06B; C23C14/35
    Publication Info: US6136160 – 2000-10-24, (+6)
  • Method for the purpose of producing a stencil mask
    Inventors: E. Hammel (NL), I.W. Rangelow (DE), H. Loeschner (AT)
    Applicant: IMS IONEN MIKROFAB SYST (AT) IPC: G03F1/16; H01L21/027;
    G03F1/16
    Publication Info: US6156217 -2000-12-05
  • Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
    Inventors: R. Leuschner(DE), I.W. Rangelow(DE)
    Applicant: SIEMENS AG (DE); UNIV KASSEL (DE) IPC: B81C1/00;(+8)
    H01L21/312; H01L21/314
    Publication Info: DE19844418 - 2000-04-06
  • MICROPROBE
    Inventors: P. Grabiec (PL), I.W. Rangelow (DE)
    Applicant : INST TECH ELEKTRONOWEJ (PL)
    Publication Info: PL328752 – 2000-03-27
  • A method of a field-effect micro-emitter and matrix of micro-emitters formed of emitters obtained thereby
    Inventors: P. Grabiec (PL) I.W. Rangelow (DE)
    Applicant: INST TECH, ELEKTRONOWEJ (PL)
    Publication Info: PL328751 - 2000-03-27
  • Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
    Inventors: R. Leuschner, Ivo W. Rangelow
    Publication info: DE19844418 (A1), 2000-04-28

1999

1999

  • CANTILEVER WITH WHISKER-GROWN PROBE AND METHOD FOR
    PRODUCING THEREOF

    Inventors: E .Givargizov (RU), L. Obolenskaya (RU), A. Stepanova (RU), E. Mashkova
    (RU), M. Givargizov (RU), I.W. Rangelow (DE)

    International Application No.: PCT/RU1999/000155
    IPC: B81B 1/00 (2006.01), C30B 11/00 (2006.01), C30B 11/12 (2006.01), G12B 21/02
    (2006.01)
    Pub. No.: WO/1999/058925 – 18.11.1999

1997

1997

  • Silicon membrane and method of making same
    Inventors: H. Loeschner (AT), Shi Feng (DE), I.W. Rangelow (DE)
    Applicant: IMS IONEN MIKROFAB, EC: C25F3/12; G03F1/14K, SYST (AT); UNI
    KASSEL (DE) IPC: G03F7/38; C25F3/12; G03F1/14 (+13)
    Publication Info: US5672449 - 1997-09-30

1981

1981

  • No English title available
    Inventors: I.W. Rangelow; Z.Radzimski
    Applicant: POLITECHNIKA WROCLAWSKA (PL)
    Publication Info: PL224669 - 1981-05-08

  • SLIT EXTRACTION ASSEMBLY OF ION SOURCE
    Inventor: Ivo W. Rangelow, Z. Radzimski
    Publication info: PL224669 (A2), 1981-05-08; PL119694 (B2), 1982-01-30