Patente
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2018
2018
2017
2017
2016
2016
2015
2015
Vorrichtung und Verfahren zur ortsaufgelösten Platzierung von Nanoclustern
B. Burchard, I.W. Rangelow, J. Meijer and H. Wiggers
DE 10 2004 032 451 B4 2015.11.19
2014
2014
"MICROSCOPE PROBE AND METHOD FOR USE OF SAME" US 20140338074
V. Aksyuk (US), K. Srinivasan (US), H. Miao (US), I.W. Rangelow and T. Michels (DE)
2013
2013
2012
2012
Compact Ion Source Neutron Generator
Erfinder: Th. Schenkel (U.S.A), A. Persaud (GE), R. Kapadia (INDIA), A. Javey (U.S.A), C. Chang-Hasnain (U.S.A), I.W. Rangelow (DE), J. Kwan (U.S.A)
Publication info: U.S. patent application serial no. 13/451,475 filed on 19-Apr-2012
Microsystem component with a device deformable under the effect of temperature changes
Erfinder: Rangelow, Ivo W. (DE); Ivanov, Tzvetan (DE); Ivanova, Katerina (DE)
Publication info: US 8. 128, 282 (B2)
Method for Forming a Through Via in a Semiconductor Element and Semiconductor Element Comprising the Same
Erfinder: Kolb, Stefan (DE); Winkler Bernhard (DE); Rangelow, Ivo W. (DE); Blom, Hans-Olof (SE); Bjurstroem Johan (SE)
Publication info: US2012074570 (A1)
Device for scanning surfaces using atomic force microscopy, utilized in sensor for e.g. biological detection of various mediums, has static and dynamic actuators electrically connected with cantilever
Erfinder: Frank, Andreas (DE); Zoellner, Jens-Peter (DE); Rangelow, Ivo W. (DE)
Publication info: DE102010026703 (A1)
2011
2011
APPARATUS AND METHOD FOR INVESTIGATING SURFACE PROPERTIES OF DIFFERENT MATERIALS
Erfinder: Ivo W. Rangelow, Tzv. Ivanov
Publication info: US2011047662 (A1), 2011-02-24
DEVICE AND METHOD FOR AN ATOMIC FORCE MICROSKOPE FOR THE STUDY AND MODIFICATION OF SURFACE PROPERTIES
Erfinder: S. Kubsky, D. Olynick, Ivo W. Rangelow
Publication info: US2011055985 (A1), 2011-03-03
A METHOD OF ALIGNING A FIRST ARTICLE RELATIVE TO A SECOND ARTICLE AND AN APPARATUS FOR ALIGNING A FIRST ARTICLE RELATIVE TO SECOND ARTICLE
Erfinder: Ivo W. Rangelow
Publication info: US7946029 (B2), 2011-05-24
2010
2010
Process and structure for realization of trough vias in comination with integrated processes
Erfinder: J. Bjurstrom, H.-O. Blom, St. Kolb, I. W. Rangelow, B. Winkler.
E-Nummer: 2008E52159 DE 25.11.2008
E-Nummer: 2010E50953 DE 13.07.2010
DEVICE AND METHOD FOR THE MICROMECHANICAL POSITIONING AND HANDLING OF AN OBJECT
Erfinder: Ivo W. Rangelow
Publication info: US2010017921 (A1), 2010-01-21
METHOD FOR PRODUCING NANO-WIRES
Erfinder: P. Grabiec (PL), M. Zaborowski (PL), Ivo W. Rangelow (DE)
Publication info: PL359839 (A1), 2004-11-02; PL204689 (B1), 2010-02-26
Process for producing a carbon film on a substrate
Erfinder: P. Hrkut, P. Hudek, Ivo W. Rangelow
Publication info: US6136160 (A), 2000-10-24
2009
2009
- Vorrichtung und Verfahren zur Untersuchung von Oberflächeneigenschaften verschiedenartiger Materialien
Erfinder: I.W. Rangelow, Tzv. Ivanov, B. Volland, M. Woszczyna, T. Gotszalk, J. Mielczarski , Y. Sarov
Publication info: DE102007031112 (A1), 2009.01.02
WO 2009/000885 A1 - MICROSYSTEM COMPONENT WITH A DEVICE DEFORMABLE UNDER THE EFFECT OF TEMPERATURE CHANGES
Erfinder: Ivo W. Rangelow, Tzv. Ivanov
Publication info: US2009213900 (A1), 2009-08-27 - MICROMECHANICAL SENSOR SWITCH FOR THRESHOLD-RELATED SWITCHING OF ELECTRICAL CONTACTS
Erfinder: Ivo W. Rangelow, G. Gerlach
Publication info: WO20099077446 (A1), 2009-06-25 - CIRCUIT ARRANGEMENT FOR PARALLEL CANTILEVER ARRAYS FOR THE SCANNING FORCE MICROSCOPY
Erfinder: Ivo W. Rangelow, Tzv. Ivanov
Publication info: WO2009040236 (A1), 2009-04-02
2008
2008
- Vorrichtung und Verfahren zum mikromechanischen Positionieren und Manipulieren eines Objektes
Erfinder: Univ.-Prof. Dr.-Ing. habil. Ivo W. Rangelow, Dr.-Ing. Stefan Klett, Dipl.-Ing. Elshad Guliyev, Dr.rer.nat. Tzvetan Ivanov und Dr.rer.nat. Burkhard Volland
Publication info: DE102007005293 (A1), 2008-08-07
- FIELD EFFECT TRANSISTOR SENSOR
Erfinder: Klaus Edinger (US), Ivo W. Rangelow (DE), Piotr Grabiec (PL), John Melngailis (US) United States Patent, Patent No.: US 7,335,942 B2
Publication info: US2005062116 (A1), 2005-03-21; US7335942 (B2), 2008-02-26
- High resolution scanning thermal probe and method of manufacturing thereof
Erfinder: Klaus Edinger (US), Ivo W. Rangelow (DE)
Publication info: US Patent 6518872; US6518872 (B1), 2003-02-11 - METHOD FOR MANUFACTURING PUNCH FOR IMPRESSION NANOLITHOGRAPHY
Erfinder: P. Grabiec (PL), Ivo W. Rangelow (DE)
Publication info: PL362344 (A1), 2005-04-04; PL199400 (B1), 2008-09-30
2007
2007
- Mikrosystemtechnisches Bauelement mit einer unter dem Einfluss von Temperaturänderungen verformbaren Einrichtung
Erfinder: Ivo W. Rangelow
Patent Nr. 06705760.4-2217-DE2006000016
- METHOD FOR THE ELECTROSTATIC STRUCTURING OF A SUBSTRATE SURFACE AND RASTER PROBE
Erfinder: Ivo W. Rangelow (DE), R. Pedrak (PL)
Publication info: EP1759247 (A2), 2007-03-07 - ETCHING RADICAL CONTROLLED GAS CHOPPED DEEP REACTIVE ION ETCHING
Erfinder: Olynick Deirdre (US); Ivo W. Rangelow (DE); Chao Wellun (US)
Publication info: US2007015371 (A1), 2007-01-18 - SHADOW MASK AND METHOD FOR PRODUCING A SHADOW MASK
Erfinder: J. Meijer, A. Stephan, Ivo W. Rangelow
Publication info: US2004219465 (A1), 2004-11-04; US7183043 (B2), 2007-02-27
2006
2006
- VERFAHREN ZUR LAGEGENAUEN POSITIONIERUNG EINZELNER TEILCHEN
IN ODER AUF EINER SUBSTRATOBERFLÄCHE UND ANWENDUNG EINER DAZU
GEEIGNETEN VORRICHTUNG
Erfinder: I.W. Rangelow, J. Meijer, Th. Schenkel
Patent Nr.: 103 47 969; IPC B82B 3/00 (2006.01) - DEVICE AND METHOD OF POSITIONALLY ACCURATE IMPLANTATION OF
INDIVIDUAL PARTICLES IN A SUBSTRATE SURFACE
Inventors: Th. Schenkel, I.W. Rangelow, J. Meijer
Publication info: US2005077486 (A1), 2005-04-14; US7126139 (B2), 2006-10-24 - A MIKROSYSTEM COMPONENT WITH A DEVICE DEFORMABLE UNDER THE
INFLUENCE OF TEMPERATURE CHANGES
Inventors: K. Ivanova, Tzv. Ivanov, I.W. Rangelow
Publication Info: DE102005001116 - 2006-07-20 - SUBSTRATE LOADING APPARATUS
Inventors: J.W. Roger, I.W. Rangelow, L. Andrew
Publication Info: DE60026476D -2006-05-04 - A METHOD OF ALIGNING A FIRST ARTICLE RELATIVE TO A SECOND
ARTICLE AND AN APPARATUS FOR ALIGNING A FIRST ARTICLE RELATIVE TO
A SECOND ARTICLE
Inventor: I.W. Rangelow
Publication Info: WO2006005619 -2006-01-19 - ION OR OPTICAL DEVICE FOR PRECISION PLACING AND MANIPULATION OF
NANOSCOPIC OBJECTS SUCH AS AN AFM FOR QUANTUM COMPUTERS
Inventors: B. Burchard, M. Burchard, I.W. Rangelow
Publication Info: DE102004031250 -2006-01-19 - ASSEMBLY TO CREATIVE NANOCLUSTERS COMBINES POSITIONING STAGE
BASED ON A DRILLED ATOMIC FORCE MICROSCOPE TIP AND THE NANOOPTICAL SOURCE
Inventors: B. Burchard, I.W. Rangelow
Publication Info: DE102004032451 (A1), 2006-01-26 - ETCHING RADICAL CONTROLLED GAS CHOPPED DEEP REACTIVE ION
ETCHING
Inventors: D. Olynick, I. W. Rangelow, W. Chao
Publication Info: U.S. patent application serial no. 11/421,958, filed on 2006-06- 02 - DEVICE AND METHOD FOR MASKLESS AFM MICROLITHOGRAPHY
Inventor: Ivo W. Rangelow, Tzv. Ivanov
Publication info: US2005225011 (A1), 2005-10-13; US7141808 (B2), 2006-11-28 - TECHNIQUE FOR NANO-LINES FABRICATION
Inventor: Ivo W. Rangelow (DE), P. Grabiec (PL)
Publication info: EP1473760 (A2), 2004-11-03; EP1473760 (A3), 2006-03-29 - MEASURING SYSTEM FOR THE COMBINED SCANNING AND ANALYSIS OF MICROTECHNICAL COMPONENTS COMPRISING ELECTRICAL CONTACTS
Inventor: L. M. Eng, Ivo W. Rangelow
Publication info: US2006238206 (A1), 2006-10-26 - DEVICE FOR ACCURATELY POSITIONING IONDIVIDUAL PARTICLES ON SUBSTRATE SURFACE, E.G. FOR QUANTUM COMPUTER, HAS APERTURE AT TIP OF END PORTION OF CANTILEVER BEAM
Inventor: Ivo W. Rangelow, J. Meijer
Publication info: DE10347969 (A1), 2005-05-19; DE10347969 (B4), 2006-08-31
2005
2005
- Device and method for maskless afm microlithography
Inventors: I.W.Rangelow , Tzv. Ivanov
Publication Info: US2005225011 – 2005-10-13 - A method for the electrostatic structuring of a substrate surface and raster probe
lithography method
Inventors: I.W.Rangelow(DE),R. Pedrak(PL)
Applicant: UNIV KASSEL (DE); Publication info: WO2005088399 - 2005-09-22 - Device and method of positionally accurate implantation of individual particles in a
substrate surface
Inventors: Th. Schenkel (US), I.W. Rangelow (DE)
Applicant: UNIV KASSEL (DE); Publication info: US2005077486 - 2005-04-14 - Device for accurately positioning individual particles on substrate surface, e.g. for
quantum computer, has aperture at tip of end portion of cantilever beam
Inventors: I.W. Rangelow, J. Meijer
Applicant: UNIV KASSEL (DE) UNIV CALIFORNIA (US) PC: B82B3/00; G06N1/00;
B82B3/00+2; Publication info: DE10347969 - 2005-05-19 - Method for manufacturing punch for impression nanolithography
Inventors: P. Grabiec (PL), I.W. Rangelow (DE)
Applicant: INST TECH ELEKTRONOWEJ (PL)
Publication Info: PL362344 -2005-04-04 - MICROMECHANICALLY ACTUATABLE OPTOELECTRONIC COMPONENT
Inventor: H. Hillmer, J. Daleiden, Ivo W. Rangelow
Publication info: WO2004096695 (A2), 2004-11-11; WO200496695 (A3), 2005-03-24
2004
2004
- Technique for nano-lines fabrication
Inventors: I.W. Rangelow (DE), P.Grabiec (PL)
Applicant: INST TECH ELEKTRONOWEJ (PL) EC: H01L21/027B6; H01L21/033F4;
(+3) IPC: H01L21/027; H01L21/033; H01L21/308 (+3)
Publication Info: EP1473760 - 2004-11-03 - Measuring system for the combined scanning and analysis of microtechnical
components comprising electrical contacts
Inventors: M. Eng Lukas (DE), I.W. Rangelow (DE)
Applicant: UNIV KASSEL (DE); UNIV DRESDEN TECH (DE); (+2) C: B81B1/00;
B81B3/00; G12B21/02 (+9)
Publication Info: WO2004075204 – 2004-09-02 - Shadow mask and method for producing a shadow mask
Inventors: J. Meijer (DE), A. Stephan (DE), I.W. Rangelow
Applicant: IPC: G03F1/16; G03F1/14; G03F1/16 (+3)
Publication Info: US2004219465 - 2004-11-04 - Method for producing nano-wires
Inventors: P. Grabiec (PL); I.W. Rangelow (DE,) M. Zaborawski (PL)
Applicant: INST TECH ELEKTRONOWEJ (PL)
Publication Info: PL359839 - 2004-11-02 - Deutsche Patentanmeldung Juli 2004: „Vorrichtung zur lagegenauen Platzierung und Manipulation nanoskopischer Objekte“
Inventors: B. Burchard, J. Meijer, I.W. Rangelow, M.Burchard, assignee: Diatronic
GmbH - MICROPROBE
Inventor: P. Grabiec (PL), Ivo W. Rangelow
Publication info: PL328752 (A1), 200-03-27; PL187366 (B1), 2004-06-30 - METHOD OF A FIELD-EFFECT MICRO-EMITTER AND MATRIX OF MICRO-EMITTERS FORMED OF EMITTERS OBTAINED THEREBY
Inventor: P. Grabiec (PL), Ivo W. Rangelow
Publication info: PL328751 (A1), 200-03-27; PL187444 (B1), 2004-07-30
2003
2003
- High resolution scanning thermal probe and method of manufacturing thereof
Inventor: K. Edinger (US), I.W. Rangelow (DE)
Applicant: UNIV MARYLAND (US) IPC: G12B21/02; G12B21/00; (IPC1-7) H01L3/04
Publication info: US6518872(B1), 2003-02-11 - Field effect transistor sensor for a screen probe microscope
Inventor: K. Edinger, I.W. Rangelow
Applicant: UNI KASSEL IPC: G01N27/82; G01R1/07; G01R33/06 (+6)
Publication info: AU2002358004 -2003-05-26 - VORRICHTUNG UND VERFAHREN ZUR MASKENLOSEN MIKROLITHOGRAPHIE
Inventor: Ivo W. Rangelow, Tzv. Ivanov
Publication info: DE10303040 (A1), 2003-10-02 - METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS
Inventor: Ivo W. Rangelow, Tzv. Ivanov
Publication info: WO02053489 (A2), 2002-07-11; WO02053489 (A3), 2003-08-07
2002
2002
- Method for producing microstructured components
Inventors: I.W. Rangelow (DE), Tzv. Ivanov (BG)
Applicant: m SEN MIKROSYSTEMTECHNIK GMBH (DE); UNIV KASSEL (DE);
G12B21/02; H01J9/02 (+4); Publication info: WO02053489 - 2002-07-11 - Mask for ion beams used during structuring substrates consists of a silicon wafer with a perforated pattern and a metal coating on the side facing the ion beams for stopping ion beams and deflecting heat
Inventors: M. BURCHARD (DE), J. Meijer(DE), I.W. Rangelow
Applicant: RUBITEC GES FUER INNOVATION UN (DE); UNIV KASSEL
IPC: B81C1/00; G03F1/16; B81C1/00 (+6) (DE) B81C1/00F2D4M6; G03F1/16
Publication Info: DE10039645 (A1), 2002-03-28 - Structuring device for processing a substrate
Inventors: I. Shvets (IE), I.W. Rangelow (DE)
Applicant: TRINITY COLLEGE DUBLIN (IE); UNI KASSEL (DE); (+1)
IPC: H01L21/302; B81C1/00; C23C16/04 (+13)
Publication Info: US6419752(B1), 2002-07-16 - SUBSTRATE LOADING APPARATUS
Inventor: B. Volland, I. W. Rangelow
Publication info: CA2364995 (A1), 2002-06-21
2000
2000
- International patent submitted Aug. 2000:
"Hochauflösende Materialstrukturierung mittels Partikelstrahlung hoher
Leistungsdichte unter Verwendung von freitragenden Lochmasken"
[ lateral structuring of materials with particle beams of high power densities using free standing stencil masks ]
Inventors: I.W.Rangelow, U.Weidenmüller, J.Meijer, A.Stephan, assignee: Universität Kassel. - Process for producing a carbon film on a substrate
Inventors: P. Hrkut (SK), P. Hudek (SK), I.W. Rangelow (DE)
Applicant: IMS IONEN MIKROFAB SYST (AT); UNIV KASSEL (DE); (+1),
IPC: C23C14/34; C23C14/06; C23C14/35 EC: C23C14/06B; C23C14/35
Publication Info: US6136160 – 2000-10-24, (+6) - Method for the purpose of producing a stencil mask
Inventors: E. Hammel (NL), I.W. Rangelow (DE), H. Loeschner (AT)
Applicant: IMS IONEN MIKROFAB SYST (AT) IPC: G03F1/16; H01L21/027;
G03F1/16
Publication Info: US6156217 -2000-12-05 - Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
Inventors: R. Leuschner(DE), I.W. Rangelow(DE)
Applicant: SIEMENS AG (DE); UNIV KASSEL (DE) IPC: B81C1/00;(+8)
H01L21/312; H01L21/314
Publication Info: DE19844418 - 2000-04-06 - MICROPROBE
Inventors: P. Grabiec (PL), I.W. Rangelow (DE)
Applicant : INST TECH ELEKTRONOWEJ (PL)
Publication Info: PL328752 – 2000-03-27 - A method of a field-effect micro-emitter and matrix of micro-emitters formed of emitters obtained thereby
Inventors: P. Grabiec (PL) I.W. Rangelow (DE)
Applicant: INST TECH, ELEKTRONOWEJ (PL)
Publication Info: PL328751 - 2000-03-27 - Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
Inventors: R. Leuschner, Ivo W. Rangelow
Publication info: DE19844418 (A1), 2000-04-28
1999
1999
- CANTILEVER WITH WHISKER-GROWN PROBE AND METHOD FOR
PRODUCING THEREOF
Inventors: E .Givargizov (RU), L. Obolenskaya (RU), A. Stepanova (RU), E. Mashkova
(RU), M. Givargizov (RU), I.W. Rangelow (DE)
International Application No.: PCT/RU1999/000155
IPC: B81B 1/00 (2006.01), C30B 11/00 (2006.01), C30B 11/12 (2006.01), G12B 21/02
(2006.01)
Pub. No.: WO/1999/058925 – 18.11.1999
1997
1997
- Silicon membrane and method of making same
Inventors: H. Loeschner (AT), Shi Feng (DE), I.W. Rangelow (DE)
Applicant: IMS IONEN MIKROFAB, EC: C25F3/12; G03F1/14K, SYST (AT); UNI
KASSEL (DE) IPC: G03F7/38; C25F3/12; G03F1/14 (+13)
Publication Info: US5672449 - 1997-09-30
1981
1981
- No English title available
Inventors: I.W. Rangelow; Z.Radzimski
Applicant: POLITECHNIKA WROCLAWSKA (PL)
Publication Info: PL224669 - 1981-05-08 - SLIT EXTRACTION ASSEMBLY OF ION SOURCE
Inventor: Ivo W. Rangelow, Z. Radzimski
Publication info: PL224669 (A2), 1981-05-08; PL119694 (B2), 1982-01-30