Vorrichtung und Verfahren zur ortsaufgelösten Platzierung von Nanoclustern
B. Burchard, I.W. Rangelow, J. Meijer and H. Wiggers
DE 10 2004 032 451 B4 2015.11.19

"MICROSCOPE PROBE AND METHOD FOR USE OF SAME" US 20140338074
V. Aksyuk (US), K. Srinivasan (US), H. Miao (US), I.W. Rangelow and T. Michels (DE)

Compact Ion Source Neutron Generator
Erfinder: Th. Schenkel (U.S.A), A. Persaud (GE), R. Kapadia (INDIA), A. Javey (U.S.A), C. Chang-Hasnain (U.S.A), I.W. Rangelow (DE), J. Kwan (U.S.A)
Publication info: U.S. patent application serial no. 13/451,475 filed on 19-Apr-2012

Microsystem component with a device deformable under the effect of temperature changes
Erfinder: Rangelow, Ivo W. (DE); Ivanov, Tzvetan (DE); Ivanova, Katerina (DE)
Publication info: US 8. 128, 282 (B2)

Method for Forming a Through Via in a Semiconductor Element and Semiconductor Element Comprising the Same
Erfinder: Kolb, Stefan (DE); Winkler Bernhard (DE); Rangelow, Ivo W. (DE); Blom, Hans-Olof (SE); Bjurstroem Johan (SE)
Publication info: US2012074570 (A1)

Device for scanning surfaces using atomic force microscopy, utilized in sensor for e.g. biological detection of various mediums, has static and dynamic actuators electrically connected with cantilever
Erfinder: Frank, Andreas (DE); Zoellner, Jens-Peter (DE); Rangelow, Ivo W. (DE)
Publication info: DE102010026703 (A1)

APPARATUS AND METHOD FOR INVESTIGATING SURFACE PROPERTIES OF DIFFERENT MATERIALS
Erfinder: Ivo W. Rangelow, Tzv. Ivanov
Publication info: US2011047662 (A1), 2011-02-24

DEVICE AND METHOD FOR AN ATOMIC FORCE MICROSKOPE FOR THE STUDY AND MODIFICATION OF SURFACE PROPERTIES
Erfinder: S. Kubsky, D. Olynick, Ivo W. Rangelow
Publication info: US2011055985 (A1), 2011-03-03

A METHOD OF ALIGNING A FIRST ARTICLE RELATIVE TO A SECOND ARTICLE AND AN APPARATUS FOR ALIGNING A FIRST ARTICLE RELATIVE TO SECOND ARTICLE
Erfinder: Ivo W. Rangelow
Publication info: US7946029 (B2), 2011-05-24

Process and structure for realization of trough vias in comination with integrated processes
Erfinder: J. Bjurstrom, H.-O. Blom, St. Kolb, I. W. Rangelow, B. Winkler.
E-Nummer: 2008E52159 DE  25.11.2008
E-Nummer: 2010E50953 DE  13.07.2010

DEVICE AND METHOD FOR THE MICROMECHANICAL POSITIONING AND HANDLING OF AN OBJECT
Erfinder: Ivo W. Rangelow
Publication info: US2010017921 (A1), 2010-01-21

METHOD FOR PRODUCING NANO-WIRES
Erfinder: P. Grabiec (PL), M. Zaborowski (PL), Ivo W. Rangelow (DE)
Publication info: PL359839 (A1), 2004-11-02; PL204689 (B1), 2010-02-26

Process for producing a carbon film on a substrate
Erfinder: P. Hrkut, P. Hudek, Ivo W. Rangelow
Publication info: US6136160 (A), 2000-10-24

• Vorrichtung und Verfahren zur Untersuchung von Oberflächeneigenschaften verschiedenartiger Materialien
  Erfinder: I.W. Rangelow, Tzv. Ivanov, B. Volland, M. Woszczyna, T. Gotszalk, J. Mielczarski , Y. Sarov
  Publication info: DE102007031112 (A1), 2009.01.02
  WO 2009/000885 A1
  
  
• MICROSYSTEM COMPONENT WITH A DEVICE DEFORMABLE UNDER THE EFFECT OF TEMPERATURE CHANGES
  Erfinder: Ivo W. Rangelow, Tzv. Ivanov
  Publication info: US2009213900 (A1), 2009-08-27
  
  
• MICROMECHANICAL SENSOR SWITCH FOR THRESHOLD-RELATED SWITCHING OF ELECTRICAL CONTACTS
  Erfinder: Ivo W. Rangelow, G. Gerlach
  Publication info: WO20099077446 (A1), 2009-06-25
  
  
• CIRCUIT ARRANGEMENT FOR PARALLEL CANTILEVER ARRAYS FOR THE SCANNING FORCE MICROSCOPY
  Erfinder: Ivo W. Rangelow, Tzv. Ivanov
  Publication info: WO2009040236 (A1), 2009-04-02

• Vorrichtung und Verfahren zum mikromechanischen Positionieren und Manipulieren eines Objektes
  Erfinder: Univ.-Prof. Dr.-Ing. habil. Ivo W. Rangelow, Dr.-Ing. Stefan Klett, Dipl.-Ing. Elshad Guliyev, Dr.rer.nat. Tzvetan Ivanov und Dr.rer.nat. Burkhard Volland
  Publication info: DE102007005293 (A1), 2008-08-07
  

• FIELD EFFECT TRANSISTOR SENSOR
  Erfinder: Klaus Edinger (US), Ivo W. Rangelow (DE), Piotr Grabiec (PL), John Melngailis (US) United States Patent, Patent No.: US 7,335,942 B2
  Publication info: US2005062116 (A1), 2005-03-21; US7335942 (B2), 2008-02-26

• High resolution scanning thermal probe and method of manufacturing thereof
  Erfinder: Klaus Edinger (US), Ivo W. Rangelow (DE)
  Publication info: US Patent 6518872; US6518872 (B1), 2003-02-11
  
  
• METHOD FOR MANUFACTURING PUNCH FOR IMPRESSION NANOLITHOGRAPHY
  Erfinder: P. Grabiec (PL), Ivo W. Rangelow (DE)
  Publication info: PL362344 (A1), 2005-04-04; PL199400 (B1), 2008-09-30

• Mikrosystemtechnisches Bauelement mit einer unter dem Einfluss von Temperaturänderungen verformbaren Einrichtung
  Erfinder: Ivo W. Rangelow
  Patent Nr. 06705760.4-2217-DE2006000016

• METHOD FOR THE ELECTROSTATIC STRUCTURING OF A SUBSTRATE SURFACE AND RASTER PROBE
  Erfinder: Ivo W. Rangelow (DE), R. Pedrak (PL)
  Publication info: EP1759247 (A2), 2007-03-07
  
  
• ETCHING RADICAL CONTROLLED GAS CHOPPED DEEP REACTIVE ION ETCHING
  Erfinder: Olynick Deirdre (US); Ivo W. Rangelow (DE); Chao Wellun (US)
  Publication info: US2007015371 (A1), 2007-01-18
  
  
• SHADOW MASK AND METHOD FOR PRODUCING A SHADOW MASK
  Erfinder: J. Meijer, A. Stephan, Ivo W. Rangelow
  Publication info: US2004219465 (A1), 2004-11-04; US7183043 (B2), 2007-02-27

• VERFAHREN ZUR LAGEGENAUEN POSITIONIERUNG EINZELNER TEILCHEN
  IN ODER AUF EINER SUBSTRATOBERFLÄCHE UND ANWENDUNG EINER DAZU
  GEEIGNETEN VORRICHTUNG
  Erfinder: I.W. Rangelow, J. Meijer, Th. Schenkel
  Patent Nr.: 103 47 969; IPC B82B 3/00 (2006.01)
  
  
• DEVICE AND METHOD OF POSITIONALLY ACCURATE IMPLANTATION OF
  INDIVIDUAL PARTICLES IN A SUBSTRATE SURFACE
  Inventors: Th. Schenkel, I.W. Rangelow, J. Meijer
  Publication info: US2005077486 (A1), 2005-04-14; US7126139 (B2), 2006-10-24
  
  
• A MIKROSYSTEM COMPONENT WITH A DEVICE DEFORMABLE UNDER THE
  INFLUENCE OF TEMPERATURE CHANGES
  Inventors: K. Ivanova, Tzv. Ivanov, I.W. Rangelow
  Publication Info: DE102005001116 - 2006-07-20
  
  
• SUBSTRATE LOADING APPARATUS
  Inventors: J.W. Roger, I.W. Rangelow, L. Andrew
  Publication Info: DE60026476D -2006-05-04
  
  
• A METHOD OF ALIGNING A FIRST ARTICLE RELATIVE TO A SECOND
  ARTICLE AND AN APPARATUS FOR ALIGNING A FIRST ARTICLE RELATIVE TO
  A SECOND ARTICLE
  Inventor: I.W. Rangelow
  Publication Info: WO2006005619 -2006-01-19
  
  
• ION OR OPTICAL DEVICE FOR PRECISION PLACING AND MANIPULATION OF
  NANOSCOPIC OBJECTS SUCH AS AN AFM FOR QUANTUM COMPUTERS
  Inventors: B. Burchard, M. Burchard, I.W. Rangelow
  Publication Info: DE102004031250 -2006-01-19
  
  
• ASSEMBLY TO CREATIVE NANOCLUSTERS COMBINES POSITIONING STAGE
  BASED ON A DRILLED ATOMIC FORCE MICROSCOPE TIP AND THE NANOOPTICAL SOURCE
  Inventors: B. Burchard, I.W. Rangelow
  Publication Info: DE102004032451 (A1), 2006-01-26
  
  
• ETCHING RADICAL CONTROLLED GAS CHOPPED DEEP REACTIVE ION
  ETCHING
  Inventors: D. Olynick, I. W. Rangelow, W. Chao
  Publication Info: U.S. patent application serial no. 11/421,958, filed on 2006-06- 02
  
  
• DEVICE AND METHOD FOR MASKLESS AFM MICROLITHOGRAPHY
  Inventor: Ivo W. Rangelow, Tzv. Ivanov
  Publication info: US2005225011 (A1), 2005-10-13; US7141808 (B2), 2006-11-28
  
  
• TECHNIQUE FOR NANO-LINES FABRICATION
  Inventor: Ivo W. Rangelow (DE), P. Grabiec (PL)
  Publication info: EP1473760 (A2), 2004-11-03; EP1473760 (A3), 2006-03-29
  
  
• MEASURING SYSTEM FOR THE COMBINED SCANNING AND ANALYSIS OF MICROTECHNICAL COMPONENTS COMPRISING ELECTRICAL CONTACTS
  Inventor: L. M. Eng, Ivo W. Rangelow
  Publication info: US2006238206 (A1), 2006-10-26
  
  
• DEVICE FOR ACCURATELY POSITIONING IONDIVIDUAL PARTICLES ON SUBSTRATE SURFACE, E.G. FOR QUANTUM COMPUTER, HAS APERTURE AT TIP OF END PORTION OF CANTILEVER BEAM
  Inventor: Ivo W. Rangelow, J. Meijer
  Publication info: DE10347969 (A1), 2005-05-19; DE10347969 (B4), 2006-08-31

• Device and method for maskless afm microlithography
  Inventors: I.W.Rangelow , Tzv. Ivanov
  Publication Info: US2005225011 – 2005-10-13
• A method for the electrostatic structuring of a substrate surface and raster probe
  lithography method
  Inventors: I.W.Rangelow(DE),R. Pedrak(PL)
  Applicant: UNIV KASSEL (DE); Publication info: WO2005088399 - 2005-09-22
• Device and method of positionally accurate implantation of individual particles in a
  substrate surface
  Inventors: Th. Schenkel (US), I.W. Rangelow (DE)
  Applicant: UNIV KASSEL (DE); Publication info: US2005077486 - 2005-04-14
• Device for accurately positioning individual particles on substrate surface, e.g. for
  quantum computer, has aperture at tip of end portion of cantilever beam
  Inventors: I.W. Rangelow, J. Meijer
  Applicant: UNIV KASSEL (DE) UNIV CALIFORNIA (US) PC: B82B3/00; G06N1/00;
  B82B3/00+2; Publication info: DE10347969 - 2005-05-19
• Method for manufacturing punch for impression nanolithography
  Inventors: P. Grabiec (PL), I.W. Rangelow (DE)
  Applicant: INST TECH ELEKTRONOWEJ (PL)
  Publication Info: PL362344 -2005-04-04
• MICROMECHANICALLY ACTUATABLE OPTOELECTRONIC COMPONENT
  Inventor: H. Hillmer, J. Daleiden, Ivo W. Rangelow
  Publication info: WO2004096695 (A2), 2004-11-11; WO200496695 (A3), 2005-03-24

• Technique for nano-lines fabrication
  Inventors: I.W. Rangelow (DE), P.Grabiec (PL)
  Applicant: INST TECH ELEKTRONOWEJ (PL) EC: H01L21/027B6; H01L21/033F4;
  (+3) IPC: H01L21/027; H01L21/033; H01L21/308 (+3)
  Publication Info: EP1473760 - 2004-11-03
  
  
• Measuring system for the combined scanning and analysis of microtechnical
  components comprising electrical contacts
  Inventors: M. Eng Lukas (DE), I.W. Rangelow (DE)
  Applicant: UNIV KASSEL (DE); UNIV DRESDEN TECH (DE); (+2) C: B81B1/00;
  B81B3/00; G12B21/02 (+9)
  Publication Info: WO2004075204 – 2004-09-02
  
  
• Shadow mask and method for producing a shadow mask
  Inventors: J. Meijer (DE), A. Stephan (DE), I.W. Rangelow
  Applicant: IPC: G03F1/16; G03F1/14; G03F1/16 (+3)
  Publication Info: US2004219465 - 2004-11-04
  
  
• Method for producing nano-wires
  Inventors: P. Grabiec (PL); I.W. Rangelow (DE,) M. Zaborawski (PL)
  Applicant: INST TECH ELEKTRONOWEJ (PL)
  Publication Info: PL359839 - 2004-11-02
  
  
• Deutsche Patentanmeldung Juli 2004: „Vorrichtung zur lagegenauen Platzierung und Manipulation nanoskopischer Objekte“
  Inventors: B. Burchard, J. Meijer, I.W. Rangelow, M.Burchard, assignee: Diatronic
  GmbH
  
  
• MICROPROBE
  Inventor: P. Grabiec (PL), Ivo W. Rangelow
  Publication info: PL328752 (A1), 200-03-27; PL187366 (B1), 2004-06-30
  
  
• METHOD OF A FIELD-EFFECT MICRO-EMITTER AND MATRIX OF MICRO-EMITTERS FORMED OF EMITTERS OBTAINED THEREBY
  Inventor: P. Grabiec (PL), Ivo W. Rangelow
  Publication info: PL328751 (A1), 200-03-27; PL187444 (B1), 2004-07-30

• High resolution scanning thermal probe and method of manufacturing thereof
  Inventor: K. Edinger (US), I.W. Rangelow (DE)
  Applicant: UNIV MARYLAND (US) IPC: G12B21/02; G12B21/00; (IPC1-7) H01L3/04
  Publication info: US6518872(B1), 2003-02-11
  
  
• Field effect transistor sensor for a screen probe microscope
  Inventor: K. Edinger, I.W. Rangelow
  Applicant: UNI KASSEL IPC: G01N27/82; G01R1/07; G01R33/06 (+6)
  Publication info: AU2002358004 -2003-05-26
  
  
• VORRICHTUNG UND VERFAHREN ZUR MASKENLOSEN MIKROLITHOGRAPHIE
  Inventor: Ivo W. Rangelow, Tzv. Ivanov
  Publication info: DE10303040 (A1), 2003-10-02
  
  
• METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS
  Inventor: Ivo W. Rangelow, Tzv. Ivanov
  Publication info: WO02053489 (A2), 2002-07-11; WO02053489 (A3), 2003-08-07

• Method for producing microstructured components
  Inventors: I.W. Rangelow (DE), Tzv. Ivanov (BG)
  Applicant: m SEN MIKROSYSTEMTECHNIK GMBH (DE); UNIV KASSEL (DE);
  G12B21/02; H01J9/02 (+4); Publication info: WO02053489 - 2002-07-11
• Mask for ion beams used during structuring substrates consists of a silicon wafer with a perforated pattern and a metal coating on the side facing the ion beams for stopping ion beams and deflecting heat
  Inventors: M. BURCHARD (DE), J. Meijer(DE), I.W. Rangelow
  Applicant: RUBITEC GES FUER INNOVATION UN (DE); UNIV KASSEL
  IPC: B81C1/00; G03F1/16; B81C1/00 (+6) (DE) B81C1/00F2D4M6; G03F1/16
  Publication Info: DE10039645 (A1), 2002-03-28
• Structuring device for processing a substrate
  Inventors: I. Shvets (IE), I.W. Rangelow (DE)
  Applicant: TRINITY COLLEGE DUBLIN (IE); UNI KASSEL (DE); (+1)
  IPC: H01L21/302; B81C1/00; C23C16/04 (+13)
  Publication Info: US6419752(B1), 2002-07-16
• SUBSTRATE LOADING APPARATUS
  Inventor: B. Volland, I. W. Rangelow
  Publication info: CA2364995 (A1), 2002-06-21

• International patent submitted Aug. 2000:
  "Hochauflösende Materialstrukturierung mittels Partikelstrahlung hoher
  Leistungsdichte unter Verwendung von freitragenden Lochmasken"
  [ lateral structuring of materials with particle beams of high power densities using free standing stencil masks ]
  Inventors: I.W.Rangelow, U.Weidenmüller, J.Meijer, A.Stephan, assignee: Universität Kassel.
• Process for producing a carbon film on a substrate
  Inventors: P. Hrkut (SK), P. Hudek (SK), I.W. Rangelow (DE)
  Applicant: IMS IONEN MIKROFAB SYST (AT); UNIV KASSEL (DE); (+1),
  IPC: C23C14/34; C23C14/06; C23C14/35 EC: C23C14/06B; C23C14/35
  Publication Info: US6136160 – 2000-10-24, (+6)
• Method for the purpose of producing a stencil mask
  Inventors: E. Hammel (NL), I.W. Rangelow (DE), H. Loeschner (AT)
  Applicant: IMS IONEN MIKROFAB SYST (AT) IPC: G03F1/16; H01L21/027;
  G03F1/16
  Publication Info: US6156217 -2000-12-05
• Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
  Inventors: R. Leuschner(DE), I.W. Rangelow(DE)
  Applicant: SIEMENS AG (DE); UNIV KASSEL (DE) IPC: B81C1/00;(+8)
  H01L21/312; H01L21/314
  Publication Info: DE19844418 - 2000-04-06
• MICROPROBE
  Inventors: P. Grabiec (PL), I.W. Rangelow (DE)
  Applicant : INST TECH ELEKTRONOWEJ (PL)
  Publication Info: PL328752 – 2000-03-27
• A method of a field-effect micro-emitter and matrix of micro-emitters formed of emitters obtained thereby
  Inventors: P. Grabiec (PL) I.W. Rangelow (DE)
  Applicant: INST TECH, ELEKTRONOWEJ (PL)
  Publication Info: PL328751 - 2000-03-27
• Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
  Inventors: R. Leuschner, Ivo W. Rangelow
  Publication info: DE19844418 (A1), 2000-04-28

• CANTILEVER WITH WHISKER-GROWN PROBE AND METHOD FOR
  PRODUCING THEREOF
  Inventors: E .Givargizov (RU), L. Obolenskaya (RU), A. Stepanova (RU), E. Mashkova
  (RU), M. Givargizov (RU), I.W. Rangelow (DE)
  International Application No.: PCT/RU1999/000155
  IPC: B81B 1/00 (2006.01), C30B 11/00 (2006.01), C30B 11/12 (2006.01), G12B 21/02
  (2006.01)
  Pub. No.: WO/1999/058925 – 18.11.1999

• Silicon membrane and method of making same
  Inventors: H. Loeschner (AT), Shi Feng (DE), I.W. Rangelow (DE)
  Applicant: IMS IONEN MIKROFAB, EC: C25F3/12; G03F1/14K, SYST (AT); UNI
  KASSEL (DE) IPC: G03F7/38; C25F3/12; G03F1/14 (+13)
  Publication Info: US5672449 - 1997-09-30

• No English title available
  Inventors: I.W. Rangelow; Z.Radzimski
  Applicant: POLITECHNIKA WROCLAWSKA (PL)
  Publication Info: PL224669 - 1981-05-08
  
  
• SLIT EXTRACTION ASSEMBLY OF ION SOURCE
  Inventor: Ivo W. Rangelow, Z. Radzimski
  Publication info: PL224669 (A2), 1981-05-08; PL119694 (B2), 1982-01-30