Line Edge Roughness Metrology Software
Sertac Guneri, Yazgi, Tzvetan Ivanov, Mathias Holz, Ivo W. Rangelow, B. Erdem Alaca
Journal of Vacuum Science & Technology B 38 (1) (2020)
doi: 10.1116/1.5122675

Mix-and-match lithography and cryogenic etching for NIL template fabrication
Martin Hofmann et al.
Microelectronic Engineering (26 Jan 2020)
doi: 10.1016/j.mee.2020.111234

Determination of the mixing ratio of a flowing gas mixture with self-actuated microcantilevers
Jaqueline Stauffenberg, Steve Durstewitz, Martin Hofmann, Tzvetan Ivanov, Mathias Holz, Waleed Ehrhardt, Wolf-Ulrich Riegel, Jens-Peter Zöllner, Eberhard Manske, and Ivo W. Rangelow
J. Sens. Sens. Syst., 9, 71–78 (27 Feb 2020)
doi: 10.5194/jsss-9-71-2020

Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision
Ingo Ortlepp; Michael Kühnel; Martin Hofmann; Laura Weidenfeller; Johannes Kirchner; Shraddha Supreeti; Rostyslav Mastylo; Mathias Holz; Thomas Michels; Roland Füßl; Ivo W. Rangelow; Thomas Fröhlich; Denis Dontsov; Christoph Schäffel; Eberhard Manske
Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113240A (23 March 2020)
doi: 10.1117/12.2551044

Field emission scanning probe lithography with GaN nanowires on active cantilevers
Mahmoud Behzadirad,Ashwin K. Rishinaramangalam,Daniel Feezell,Tito Busani,Christoph Reuter,Alexander Reum,Mathias Holz,Teodor Gotszalk,Stephan Mecholdt,Martin Hofmann,Ahmad Ahmad,Tzvetan Ivanov and Ivo W. Rangelow
Journal of Vacuum Science & Technology B 38 032806 (2020)
doi: 10.1116/1.5137901

Scanning probe lithography on calixarene towards single-digit nanometer fabrication
Marcus Kaestner and Ivo W Rangelow
2020 Int. J. Extrem. Manuf. 2 032005 (04 Aug 2020)
doi: 10.1088/2631-7990/aba2d8
https://iopscience.iop.org/article/10.1088/2631-7990/aba2d8/pdf

High-throughput process chain for single electron transistor devices based on fieldemission scanning probe lithography and Smart Nanoimprint lithography technology
Claudia Lenk, Yana Krivoshapkina, Martin Hofmann, Steve Lenk, Tzvetan Ivanov, Ivo W. Rangelow, Ahmad Ahmad, Alexander Reum, Mathias Holz, Thomas Glinsner, Martin Eibelhuber, Dominik Treiblmayr, Barbara Schamberger, Mustapha Chouiki, Boon Teik Chan, Ziad el Otell, and Jean-François de Marneffe
Journal of Vacuum Science & Technology B 37, 021603 (2019);
doi: 10.1116/1.5067269

Laser-microfabrication with accurate positioning and metrological traceability
Laura Weidenfeller, Johannes Kirchner, Martin Hofmann, Michael Kühnel, Carsten Reinhardt, Ivo Rangelow, and Eberhard Manske
Proc. SPIE 10930, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XII, 109300L (4 March 2019);
doi: 10.1117/12.2508248

Probe-induced resistive switching memory based on organic-inorganic lead halide perovskite materials
Abbas Shaban, Mojtaba Joodaki, Saeed Mehregan, Ivo W. Rangelow
Organic Electronics 69 106–113, (11 March 2019)
doi: 10.1016/2019.03.019

Integrated soft UV-nanoimprint lithography in a nanopositioning and nanomeasuring machine for accurate positioning of stamp to substrate
Shraddha Supreeti, Johannes Kirchner, Martin Hofmann, Rostyslav Mastylo, Ivo W. Rangelow, et al.
Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS, 2019, 1095819 (26 March 2019)
doi: 10.1117/12.2514832

Tip-based nano-manufacturing and -metrology editors-pick
Teodor Gotszalk, Grzegorz Jóźwiak, Jacek Radojewski, Thomas Fröhlich, Roland Füssl, Eberhard Manske, Mathias Holz, Tzvetan Ivanov, Ahmad Ahmad, and Ivo W. Rangelow
Journal of Vacuum Science & Technology B 37, 030803 (2019)
doi: 10.1116/1.5083044

High throughput AFM inspection system with parallel active cantilevers
M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. W. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, H. S. Lee
Proc. SPIE 11148, Photomask Technology 2019, 111481E (26 Sept 2019)
doi: 10.1117/12.2537009

Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale
Mathias Holz, Christoph Reuter, Alexander Reum, Ahmad Ahmad, Martin Hofmann, et al.
Proc. SPIE 11148, Photomask Technology 2019, 111481F (26 Sept 2019)
doi: 10.1117/12.2537018

Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching
Stefano Dallorto, Andy Goodyear, Mike Cooke, Julia E. Szornel, Craig Ward, Christoph Kastl, Adam Schwartzberg, Ivo W. Rangelow, Stefano Cabrini
Plasma Processes And Polymers, Volume16, Issue9, Special Issue: Plasmas for Microfabrication (September 2019)
doi: 10.1002/ppap.201900051

Nanoscale lift-off process using field emission scanning probe lithography
Martin Hofmann, Stephan Mecholdt, Markus Mohr, Mathias Holz, Stefano Dallorto, Eberhard Manske, Hans-Jörg, Fecht, and Ivo W. Rangelow
Journal of Vacuum Science & Technology B 37, 061803 (04 Oct 2019)
doi: 10.1116/1.5122272

Sensitivity Improvement to Active Piezoresistive AFM Probes Using Focused Ion Beam Processing
Piotr Kunicki, Tihomir Angelov , Tzvetan Ivanov , Teodor Gotszalk, and Ivo W. Rangelow
Sensors 19, 4429 (12 Oct 2019)
www.mdpi.com/journal/sensors
doi:10.3390/s19204429

Correlative Microscopy and Nanofabrication with AFM Integrated with SEM
Mathias Holz, Christoph Reuter, Ahmad Ahmad, Alexander Reum, Martin Hofmann, Tzvetan Ivanov, and Ivo W. Rangelow
Microscopy Today November 2019 (31 Oct 2019)
www.microscopy-today.com
doi: 10.1017/S1551929519001068

Tip-based electron beam induced deposition using active cantilevers
Mathias Holz, Frances I. Allen, Christoph Reuter, Ahmad Ahmad, Martin Hofmann, Alexander Reum, Tzvetan Ivanov, and Ivo W. Rangelow
Journal of Vacuum Science & Technology B 37, 061812 (21 Nov 2019)
doi: 10.1116/1.5123287

Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication
Daniel Staaks, Zhaoning Yu, Scott D. Dhuey, Simone Sassolini, Kim Y. Lee, Ivo W. Rangelow, Deirdre L. Olynick
Journal of Vacuum Science & Technology A 37, 061306 (21 Nov 2019)
doi: 10.1116/1.5123397

Contact atomic force microscopy using piezoresistive cantilevers in load force modulation mode
P. Biczysko, A. Dzierka, G. Jòzwiak, M. Rudek, T. Gotszalk, P. Janus, P. Grabiec and I.W. Rangelow
Ultramicroscopy 184 (Jan. 2018) 199-208; http://dx.doi.org/10.1016/j.ultramic.2017.09.002

Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for single digit nanodevices
I.W. Rangelow, C. Lenk, M. Hofmann, S. Lenk, T. Ivanov, A. Ahmad, M. Kästner, E. Guliyev, C. Reuter, M. Budden, J.-P. Zöllner, M. Holz, A. Reum, Z. Durrani, M. Jones, C. Aydogan, M. Bicer, B.E. Alaca, M. Kühnel, T. Fröhlich, R. Füssel and E. Manske
Proc. SPIE 10584, Emerging Patterning Technologies 2018, 1058406 (19 March 2018)
doi: 10.1117/12.2299955

Nanofabrication by Field-emission Scanning Probe Lithography and Cryogenic Plasma Etching
C. Lenk, M. Hofmann, S. Lenk, M. Kästner, T. Ivanov, Y. Krivoshapkina, D. Nechepurenko, B. Volland, M. Holz, A. Ahmad A. Reum, C. Wang, M. Jones, Z. Durrani and I.W. Rangelow
Microelectronic Engineering, Volume 192 (May 2018) 77-82; https://doi.org/10.1016/j.mee.2018.01.022

Gas-Flow Sensor Based on Self-Oscillating and Self-Sensing Cantilever
J.-P. Zöllner, S. Durstewitz, J. Stauffenberg, T. Ivanov, M. Holz, W. Ehrhardt, W.-U. Riegel and I.W. Rangelow
Proceedings 2018, 2, 846; doi:10.3390/proceedings2130846

Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale
D. Staaks, D. L. Olynick, I.W. Rangelow and M. Virginia P. Altoe
Nanoscale, 2018, doi: 10.1039/c8nr06669h

Charged particle single nanometre manufacturing
P. D. Prewett, C. W. Hagen, C. Lenk, S. Lenk, M. Kästner, T. Ivanov, A. Ahmad, I.W. Rangelow, X. Shi, S. A. Boden, A.P.G. Robinson, D. Yang, S. Hari, M. Scotuzzi and E. Huq
Beilstein Journal of Nanotechnology 2018, 9, 2855-2882; doi:10.3762/bjnano.9.266

Atomic force microscope integrated with a scanning electron microscope for correlative nanofabrication and microscopy
I. W. Rangelow, M. Kästner, T. Ivanov, A. Ahmad, S. Lenk, C. Lenk, E. Guliyev, A. Reum, M. Hofmann, C. Reuter and M. Holz
Journal of Vacuum Science & Technology B 36, 06J102 (2018); doi: 10.116/1.5048524

Room-temperature single dopant atom quantum dot transistors in silicon, formed by field-emission scanning probe lithography
Z. Durrani, M. Jones, F. Abualnaja, C. Wang, M. Kästner, S. Lenk, C. Lenk, I.W. Rangelow and A. Andreev
Journal of Physics 124, 144502 (2018); doi: 10.1063/1.5050773

Theoretical investigation of the enhancement factor for a single field emitter in close proximitry to the counter electrode
S. Lenk, C. Lenk and I.W. Rangelow
Journal of Vacuum Science & Technology B 36, 06JL01 (2018); https://doi.org/10.1116/1.5046940

Field emission from diamond nanotips for scanning probe lithography
M. Hofmann, C. Lenk, T. Ivanov, I.W. Rangelow, A. Reum, A. Ahmad, M. Holz and E. Manske
Journal of Vacuum Science & Technology B 36, 06JL02 (2018); http://doi.org/10.1116/1.5048193

Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices
I.W. Rangelow, C. Lenk, M. Hofmann, T. Ivanov, S. Lenk, E. Guliyev, M. Kästner, A. Ahmad, A. Reum and M. Holz, C. Aydogan, M. Bicer and E. Alaca, O. Ates, H. Torun and A.D. Yalcinkaya
SPIE Nanophotonics Australasia 2017, Melbourne, edited by James W.M. Chron, Baohua Jia.
Proc. of SPIE Vol. 10456, 1045621-2. 2018 SPIE; doi: 10.1117/12.2282606

Atomic Layer Deposition for Spacer Defined Double Patterning of sub-10nm Titanium Dioxide Features
S. Dallorto, D. Staaks, A. Schwartzberg, X.M. Yang, K. Lee, I.W. Rangelow, S. Cabrini and D. Olynick
//iopscience.iop.org/article/10.1088/1361-6528/aad393/meta

Thermomechanically and electromagnetically actuated piezoresistive cantilevers for fast-scanning probe microscopy investigations
W. Majstrzyk, A. Ahmad, T. Ivanov, A. Reum, T. Angelov, M. Holz, T. Gotszalk and I.W. Rangelow
Sensors and Actuators A: Physical Volume 276, 15 June 2018, Pages 237 - 245
doi.org/10.1016/j.sna.2018.04.028

Towards alternative 3D nanofabrication in macroscopic working volumes
M. Kühnel, T. Fröhlich, R. Füßl, M. Hoffmann, E. Manske, I.W. Rangelow, J. Reger, C. Schäffel, S. Sinzinger and J.-P. Zöllner
Measurement Science and Technology 29 (Oct. 2018), 114002 (19pp)
doi.org/10.1088/1361-6501/aadb57

Experimental study of field emission from ultrasharp silicon, Diamond, GaN, and Tungsten tips in close proximity to the counter electrode
Claudia Lenk, Steve Lenk, Mathias Holz, Elshad Guliyev, Martin Hofmann, Tzvetan Ivanov, Ivo W. Rangelow, Mahmoud Behzadirad, Ashwin K. Rishinaramangalam, Daniel Feezell, and Tito Busani
Journal of Vacuum Science & Technology B 36, 06JL03 (Oct. 2018)
doi: 10.1116/1.5048518

Field-emission scanning probe lithography tool for 150 mm Wafer
Mathias Holz, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov, Alexander Reum, Martin Hofmann, Claudia Lenk, Marcus Kaestner, Christoph Reuter, Steve Lenk, Ivo W. Rangelow, and Nikolay Nikolov
Journal of Vacuum Science & Technology B 36, 06JL06 (Oct. 2018)
doi: 10.1116/1.5048357

Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale
Daniel Staaks, Deirdre L. Olynick, Ivo W. Rangelow, M. Virginia P. Altoe
Nanoscale, Nov. 2018,10, 22884-22895
doi: 10.1039/C8NR06669H

Magnetoelectric versus thermal actuation characteristics of shear force AFM probes with piezoresistive detection
A. Sierakowski, D. Kopiec, W. Majstrzyk, P. Kunicki, P. Janus, R. Dobrowolski, P. Grabiec, I.W. Rangelow and T. Gotszalk
Meas. Sci. Technol. 28 (2017) 034011 (10pp)
doi:10.1088/1361-6501/28/3/034011

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication
I.W. Rangelow, Tz. Ivanov, A. Ahmad, M. Kästner, C. Lenk, I.S. Bozchalooi, Fangzhou Xia, K. Youcef-Toumi, M. Holz and A. Reum
Citation: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement and Phenomena 35, 06G101 (2017)
doi.org/10.1116/1.4992073
Published by the American Vacuum Society

Monolithic technology for silicon nanowires in high-topograhpy architectures
M.N. Esfahani, M. Yilmaz, N. Wollschläger, I.W. Rangelow, Y. Leblebici and B.E. Alaca
Microelectronic Engineering xxx(2017)xxx-xxx
doi:10.1016/j.mee.2017.10.001

Low-energy electron exposure of ultrathin polymer films with scanning probe lithography
Y. Krivoshapkina, M. Kaestner, C. Lenk, S. Lenk and I.W. Rangelow
Microelectronic Engineering 177 (2017) pp. 78-86
DOI:/10.1016/j.mee.2017.02.021

Simulation of field emission from volcano-gated tips for scanning probe lithography
St. Lenk, M. Kästner, C. Lenk and I.W. Rangelow
Microelectronic Engineering 177 (2017) pp. 19-24
DOI:/10.1016/j.mee.2017.01.022

Scanning probe-based high-accuracy overlay alignment concept for lithography applications
V. Ishchuk, E. Guliyev, C. Aydogan, I. Buliev, M. Kaestner, Tzv. Ivanov, A. Ahmad, A. Reum, S. Lenk, C. Lenk, N. Nikolov, Th. Glinsner, I. W. Rangelow
Applied Physics A, 123(1), 1–12 (2017).
doi:10.1007/s00339-016-0681-8

Buchkapitel "Materials and Processes for Next Generation Lithography" Chapter 14
- Next generation lithography - the rise of unconventional methods ?
Frontiers of Nanoscience, Volume 11, 2017, Pages 479 - 495, Materials and Processes for Next Generation Lithography
Marcus Kaestner, Yana Krivoshapkina and Ivo W. Rangelow

Buchkapitel "Materials and Processes for Next Generation Lithography" Chapter 15
- Tip-based nanolithography methods and materials,
Frontiers of Nanoscience, Volume 11, 2017, Pages 497 - 542, Materials and Processes for Next Generation Lithography
Yana Krivoshapkina, Marcus Kaestner and Ivo W. Rangelow

2D Simulation of Fowler- Nordheim Electron Emission in Scanning Probe Lithography
S. Lenk, M. Kästner, C. Lenk, T. Angelov, Y. Krivoshapkina and I.W. Rangelow
Journal of Nanomaterial & Molecular Nanotechnology 2016, Volume 5, Issue 7
DOI: 10.4172/2324-8777.1000210

Fabrication Process for an Optomechanical Transducer Platform with Integrated Actuation
T. Michels, Ivo W. Rangelow and V. Aksyuk
Journal of Research of National Institute of Standards and Technology, Volume 121 (2016), doi.org/10.6028/jres.121.028

Magnetoelectric versus thermal actuation characteristics of shear force AFM probes with piezoresistive detection
A. Sierakowski, D. Kopiec, W. Majstrzyk, P. Kunicki, P. Janus, R. Dobrowolski, P. Grabiec, I.W. Rangelow and T. Gotszalk
NanoScale 2016, Vol. 28, N. 3, pp. 1234

Pattern-generation and pattern-transfer for single-digit nano devices
I.W. Rangelow et.al.
Journal of Vacuum Science and Technology B34 (6); doi: 10.1116/1.4966556

Low temperature dry etching of chromium towards control at sub-5nm dimensions
D. Staaks, X. Yang, K.Y. Lee, S.D. Dhuey, S. Sassolini, I.W. Rangelow and D.L. Olynick
Nanotechnology 27 (2016)415302 (9pp); doi:10.1088/0957-4484/27/41/415302

Control of first and higher transverse eigenmodes of active Atomic Force Microscope cantilevers
A. Schuh, I.W. Rangelow and K. Youcef-Toumi
Proceedings of the American Control Conference 2016-July pp. 7390

Large area fast-AFM scanning with active "Quattro" cantilever arrays
A.Ahmad. N. Nikolov, T. Angelov, Tzv. Ivanov, A. Reum, I. Atanasov, E. Guliyev, V. Ishchuk, M. Kästner, St. Lenk, C. Lenk, I.W. Rangelow and M. Holz
Journal of Vacuum Science & Technology B34, 06KM03 (2016); doi: 10.1116/1.4967159

Six-axis AFM in SEM with self-sensing and self-transduced cantilever for high speed analysis and nanolithography
T. Angelov, A. Ahmad, E. Guliyev, A. Reum, I. Atanasov, Tzv. Ivanov, V. Ishchuk, M. Kästner, Y. Krivoshapkina, St. Lenk, C. Lenk, I.W. Rangelow, M. Holz and N. Nikolov
Journal of Vakuum Science & Technology B34, 06KB01 (2016); doi: 10.1116/1.4964290

Thermo-mechanical transduction suitable for high-speed scanning probe imaging and lithography
T. Angelov, D. Roeser, T. Ivanov, S. Gutschmidt, T. Sattel and I.W. Rangelow
Microelectronic Engineering 154 (2016) 1-7

Cantilever array with optomechanical read-out and integrated actuation for simultaneous high sensitivy force detection
T. Michels, I.W. Rangelow and V. Aksyuk
IEEE OMN 2016 International Conference on Optical MEMS and Nanophotonics Volume 2016-September, 13 September 2016, Article number 7565883 21st International Conference on Optical MEMS and Nanophotonics, OMN 2016, Singapore, 31. July 2016 through 4. August 2016, Category number CFP16MOE-ART, Code 123772

Profile simulation model for sub-50nm cryogenic etching of silicon using S F 6 / O 2 inductively coupled plasma
V. Ishchuk, D.L. Olynick, Z. Liu and I.W. Rangelow
Citation: Journal of Applied Physics 118, 053302 (2015); doi: 10.1063/1.4927731
View online: http://dx.doi.org/10.1063/1.4927731

Determination of AFM-Cantilever spring constants using the TU Ilmenau force displacement measurement device
Ch. Diethold, M. Kühnel, Tzv. Ivanov, I.W. Rangelow and Th. Fröhlich
XXI IMEKO World Congress "Measurement in Research and Industry" August 30 - September 4, 2015, Prague, Czech Republic

Optical probe for nondestructive wafer- scale characterization of photonic elements
T. Michels, I.W. Rangelow and V. Aksyuk
Journal of Latex Class Files, Vol.14, No. 8 (2015)

Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patternin
D.L. Olynick, P. Perera, A. Schwartzberg, P. Kulshreshta, D.G. De Oteyza, N. Jarnagin, C. Henderson, Z. Sun, I. Gunkel, T. Russell, M. Budden and I.W. Rangelow
Journal of Photopolymer Science and Technology, Volume 28, Number 5, pp. 663-668 (2015)

Estimator Based Multi-Eigenmode Control of Cantilevers in Multifrequency Atomic Force Microscopy
A. Schuh, I. S. Bozchalooi, I.W. Rangelow and K. Youcef-Toumi
2015 American Control Conference, Palmer House Hilton, July 1-3, Chicago, IL, USA
978-1-4799-8684-2/$31.00,2015 AACC

Tip Motion-Sensor Signal Relation for a Composite SPM/SPL Cantilever
D. Roeser, S. Gutschmidt, T. Sattel and I.W. Rangelow
Volume: PP, Issue: 99, Pages: 1 - 3, 2015
DOI: 10.1109/JMEMS.2015.2482389

Ultrathin transparent photodetector for use in Standing-Wave-Interferometer
I. Ortlepp, H.-J. Büchner, Tzv. Ivanov, M. Hofer, J.-P. Zöllner, I.W. Rangelow and E. Manske
XXI IMEKO World Congress "Measurement in Research and Industry" August 30 - September 4, 2015, Prague, Czech Republic

Profile simulation model for sub-50nm cryogenic etching of silicon using SF6/O2 inductively coupled plasma
V. Ishchuk, D.L. Olynick, Z. Liu and I.W. Rangelow
Journal of Applied Physics 118, 053302 (2015); doi: 10.1063/1.4927731

Fast atomic force microscopy with self-transduced, self-sensing cantilever
A. Ahmad, Tzv. Ivanov, T. Angelov and I.W. Rangelow
Journal of Micro/Nanolith. MEMS MOEMS 14(3) 031209 (Jul-Sep 2015)

Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patterning
D.L. Olynick, P. Perera, A. Schwartzberg, P. Kulshrethshta, D.G. De Oteyza, N. Jarnagin, C. Henderson, Z. Sun, I. Gunkel, T. Russell, M. Budden and I.W. Rangelow
Journal of Photopolymer Science and Technology, Volume 28, (5) pp. 663-668, 2015

Multi-eigenmode control for high material contrast in bimodal and higher harmonic atomic force microscopy
A. Schuh, I. Soltani Bozchalooi, Ivo W. Rangelow and K. Youcef-Toumi
Nanotechnology 26 (2015) 235706 (14pp); doi:10.1088/0957-4484/26/23/235706

Advanced electric-field scanning probe lithography on molecular resist using active cantilever
M. Kaestner, C. Aydogan, Tzv. Ivanov, St. Lenk, A. Ahmad, T. Angelov, A. Reum, V. Ishchuk, I. Atanasov, Y. Krivoshapkina, M. Hofer, M. Holz and I.W. Rangelow
Journal of Micro/Nanolith. MEMS and MOEMS Vol. 14(3), 031202 (Jul-Sep 2015)

Self-actuated, self-sensing cantilever for fast CD measurement
A. Ahmad, Tzv. Ivanov, A. Reum, E. Guliyev, T. Angelov, A. Schuh, M. Kaestner, I. Atanasov, M. Hofer, M. Holz and I.W. Rangelow
Proc. SPIE. 9424, Metrology, Inspection and Process Control for Microlithography XXIX, 94240P.
doi: 10.1117/12.2085760 (March 19, 2015)

Tailored molecular glass resists for scanning probe lithography
Chr. Neuber, H.-W. Schmidt, P. Strohriegl, A. Ringk, T. Kolb, A. Schedl, V. Fokkema, Marijin G.A. van Veghel, M. Cooke, C. Rawlings, U. Dürig, A. Knoll, J.-F. de Marneffe, Ziad el Otell, M. Kaestner, Y. Krivoshapkina, M. Budden and I.W. Rangelow
Proc. SPIE. 9425, Advances in Pattering Materials and Processes XXXII, 94250E. (March 20, 2015)
doi: 10.1117/12.2085734, (March 19, 2015)

Active Microcantilevers for High Material Contrast in Harmonic Atomic Force Microscopy
A. Schuh, M. Hofer, Tzv. Ivanov and I.W. Rangelow
IEEE Journal of Microelectromechanical Systems, JMEMS-2015.2428677

Fabrication of self-actuated piezoresistive thermal probes
M. Hofer, Tzv. Ivanov, M. Rudek, D. Kopiec, E. Guliyev, T.P. Gotszalk and I.W. Rangelow
Microelectronic Engineering, Volume 145, 1. September 2015, Pages 32-37 doi:10.1016/j.mee.2015.02.016

Low frequency measurements using piezoresistive cantilever MEMS devices - the problem of thermal drift
Procedia Engineering 87 (2014) , 1259 - 1262
G. Jozwiak, D Kopiec, T. Gotszalk, P. Grabiec and I.W. Rangelow

Local formation of nitrogen-vacancy centers in diamond by swift heavy ions
JOURNAL OF APPLIED PHYSICS 116, 214107 (2014); doi: 10.1063/1.4903075
J. Schwartz, S. Aloni, D.F. Ogletree, M. Tomut, M. Bender, D. Severin, C. Trautmann, I.W. Rangelow and T. Schenkel

Scanning probes in nanostructure fabrication
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 32, 06F101 (2014); doi: 10.1116/1.4897500
M.Kästner, Tzv. Ivanov, A. Schuh, A. Ahmad, T. Angelov, Y. Krivoshapkina, M. Budden, M. Hofer, St. Lenk, J.-P. Zöllner, Ivo W. Rangelow, A. Reum, E. Guliyev, M. Holz and N. Nikolov

Adaptive AFM scan speed control for high aspect ratio fast structure tracking
Review of Scientific Instruments 85, 103706 (2014); doi: 10.1063/1.4897141
A. Ahmad, A. Schuh and I.W. Rangelow

Parallel SPM cantilever arrays for large area surface metrology and lithography
Proc. of SPIE Vol. 9050 90500W-1, 2014
Teodor Gotszalk, Tzvetan Ivanov and Ivo W. Rangelow

Shear force microscopy using piezoresistive cantilevers in surface metrology
SPIE, (9236-10) Advanced Scanning Microscopies 2014
Teodor P. Gotszalk, Daniel Kopiec, Andrzej Sierakowski, Pawel Janus, Piotr B. Grabiec,  Ivo W. Rangelow

Fast SPM Scanning Stage
ACTUATOR 2014, 14th International Conference on New Actuators, Bremen, Germany, 23-25 June 2014, S. 589-592
E. Guliyev, A. Ahmad, M. Kästner, T. Angelov, S. Lenk, I. Atanasov, N. Nikolov, T. Ivanov, K. Szostak, M. Holz, A. Reum, M. Hofer, K. Nieradka, T. Hrasok, H. Lipowicz, B. Volland, V. Ishchuk, J.-P. Zöllner and I.W. Rangelow

Single mask fabrication process for movable MEMS devices
Microsystem Technologies, Micro- and Nanosystems Information Storage and Processing Systems; ISSN 0946-7076, Volume 20, Numbers 4-5
Microsyst Technol (2014) 20:955-961, DOI 10.1007/s00542-014-2098-7
Ali B. Alamin Dow, Adel Gougam, Nazir P. Kherani and I.W. Rangelow

Focused ion beam assisted fabrication and application of high speed scanning thermal microscopy selfacuated piezoresistive probe
THE 58th, INTERNATIONAL CONFERENCE on ELECTRON, ION and PHOTON BEAM TECHNOLOGY & NANOFABRICATION, Washington, DC, May 27 - May 30, 2014
M. Rudek, D. Kopiec and T. Gotszalk, M. Hofer, Tzv. Ivanov, E. Guliyev and I.W. Rangelow, (to be published in JVST, B)

Cavity optical transducer for scanning probe microscopy
THE 58th, INTERNATIONAL CONFERENCE on ELECTRON, ION and PHOTON BEAM TECHNOLOGY & NANOFABRICATION, Washington, DC, May 27 - May 30, 2014
T. Michels, J. Zou, H. Miao, V. Aksyuk, I.W. Rangelow, NIST, (to be published in JVST, B)

Molecular glass resists for scanning probe lithography
Proc. of SPIE Vol. 9049 90491V-1
Ch. Neuber, A. Ringk, T. Kolb, F. Wieberger, P. Strohriegl, H.-W. Schmidt, V. Fokkema, M. Cooke, C. Rawlings, U. Dürig, A. Knoll, J.-F. de Marneffe, P. de Schepper, M. Kästner, Y. Krivoshapkina, M. Budden and I.W. Rangelow

Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever
Proc. of SPIE Vol. 9049 90490C-1
M. Kästner, K. Nieradka, Tzv. Ivanov, St. Lenk, Y. Krivoshapkina, A. Ahmad, T. Angelov, E. Guliyev, A. Reum, M. Budden, T. Hrasok, M. Hofer, Ch. Neuber and I.W. Rangelow

Review of scanning probe micromachining and its applications within nanoscience
Microelectronic Engineering 2014, doi.org/10.1016/j.mee.2014.02 Page 5
T. Michels and Ivo W. Rangelow, (available online 24.02.2014)

Microthermomechanical infrared sensors
Opto-Electronics Review 22 (1), 1-15, 2014, DOI: 10.2478/s11772-014-0176-0
M. Steffanson and I.W. Rangelow

Thermographischer Detektor basierend auf einem neuartigen Mikro-Spiegel Sensor
tm - Technisches Messen 2014, DOI: 10.1515/teme-2014-1017
Ivo W. Rangelow, Stefan Sinzinger, Marek Steffanson, Mathias Holz, Tzvetan Ivanov, Roman Kleindienst and Ranald Kampmann

ViPER: simulation software for high aspect ratio plasma etching of silicon
V. Ishchuk, B. E. Volland and I.W. Rangelow
Microsyst Technol DOI 10.1007/s00542-013-1926-5; 26. September 2013

Mix & Match Electron Beam and Scanning Probe Lithography for sub-5 nm Pattering
M. Kaestner, M. Hofer and I.W. Rangelow
The 57th International Conference on Electron, Ion and Photon beam Technology & Nanofabrication, Gaylord Opryland Resort Nashville, TN May 28 - May 31, 2013

Sub-10nm silicon nano-structures based on block copolymer lithography and high selectivity cryogenic temperature dry etching
D. Olynick, Zuwei Liu, Xiaodan Gu, Th. Russell, U. Mass Amherst, Justin Hwu, V. Ishchuk and I.W. Rangelow
Nanotech 2013

Scanning probe lithography for electronics at the 5nm scale
Z. Durrani, M. Kaestner, M. Hofer, Tzv. Ivanov and I.W. Rangelow
SPIE 2013 Advanced Lithography 24-28 February 2013 SPIE Newsroom (Cache)

Scanning Probe Lithography approach for beyond CMOS devices
Z. Durrani, M. Jones, M. Kaestner, M. Hofer, E. Guliyev, A. Ahmad, Tzv. Ivanov, J.-P. Zoellner and I.W. Rangelow
Advanced Lithography, Proc. SPIE - Int. Soc. Opt. Eng. 2013, Vol. 8680, 868017-4

0.1-nanometer resolution positioning stage for sub-10nm scanning probe lithography
N. Vorbringer-Doroshovets, F. Balzer, E. Manske, M. Kaestner, A. Schuh, J.-P. Zoellner, M. Hofer, E. Guliyev, A. Ahmad, Tzv. Ivanov and I.W. Rangelow
Advanced Lithography, Proc. SPIE - Int. Soc. Opt. Eng. 2013, Vol. 8680, 868016-1

Mix & Match Electron Beam & Scanning Probe Lithography for high troughput sub-10nm Lithography
M. Kaestner, M. Hofer and I.W. Rangelow
Advanced Lithography, Proc. SPIE - Int. Soc. Opt. Eng. 2013, Vol. 8680, 868019-1

Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography
M. Kaestner, M. Hofer and I.W. Rangelow
J. Micro/Nanolith. MEMS MOEMS  Vol. 12(3), 031111-1 - 031111-13 (Jul-Sep 2013)

Parallelized scanning probe microscopy by an integrated dual-cantilever transducer with independent actuation and shared cavity-optomechanical readout
T. Michels, I.W. Rangelow and V. Aksyuk, Member, IEEE
JOURNAL OF LATEX CLASS FILES, VOL. 11, NO. 4, DECEMBER 2012

Improved single ion implantation with scanning probe alignment
M. Ilg, Chr. D. Weis, J. Schwartz, A. Persaud, Qing Ji, Cheuk Chi Lo, J. Bokor, A. Hegyi, E. Guliyev, I.W. Rangelow and Th. Schenkel
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 30(6), Nov/Dec 2012

Charging effect simulation model used in simulations of plasma etching of silicon
V. Ishchuk, B.E. Volland, M. Hauguth, M. Cooke and I.W. Rangelow
Journal of Applied Physics (2012), Volume 112, Issue 8

Encased Cantilevers and Alternative Scan Algorithms for Ultra-Gantle High Speed Atomic Force Microscopy
P. Ashby, D. Ziegler, A. Frank-Hauguth, Sindy Frank-Hauguth, A. Chen, T. Meyer, R. Farnham, N. Huynh, I.W. Rangelow, J.-M. Chang and A. Bertozzi
Biophysical Journal, Volume 102, Issue 3, Supplement 1, 31 January 2012, Page 586a

The spring constant calibration of the piezoresistive cantilever based biosensor
G. Jòzwiak, D. Kopiec, P. Zawierucha, T. Gotszalk, P. Janus, P. Grabiec, I.W. Rangelow
Sensors and Actuators B: Chemical, Volume 170, 31 July 2012, pp. 201-206

ARCH-type micro-cantilever FPA for uncooled IR detection
M. Steffanson, K. Gorovoy, V. Ramkiattisak, Tzv. Ivanov, J. Kròl, H. Hartmann and I.W. Rangelow
Microelectronic Engineering Volume 98 (2012) Pages 614-618

Increased imaging speed and force sensitivity for bio-applications with small cantilevers using a conventional AFM setup
M. Leitner, G. E. Fantner, E. J. Fantner, K. Ivanova, Tzv. Ivanov, I. W. Rangelow, A. Ebner, M. Rangl, J. Tang and P. Hinterdorfer
Micron, Volume 43, Issue 12 (December 2012) Pages 1399-1407

Irregular film thickness distribution in C4F8 inductively coupled plasma polymer deposition
B.E. Volland, M. Hauguth, V. Ishchuk, I.W. Rangelow and A.L. Goodyear
Microelectronic Engineering Volume 98 (2012) Pages 524 - 527

High speed quasi-monolithic silicon/piezostack SPM scanning stage
E. Guliyev, Th. Michels, B.E. Volland, Tzv. Ivanov, M. Hofer and I.W. Rangelow
Microelectronic Engineering Volume 98 (2012) Pages 520 - 523

Scanning Probe Nanolithography on Calixarene
M. Kästner and Ivo W. Rangelow
Microelectronic Engineering (2012), Pages 96-99

Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment
M. Kästner and I.W. Rangelow
Proc. SPIE 8323, 83231G (2012)

Micromachined self-actuated piezoresistive cantilever for high speed SPM
Th. Michels, E. Guliyev, M. Klukowski and I.W. Rangelow
Microelectronic Engineering Volume 97 (2012) Pages 265 - 268

Quasi-monolithic integration of silicon-MEMS with piezoelectric actuators for high-speed non-contact atomic force microscopy
E. Guliyev, B.E. Volland, Y. Sarov, Tzv. Ivanov, M. Klukowski, E. Manske and I.W. Rangelow
Meas. Sci. Technol. 23(2012)074012(8pp); Online at stacks.iop.org/MST/23/074012

Development and modeling of an electrothermally MEMS microactuator with an integrated microgripper
A.B. Alamin Dow, B. Jazizadeh, Nazir P. Kherani and I.W. Rangelow
Journal of Micromechanics and Microengineering 21 (2011) 125026 (8pp)

Scanning proximal probe lithography for sub-10 nm resolution on calix(4) resorcinarene
M. Kaestner and I. W. Rangelow
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 29(6), Nov/Dec 2011

High-Speed Video Nano-Resonator
M. Hofer, Ivo W. Rangelow
GIT Labor-Fachzeitschrift 55. Jahrgang, Juni 2011, S. 41

Integrated tool and feature 2D plasma processing simulator, used for a modeling of cryogenic plasma etching of silicon
V. Ishchuk, B.E. Volland, M. Hauguth and Ivo W. Rangelow
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2011/2012

• Nanoscale Engineering and Optical Addressing of Single Spins in Diamond
  S. Pezzagna, D. Wildanger, P. Mazarov, A. Wieck, Y. Sarov, I.W. Rangelow, B. Naydenov, F. Jelezko, S.W. Hell ans J. Meijer
  Small 6 (2010) 2117-2121
  
  
• Near-IR micro-fluidic sensing by total internal reflective diffraction
  Y. Sarov, V. Sarova, I. Capek and I.W. Rangelow
  J. Phys.: Conf. Ser. 253 (2010) 012051 (pg. 1-7)
  
  
• In situ study of adsorption/desorption of protein on self-actuated piezoresistive SPM-cantilever
  J.A. Mielczarski, Y.L. Jeyachandran, E. Mielczarski, T. Gotszalk, I.W. Rangelow, N. Nikolov
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 317-321
  
  
• Pressure, Relative Humidity and Temperature Measurement using Microcantilevers with Integrated Bimorph Actuator and Piezoresistive Read-out
  J. Schwartz, Ch. Bitterlich, V. Sarova, Ph. Michaelides, A. Frank, Y. Sarov, Tzv. Ivanov, J.-P. Zöllner, I.W. Rangelow, M. Höche, W. Hummel, N. Nikolov
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 307-316
  
  
• Self-actuated Piezoresistive Cantilever based AFM for Single Ion Implantation
  A. Schuh, Y. Sarov, Tzv. Ivanov, I.W. Rangelow, C.D. Weis, A. Batra, A. Persaud, T. Schenkel
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 299-306
  
  
• Integration of Self-actuating Piezoresistive Cantilever based AFM into SEM
  U. Wenzel, Tzv. Ivanov, I.W. Rangelow, D.F. Ogletree
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 295-298
  
  
• Two Chip Integration of Sensor and ASIC using a Modular Through Silicon Via Concept
  S. Kolb, A. Niklas, H. Theuss, B. Winkler, U. Fakesch, I.W. Rangelow, O. Blom
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 287-293
  
  
• Large Area Surface Measurements using PRONANO Array Cantilevers
  M. Zielony, P. Zawierucha, M. Woszczyna, G. Jòzwiak, T. Gotszalk, Y. Sarov, Tzv. Ivanov, A. Frank, J.-P. Zöllner, I.W. Rangelow
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 273-278
  
  
• High Eigenmode Operation of Cantilevers with Integrated Piezoresistive Readout and Bimetal Actuator
  M. Woszczyna, P. Zawierucha, P. Paletko, M. Zielony. T. Gotszalk, Y. Sarov, Tzv. Ivanov, A. Frank, J.-P. Zöllner, I.W. Rangelow
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 243-253
  
  
• Self-Oscillation Technology for Cantilever SPM Array
  N. Nikolov, N. Kenarov, P. Popov, T. Gotszalk, M. Woszszyna, P. Zawierucha, I.W. Rangelow, Y. Sarov
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 225-231
  
  
• FPGA based High-Throughput Data Transfer System for Large SPM Arrays
  N. Kenarov, N. Nikolov, P. Popov, I.W. Rangelow, T. Gotszalk
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 217-224
  
  
• Measurement and Control System for PRONANO 1D Cantilever Arrays
  P. Zawierucha, M. Woszczyna, M. Zielony, D. Kopiec, G. Jòzwiak, K. Garczyski, T. Gotszalk, Y. Sarov, Tzv. Ivanov, A. Frank, J.-P. Zöllner, I.W. Rangelow, R. Pedrau, P.E. Latimier, N. Nikolov
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 209-215
  
  
• Micro-machined Parallel up to 8x64 Cantilever Arrays with Planar and Vertical Interconnections for Large Area Imaging
  Y. Sarov, Tzv. Ivanov, A. Frank, V. Sarova, J.-P. Zöllner, I.W. Rangelow
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 179-206
  
  
• Suppression of Cross-Talk Effects of Self Actuated Piezoresistive SPM-Cantilever Arrays
  A. Frank, J.-P. Zöllner, Y. Sarov, Tzv. Ivanov, I.W. Rangelow
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 169-178
  
  
• Fabrication of Parallel Cantilever Systems with Sharp AFM Tips for Surface Scanning and Analysis
  Y. Sarov, T. Ivanov. A. Frank, V. Sarova, U. Wenzel, J.-P. Zöllner, I.W. Rangelow, N. Nikolov, P. Zawierucha, M. Woszczyna, T. Gotszalk
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 163-168
  
  
• Development of a plasma etching process for vertical interconnections using DoE
  W. Schumann, B. Volland, I.W. Rangelow
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 119-128
  
  
• Basic Principles of Self-actuated Piezoresistive SPM-Cantilevers
  I.W. Rangelow, Tzv. Ivanov, Y. Sarov, J.-P. Zöllner, A. Frank, T. Gotszalk
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 89-98
  
  
• Microcantilever Deflection Measurements
  R.J. Dunn, T. Sulzbach, I.W. Rangelow
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 57-85
  
  
• Mechanics of Microcantilevers
  R.J. Dunn, Ch. Bitterlich, I.W. Rangelow, T. Sulzbach
  in PRONANO- Proceedings of the Integrated Project on Massively Parallel Intelligent Cantilever Probe Platforms for Nanoscale Analysis ans Synthesis (Ed. Th. Sulzbach, I.W. Rangelow), ISBN 978-386991-177-9, Verlagshaus Monsenstein und Vannerdat OHG Muenster, (2010) 35-56
  
  
• Thermally driven multi-layer actuator for 2D cantilever arrays
  Y. Sarov, Tz. Ivanov, A. Frank, I.W. Rangelow
  Applied Physics A, January 2011, Volume 102, Issue 1, pp 61-68, First online: 19 October 2010
  
  
• Micromachined scanning proximal probes with integrated piezoresistive readout and bimetal actuator for high eigenmode operation
  M. Woszczyna, P. Zawierucha, P. Paletko, M. Zielony, T. Gotszalk, Y. Sarov, Tz. Ivanov, A. Frank, J.-P. Zöllner, I.W. Rangelow
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B, 28 (2010) C6N13 (pg. 1-6)
  
  
• Nanoprobe maskless lithography
  I.W. Rangelow, Tz. Ivanov, Y. Sarov, A. Schuh, A. Frank, H. Hartmann, J.-P. Zöllner, D. Olynick, V. Kalchenko
  Proc. SPIE, 7637 (2010) 76370V-1-10, doi:10.1117/12.852265
  
  
• Crosstalk effects in self-actuated piezoresistive cantilever arrays
  A. Frank, J.-P. Zöllner, Y. Sarov, Tz. Ivanov, I.W. Rangelow, N. Nikolov, M. Swiatkowski, T. Gotszalk, I. Chakarov
  submitted to IEEE JMEMS 2010
  
  
• "Realization of cantilever arrays for parallel proximity imaging"
  Y. Sarov, Tz. Ivanov, A. Frank, J.-P. Zöllner, N. Nikolov, I.W. Rangelow
  J. Phys.: Conf. Ser. 253 (2010) 012050 (pg. 1-7)
  
  
• "Micromachined scanning proximal probes with integrated piezoresistive readout and bimetal actuator for high eigenmode operation"
  M. Woszczyna, P. Zawierucha, P. Paletko, M. Zielony, T. Gotszalk, Y. Sarov, Tz. Ivanov, A. Frank, J.-P. Zöllner, I.W. Rangelow
  54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), Anchorage, Alaska, June 1 - 4, 2010
  
  
• "Nanoprobe maskless lithography", invited lecture atconference- SPIE- "Alternative Lithographic Technologies II"
  I.W. Rangelow, Tz. Ivanov, Y. Sarov, A. Schuh, A. Frank, H. Hartmann, J.-P. Zöllner, D. Olynick, V. Kalchenko
  23-25 Februar 2010, San Jose California USA
  
  
• Arch-type microcantilever as uncooled infrared detectors
  M. Steffanson, T. Ivanov, F. Shi, H. Hartmann and I.W. Rangelow
  Sensoren und Messsysteme 2010, ISBN 978-3-8007-3260-9 VDE Verlag GmbH Berlin Offenbach, pp.339
  
  
• Prallel Cantilever Systems for Scanning and Analysis
  A. Frank, T. Ivanov, Y. Sarov, J.-P. Zöllner, G. Bischoff, P. Zawierucha, M. Zielony, T. Gotszalk, N. Nikolov and I.W. Rangelow
  Sensoren und Messsysteme 2010, ISBN 978-3-8007-3260-9, VDE Verlag GmbH, Berlin und Offenbach, pp.334-338
  
  
• Silicon Nanoresonator
  M. Hofer, Th. Stauden, S.A.K. Nomvussi, J. Petzoldt and I.W. Rangelow
  Sensoren und Messsysteme 2010, ISBN 978-3-8007-3260-9 VDE Verlag GmbH Berlin Offenbach, pp.330-333
  
  
• Self-actuated micro-cantilever array with piezoresistive readout for multi-parameter recognition
  C. Bitterlich, T. Ivanov, Y. Sarov, V. Sarova, J.-P. Zöllner, U. Wenzel, M. Höche, W. Hummel and I.W. Rangelow
  Sensoren und Messsysteme 2010, ISBN 978-38007-3260-9 VDE Verlag GmbH Berlin und Offenbach, pp.306-310
  
  
• Realization of cantilever arrays for parallel proximity imaging
  Y. Sarov, Tzv. Ivanov, A. Frank, J.-P. Zöllner, N. Nikolov and I.W. Rangelow
  J. Phys.: Conf. Ser. 253/012050 (2010)
  
  
• Microgripper for Micro- and Nanoresearch
  B.E. Volland, Tzv. Ivanov, M. Steffanson, J. False and I.W. Rangelow
  SENSOR MAGAZIN 2/2010, pp. 57 (2010)
  
  
• Mikrogreifer für die Mikro- und Nanoforschung
  B. Volland, T. Ivanov, M. Steffanson, J. False und I.W. Rangelow
  SENSOR MAGAZIN 2/2010, S. 23-25
  
  
• Micromachined array of self-actuated piezoresistive proximal probes for parallel surface imaging
  T. Gotszalk, P. Zawierucha, M. Zielony, J.-P. Zöllner, Y. Sarov, A. Frank, Tzv. Ivanov, I.W. Rangelow, N. Nikolov, R. Persaud and P.-E. Latimer.
  
  
• PRONANO: Schlüsseltechnologie zur Analyse und Manipulation in der Nano-Technologie mittels paralleler Cantilever-Arrays
  A. Frank, J.-P. Zöllner, Y. Sarov, Tzv. Ivanov , I.W. Rangelow, M. Woszczyna, P. Zawierucha, M. Zielony und T. Gotszalk.
  Veröffentlichung im Tagungsband zum 2. Landshuter Symposium Mikrosystemtechnik, Landshut 24.-25.Feb. 2010, (ed. Prof. H. Gesch, U. Vogl, Th. Weber-Reichart (Cluster Mikrosystemtechnik)), ISBN 978-3-00-030325-8- in Germany
  
  
• Packaging von selbstaktuierten piezoresistiven Cantilever-Arrays
  G. Bischoff, K.-H. Drüe, J. Müller, Y. Sarov, A. Frank, J.-P. Zöllner, Tzv. Ivanov, I.W. Rangelow, M. Woszczyna, P. Zawierucha, M. Zielony und T. Gotszalk.
  Veröffentlichung im Tagungsband zum 2. Landshuter Symposium Mikrosystemtechnik, Landshut 2010, ISBN 978-3-00-030325-8
  
  
• Nanostructuring techniques for 3C-SiC (100) NEMS structures
  M. Hofer, Th. Stauden, I.W. Rangelow and J. Pezoldt
  Mater Sci. Forum Vols. 645-648 (2010), 841-844

• Crosstalk effects in self-actuated cantilever arrays
  A. Frank, J.-P. Zöllner, Y. Sarov, Tzv. Ivanov, I. Chakarov and I. W. Rangelow
  JMEMS-2009-0209
• Parallel proximal probe arrays with vertical interconnections
  Y. Sarov, A. Frank, Tzv. Ivanov, J.-P. Zöllner, K. Ivanova, B. Volland , I. W. Rangelow, A. Brogan, R. Wilson, P. Zawierucha, M. Zielony, T. Gotszalk, N. Nikolov, M. Zier, B. Schmidt and I. Kostic
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B27(6), Nov/Dec 2009; 1071-1023/2009/27(6)/3132/7/
• Kinetics and colloidal parameters of miniemulsion polymerization of butyl acrylate
  U. Yildiz, I. Capek, Y. Sarov, M. Corobea and J. Polovkova
  Polymer International 58 (2009) pp. 1411-1421
• Mapping of ion beam induced current changes in FinFETs
  C.D. Weis, A. Schuh, A. Batra, A. Persaud, I.W. Rangelow, J. Bokor, C.C. Lo, S. Cabrini, D. Olynick, S. Duhey, T. Schenkel.
  Nuclear Instruments and Methods in Physics Research B 267 (2009) 1222-1225
• Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator
  M. Hauguth, B.E. Volland, V. Ishchuk, D. Dressler, T. Danz, I.W. Rangelow, G. Kokkoris, P. Geka, A. Panagiotopoulos, E. Gogolides, A. Goodyear, M. Cooke
  Microelectronic Engineering 2009, Eng. 86, pp. 976
• "DMCMN: In Depth Characterization and Control of AFM Cantilevers with Integrated Sensing and Actuation"
  Georg E. Fantner, Daniel J. Burns, Kamal Youcef-Toumi, Angela M. Belcher, Ivo W. Rangelow
  Journal of Dynamic Systems, Measurement , and Control Copyrigth 2009 by ASME November 2009, Vol. 131 / 061104-1
• "Use of actuating and self sensing cantilevers for imaging biological samples in liquid"
  G.E. Fantner, W. Schumann, R.J. Barbero, A. Deutschinger, V. Todorov, D.S. Gray, A.M. Belcher, I.W. Rangelow and K.Youcef-Toumi
  Nanotechnology 20 (2009) 434003 (10pp)
• "Packaging von selbstaktuierten piezoresistiven Cantilever-Feldern"
  Gernot Bischoff, Yanko Sarov, Andreas Frank, Jens-Peter Zöllner, Tzvetan Ivanov, Karl-Heinz Drüe, Jens Müller and Ivo W. Rangelow
  MST 2009
• "Packaging of self-actuated piezoresistive cantilever-arrays"
  Gernot Bischoff, Yanko Sarov, Andreas Frank, Jens-Peter Zöllner, Tzvetan Ivanov, Karl-Heinz Drüe, Jens Müller and Ivo W. Rangelow
  MST 2009
• "Imaging Cellular and Viral materials with small cantilevers developed for high speed Atomic Force Microscopy"
  Georg E. Fantner, Tzvetan Ivanov, Katerina Ivanova, David Gray, Ivo W. Rangelow, Paul K. Hansma and Angela M. Belcher
  MRS proceedings 2009
• "Quantitative force and mass measurements using the cantilever with integrated actuator and deflection detector"
  M. Woszczyna, P. Zawierucha, M. Swiatkowski, T. Gotszalk, P. Grabiec, N. Nikolov, J. Mielczarski, E. Mielczarska, N. Glezos, Tzv. Ivanov, K. Ivanova, Y. Sarov and I.W. Rangelow
  Microelectronic Engineering 86 (2009) pp. 1043-1045
• "Thermally driven piezoresistive cantilevers for shear-force microscopy"
  M. Woszczyna, T. Gotszalk, P. Zawierucha, M. Zielony, Tzv. Ivanov, K. Ivanova, Y. Sarov, N. Nikolov, J. Mielczarska and I.W. Rangelow
  Microelectronic Engineering 86 (2009) pp. 1212-1215
• "New generation cantilever arrays with vertical interconnections for large-scale parallel proximity surface scanning"
  Yanko Sarov, Andreas Frank, Tzvetan Ivanov, Jens-Peter Zöllner and Ivo W. Rangelow
  proceedings of the 54th IWK (Internationales Wissenschaftliches Kolloquium), Workshop "PRONANO" Edited P. Scharff, TU-Ilmenau, 10. Sept. 2009 (2009) 1-15.
• "Self-oscillation technology in multicantilever scanning Systems"
  N. Nikolov, P. Popov, T. Gotszalk, M. Woszczyna and I.W. Rangelow
  IWK TU Ilmenau 2009 (im Druck)Sen
• Sensitivity enhancement of an integrated micro-fluidic system, based on diffraction under total internal reflection
  Y.Sarov, Tzv. Ivanov, V. Sarova, I. Capek and I.W. Rangelow
  Journal of optoelectronics and advanced materials, Vol.11, No.10, October 2009, pp. 1456-1459
• Data Modeling for Tools and Technologies for the Analysis and Synthesis of  NANOstructures (TASNANO) Project
  M. Giacomini, I.W. Rangelow, L. Pastorino, T. Gotszalk,  F. Caneva Soumetz, J.A. Mielczarski, N. Glezos, E. Mielczarski, E. Huq and C. Ruggiero
  Journal of Information Technology Research, 2(3), 49-70, July-September 2009

• Experimental setup for characterization of self-actuated microcantilevers with piezoresistive readout for chemical recognition of volatile substances
  D. Filenko, T. Ivanov, B.E. Volland, K. Ivanova, I.W. Rangelow, N. Nikolov, T. Gotszalk and J. Mielczarski
  Review of Scientific Instruments 79, 094101 (2008); doi: 10.1063/1.2976038
  
  
• Design and Fabrication of a Horizontal Thermal Micro-Actuator with Integrated Micro tweezers
  A. Badar Alamin Dow, K. Ivanova, T. Ivanov and I. W. Rangelow
  Advances in Science and Technology Vol. 54 (2008) pp. 378-383
  
  
• Integrated IR laser system for micro-fluidic detection and analysis
  Y. Sarov, I. Capek, Tzv. Ivanov, K. Ivanova, V. Sarova and I.W. Rangelow
  Chemical Engineering Journal 135, S1 (2008) pp. 284-287
  
  
• On Total Internal Reflection in Investigation of Nanoparticles by Integrated Micro-Fluidic System
  Y. Sarov, I. Capek, Tzv. Ivanov, K. Ivanova, V. Sarova and I.W. Rangelow
  NanoLetters,8, (2008) pp. 375-381
  
  
• Compact Modelling of Electrical, Mechanical and Thermal Behaviour MEMS with SPICE
  A. Frank, J.-P. Zöllner, Y. Sarov, Tzv. Ivanov, I. Kuhnholz, St. Klett, I.W. Rangelow, M. Swiatkowski, T. Gotszalk, N. Nikolov
  MRS 2008 Spring Proceedings, Symposium R, 2008
  
  
• Investigation of Crosstalk in Cantilever Arrays
  A.Frank, J.-P. Zöllner, Y. Sarov, Tz. Ivanov, St. Klett, T. Gotszalk, M. Zielony, P. Zawierucha, B. Schmidt, M. Zier, M. Nikolov, W. Engl, T. Sulzbach, D. Dontsov, E. Langlotz, W. Schott and I.W. Rangelow
  Proceedings Eurosensors / XXII, Dresden, Germany, pp. 744-747, 2008
  
  
• SPICE and FEM based design of self-actuated piecoresistive cantilever arrays for parallel imaging
  A. Frank, J.-P. Zöllner, Y. Sarov, Tz. Ivanov, St. Klett and I.W. Rangelow
  International Workshop on Nanomechanical Cantilever Sensors 2008, Mainz, Germany, May 19-21, 2008
  
  
• Towards the implanting of ions and nanoparticles with nm spatial resolution
  J. Meijer, S. Pezzagna, T. Vogel, B. Burchard, H.H. Bukow, I.W. Rangelow, Y. Sarov, H. Wiggers, I. Plümel, F. Jelezko, J. Wrachtrup, F. Schmidt-Kaler, W. Schnitzler and K. Singer
  Appl. Phys. A - Materials Science & Processing, Appl. Phys. A 00, 1-5 (2008)
  
  
• New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations
  M. Hauguth, T. Danz, B.E. Volland, V. Ishchuk, D. Dreßler and I.W. Rangelow
  Microelectronic Engineering 85 (2008) pp. 982-984
  
  
• Controllable off-plane deflection of cantilevers for multiple scanning proximity probe arrays
  Y.Sarov, Tzv. Ivanov, A. Frank and I.W. Rangelow
  Applied Physics A - Materials Science & Processing, 9. May 2008, Volume 92, Issue 3, pp. 525-530
  
  
• Scanning proximal probes for parallel imaging and lithography
  K. Ivanova, Y. Sarov, Tzv. Ivanov, A. Frank, J.-P. Zöllner, Ch. Bitterlich, U. Wenzel, B.E. Volland, S. Klett , I.W. Rangelow, P. Zawierucha, M. Zielony , T. Gotszalk, D. Dontzov ,W. Schott, N. Nikolov, M. Zier,B. Schmidt, W. Engl, T. Sulzbach and I. Kostic
  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement and Phenomena B 26(6), Nov/Dec 2008, pp. 2367-2373
  doi.org/10.1116/1.2990789
  
  
• All-digital PLL System for Self-oscillation Mode of Microcantilevers with Integrated Bimorph Actuator and Piezoresistive Readout
  N. Nikolov, N. Kenarov, P. Popov, Th. Gotszalk and I.W. Rangelow
  Sensors & Transducers Journal, Vol. 98, Issue 11, November 2008, pp. 45-53
  
  
• Single atom doping for quantum device development in diamond and silicon
  C.D. Weis, A. Schuh, A. Batra, A. Persaud, I.W. Rangelow, J. Bokor, C.C. Lo, S. Cabrini, E. Sideras-Haddad, G.D. Fuchs, R. Hanson, D.D. Awschalom and T. Schenkel
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 26(6), Nov/Dec 2008, pp. 2596-2600
  
  
• Ergebnisse und Konsequenzen einer informetrischen Analyse des Bildungsportals Thüringen
  In: Ockenfeld, M. (Hrsg.): Informationskompetenz 2.0 - Zukunft von qualifizierter Informationsvermittlung.
  Proceedings des 24. Oberhofer Kolloquiums
  Magdeburg 2008, S. 87-102, ISBN 978-3-92547-62-0
  J. False, S. Finke, H.-D. Wuttke
  

Kongressbeiträge

• Scanning Proximity Probes for Nanoscience
  I.W. Rangelow
  2008 NSTI Nanotechnology Conference and Trade Show

• Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation
  J. Vac. Sci. Technol. B 24(6), Nov/Dez 2006, pp. 3148-3151
  A. Persaud, K. Ivanova, Y. Sarov, Tzv. Ivanov, B. E. Volland, I. W. Rangelow, N. Nikolov, T. Schenkel, V. Djakov, D. W. K. Jenkins, J. Meijer and T. Vogel
• Nanoscale pattern transfer for templates, NEMS, and nano-optics
  Proc. SPIE 6462, 64620J (2007)
  Deidre L. Olynick, J. Alexander Liddle, Bruce D. Harteneck, Stefano Cabrini and Ivo W. Rangelow
  
• Inverse microemulsion copolymerization of butyl acrylate and acrylamide: kinetics, colloidal parameters and some model applications
  Polymer International 56: 364 - 370 (2007)
  Ufuk Yildiz, Ignac Capek, Dusan Berek, Yanko Sarov and Ivo W. Rangelow
• Piezoresistive and Self-Actuated 128-Cantilever Arrays for Nanotechnology Applications
  Microelectronic Engineering Volume 84, Issues 5-8, (2007) pp. 1260-1264
  I.W. Rangelow, Tzv. Ivanov, K. Ivanova, B.E. Volland, Y. Sarov, A. Persaud, H.P. Reithmaier, T. Gotszalk, P. Zawierucha, M. Zielony, D. Dontzov, B. Schmidt, M. Zier, N. Nikolov, I. Kostic, W. Engl, T. Sulzbach, J. Mielczarski, S. Kolb, Du P. Latimier, R. Pedreau, V. Djakov, S.E. Huq, K. Edinger, O. Fortagne, A. Almansa and H.-O. Blom
• Duo-action electro thermal micro gripper
  Microelectronic Engineering Volume 84, Issues 5-8, May-August 2007,pp. 1329-1332
  B.E. Volland, K. Ivanova, Tzv. Ivanov, Y. Sarov, E. Guliyev, A. Persaud, J.-P. Zöllner, St. Klett, I. Kostic and I.W. Rangelow
• Investigation of the sorption properties of thin Ge-S-AgI films deposited on cantilever-based gas sensor
  Applied Physics A - Materials Science & Processing, Volume 87, 1 Pages 31-36 (2007)
  B. Monchev, D. Filenko, N. Nikolov, C. Popov, T. Ivanov, P. Petkov and I.W. Rangelow
• Die akademische Weiterbildungslandschaft in Thüringen
  Information: Wissenschaft & Praxis 58 (2007) 1, S. 35-37, ISSN 1434-4653
  J.False, K. Grosch, H-D. Wuttke

In Books

• "Quantum Computer Development with Single Ion Implantation"
  A. Peraud, S.J. Park, J.A. Liddle, I.W. Rangelow, J. Bokor, R. Keller, F.I. Allen, D.H. Schneider and T. Schenkel
  Experimental Aspects of Quantum Computing, Springer Verlag

Congress Contributions

• New method for the precise flux calculation of neutrals for arbitrary surfaces in profile etch simulations
  Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007
  M. Hauguth, B.E. Volland, V. Ishshuk, D. Dreßler, T. Danz and I.W. Rangelow
• SPICE simulations of self-actuated piezoresistiver arrays
  Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007
  A. Frank, J.-P. Zöllner, Y. Sarov, Tzv. Ivanov and I.W. Rangelow
• Cantilever Pre-deflection Control of Massively Parallel Arrays
  Book of Abstracts 33rd International Conference on Micro- and Nano-Engineering 2007
  Y. Sarov, Tzv. Ivanov, A. Frank, J.-P. Zöllner, S. Klett, B.E. Volland and I.W. Rangelow
• Direct Assembly of Quantum Confined Nano-particles
  MRS Spring Meeting Proceedings 2007
  I. Pluemel, K. Hitzbleck, I.W. Rangelow, J. Meijer and H. Wiggers
• Imaging Cellular and Viral materials with small cantilevers developed for high speed Atomic Force Microscopy
  MRS-Proceedings Fall 2007
  G.E. Fantner, Tzv. Ivanov, K. Ivanova, D. Gray, I.W. Rangelow, P. K. Hansma and A. M. Belcher

• Hierarchical interconnections in the nano-composite material bone: Fibrillar cross-links resist fracture on several length scales
  Composites Science and Technology, Volume 66, Issues 9,July 2006, pp. 1205-1211
  G.E.Fantner, O. Rabinovych, G. Schitter, Ph. Thurner, J.H. Kindt, M.M. Finch, J.C. Weaver, L.S. Golde, D.E. Morse, E.A. Lipman, I.W. Rangelow and P.K. Hansma
• Mechanical characterization of membrane like microelectronic components
  Microelectronic Engineering,Volume 83, Issues 4-9, April-September 2006, pp. 1036-1042
  M. Drzik, H. Löschner, E. Haugeneder, W. Fallman, P. Hudek, I.W. Rangelow, Y. Sarov, T. Lalinsky and J. Chlpik
• Aspect ratio dependent plasma polymer deposition of fluorocarbons
  Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, pp. 1174-1177
  B.E. Volland and I.W. Rangelow
• Micro-fluidic analysis based on total internal light reflection
  Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, pp. 1294-1297
  Y. Sarov, K. Ivanova, Tzv. Ivanov, B.E. Volland and I.W. Rangelow
• Thermally driven microgripper as a tool for micro assembly
  Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, pp. 1393-1395
  K.Ivanova, Tzv. Ivanov, A. Badar, B.E. Volland, I.W. Rangelow, D. Andrijasevic, F. Sümecz, St. Fischer, M. Spitzbart, W. Brenner and I. Kostic
• Scanning proximity probes for nanoscience and nanofabrication
  Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, pp. 1449-1455
  I.W. Rangelow
• Nano-line width control and standards using Lateral Pattern Definition technique
  Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, pp. 1555-1558
  M. Zaborowski, D. Szmigiel, T. Gotszalk, K. Ivanova, Y. Sarov, Tzv. Ivanov, B.E. Volland, I.W. Rangelow and P. Grabiec 
• Raster-Sonden-Mikroskopie mit Cantilever-Arrays
  Technisches Messen 73 (2006) 9, pp. 485-492
  I.W. Rangelow, Tzv. Ivanov, B.E. Volland,D. Dontsov, Y. Sarov, K. Ivanova, A. Persaud, D. Filenko, N. Nikolov, B. Schmidt, M. Zier, T. Gotszalk and Th. Sulzbach
• Strategies for integration of donor electron spin qubits in silicon
  Microelectronic Engineering, Volume 83, Issues 4-9, April-September 2006, pp. 1814-1817
  T. Schenkel, J.A. Liddle, J. Bokor, A. Persaud, S.J. Park, J. Shangkuan, C.C. Lo, Kwon, S.A. Lyon, A.M. Tyryshkin, I.W. Rangelow, Y. Sarov, D.H. Schneider, J. Ager and R. de Sousa
• Components for high speed atomic force microscopy
  Ultramicroscopy, Volume 106, Issues 8-9, June-July 2006, pp. 881-887
  G.F. Fantner, G. Schitter, J.H. Kindt, Tzv. Ivanov, K. Ivanova, R. Patel, N. Holten-Andersen, J. Adams, Ph. J. Thurner, I.W. Rangelow and P.K. Hansma
• Concept of deterministic single ion doping with sub-nm spatial resolution
  Appl. Phys. A Vol. 83, 2 Pages 321-327 (2006)
  J.Meijer, T. Vogel, B. Burchard, I.W. Rangelow, L. Bischoff, J. Wrachtrup, M. Domhan, F. Jelezko, W. Schnitzler, S.A. Schulz, K. Singer and F. Schmidt-Kaler
• Diffraction under total internal reflection for micro-fluidic analysis
  Appl. Phys. A 84, pp. 191-196 (2006)
  Y. Sarov, Tzv. Ivanov, K. Ivanova, V. Sarova, I. Capek and I.W. Rangelow
• Electron transport in laterally confined phosphorus layers in silicon
  PHYSICAL REVIEW B 74, 153311 (2006)
  S.J. Robinson, J.S. Kline, H.J. Wheelwright, J.R. Tucker, C.L. Yang, R.R. Du, B.E. Volland, I.W. Rangelow and T.-C. Shen
• Informetrische Markenanalysen
  Ockenfeld, M. /Hrsg.): Content. Proceedings der 28. Online-Tagung der DGI.
  Frankfurt am Main 2006, S. 187-193
  J. False
• Weiterbildung in kleinen und mittleren Unternehmen:
  Eine europäische Studie im Rahmen des Projektes "Manage SME"
  Weyand, J.; Haase. H. (Hrsg.): Research Papers in Economics and Law (RPEL) 5 (2006).
  Ilmenau 2006, ISSN 1861-1966
  J. False, J. Weyand, H. Haase, A. Bielig, J. Dauner
  
  

Kongressbeiträge

• Optimization of the Diffraction from a Grating under Total Internal Reflection and its Applications for Microfluidic Sensing
  Electron Beam Technologies EBT 2006, 5-10 Juni
  Y. Sarov, D. Todorov, I. Capek, V. Sarova, B.E. Volland, H. Hillmer, J.P. Reithmaier and I.W. Rangelow
  
  
• Concentration analysis of nanoscaled dispersions by total internal reflection refractometry
  Applied Physics of Condensed Matter, Juni 21-23, 2006
  Y. Sarov, I. Capek, R. Andok, V. Sarova, K. Ivanova, I. Kostic and I.W. Rangelow
  
  
• Microfluidic detection using total internal reflection diffraction grating
  Applied Physics of Condensed Matter, Juni 21-23, 2006
  Y. Sarov, I. Kostic, R. Andok, I. Capek, V. Sarova, Tzv. Ivanov, K. Ivanova and I.W. Rangelow

• Micromachined Arch-type cantilever as high sensitivity uncooled infrared detector
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 23, 3153 (2005) K. Ivanova, Tzv. Ivanov and I.W. Rangelow
  
  
• Integration of scanning probes and ion beams
  Nanoletters 5(6):1087{1091,( 2005) A. Persaud, J.A. Liddle, J.Bokor, I.W. Rangelow and T. Schenkel
  
  
• Piezoresistive Scanning Proximity Probes for Nanoscience
  Technisches Messen 2 (2005) 72 pp.103-110, I.W. Rangelow
  
  
• Diagnostics of micro-and nanostructure using the scanning probe microscopy
  Journal of Telecommunication and Information Technology, 1, pp. 41-46, (2005)
  Teodor Gotszalk, Pawel Janus, Andrzej Marendziak, Piotr Czarnecki, Jacek Radojewski, Roman F.Szeloch, Piotr Grabiec and I.W. Rangelow
  
  
• Radicals transport modelling in NANOJET
  Applied Physics A, Vol. 81, 8, pp. 1661-1666 (2005)
  O. Rabinovych, A. Uvarov, D. Filenko and I.W. Rangelow
  
  
• Chemical gas sensors based on calixarene-coated discontinuous gold film
  Sensors and Actuators B: Chemical, Volumes 111-112, 11 November 2005, pp. 264-270; D. Filenko, T. Gotszalk, Z. Kazantseva, O. Rabinovych, I. Koshets, Yu. Shirshov, V. Kalchenko and I.W. Rangelow
  
  
• A novel piezoresistive microprobe for atomic and lateral force microscopy
  Sensors and Actuators A: Physical, Volumes 123-124, 23 September 2005, pp. 370-378; T. Gotszalk, P.B. Grabiec and I.W. Rangelow
  
  
• Application of a Scanning Thermal Nano-Probe for Thermal Imaging of High Frequency Active devices
  Jpn. J. Appl. Phys. 44 (2005) pp. 6823-6825
  M. Joodaki, P.I. Janus, T. Gotszalk, G. Kompa, K. Edinger and I.W. Rangelow
  
  
• Profile evolution of Cr masked features undergoing HBr-inductively coupled plasma etching for use in 25 nm silicon nanoimprint templates
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 23 (5), Sep/Oct 2005, pp. 2073-2077
  Deidre L. Olynick, J. Alexander Liddle and I.W. Rangelow
  
  
• Kommunikation in Open Source Projekten
  Markscheffel, B.; Fischer, D. (Hrsg.): Kommunikationskompetenz-Schlüssel in der Informationsvermittlung.
  Proceedings des 23. Oberhofer Kolloquiums Gotha 2005, S. 193-206,
  ISBN 3-925474-53-6
  J. False

Kongressbeiträge

• Pulling of SAW Resonators for Wireless Sensor Application
  IEEE Ultrasonics Symposium, 2005, pp. 2202-2205; E.Guliyev and S. Klett
• SAW resonator remote sensor
  International scientific and technical conference, Baku, 2005, in press
  S. Klett and E. Guliyev

• Single ion implantation with scanning probe alignment
  Journal of Vacuum Science and Technology B22(6), pp. 2992-2994 (2004)
  A. Persaud, F.I. Allen, F.Gicquel, J.A. Liddle, Tzv. Ivanov, K. Ivanova, I.W. Rangelow, J. Bokor, and T. Schenkel
• Processing issues in top-down approaches to quantum computer development in silicon
  Microelectronic Engineering,Volumes 73-74, pp. 695-700, cond-mat/0310195 (2004)
  S.J. Park, A. Persaud, J.A. Liddle, J. Nilsson, J. Bokor, D.H. Schneider, I.W. Rangelow, and T.Schenkel
• Batch fabricated scanning near field optical microscope-atomic force microscopy microprobe integrated with piezoresistive cantilever beam with highly reproducible focused ion beam micromachined aperture
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 22.1., Jan/Feb, pp. 6-21 (2004)
  P. Grabiec, J. Radojewski, M. Zaborowski, K. Domanski, T. Schenkel and I. W. Rangelow
• Calixarene-coated nanoparticle gold films for chemical recognition system
  Proceedings of IEEE (2004), Vol. 2, pp. 669-672
  D. Filenko, Z. Kazantseva, O. Rabinovych, K. Ivanova, Y. Shirshov, V. Kalchenko and I. W. Rangelow
• Nanomotion in functionalized nanoparticle gold films under exposure to volatile analytes
  // Abstracts of the International Conference “(MNE 2004 (Micro and Nano Engineering 2004)”, Rotterdam, The Netherlands, Volumes 19-22 ,September 2004, pp. 236-237
  D. Filenko, O. Rabinovych, Yu. Shirshov,V. I. Kalchenko, I. W. Rangelow
• Open questions in electronic sputtering of solids by slow highly charged ions with applications in single ion implantation
  Nuclear Instruments and Methods in Physics Research B 219–220 pp. 200–205 (2004); T. Schenkel, I.W. Rangelow, R. Keller, S.J. Park, J. Nilsson, A. Persaud, V.R. Radmilovic, D.H. Schneider, J.A. Liddle
• Nano-width lines using lateral pattern definition technique for nanoimprint template fabrication
  Microelectronic Engineering, Volumes 73–74, June 2004, pp. 599-603
  P.B. Grabiec , M. Zaborowski, K. Domanski, T. Gotszalk and I.W. Rangelow
• Towards quantum information processing with impurity spins in silicon
  AVS, ICMI, pp.36-38 (2004)
  T. Schenkel, J. A. Liddle, J. Bokor, I. W. Rangelow, S. J. Park and A. Persaud
• Asimple nano-patterning technique using Lateral Pattern Definition
  AVS, ICMI, pp.36-38 (2004)
  P. Grabiec , K. Domanski , M. Zaborowski ,T. Gotszalk, A. Marendziak ,K. Ivanova and I.W. Rangelow
• Pattern transfer of sub-25 nm features into Silicon using HSQ and polymerresistmasks and HBr plasma chemistr
   AVS,ICMI, pp.28-29 (2004) Deirdre L. Olynick and I. W. Rangelow
• Invited: "Concept of an ion implantation stage with atomic resolution "
  ICNMTA-(2004) I. W. Rangelow
• Invited: "Micromachined AFM Tool for High Local Resolution Doping with Ion Beams"
  2004 International Accelerator Conference, October 10-15 (2004) I. W. Rangelow
  High-energy ion projection for deep ion implantation as a low cost high throughput alternative for subsequent epitaxy processes
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 22.1, Jan/Feb pp.152-157 (2004)
  Meijer, B. Burchard, K. Ivanova, B.E. Volland, I. W. Rangelow, M. Rüb and G. Debo
• Quantum computer development with single ion implantation
  Journal of Quantum Information Processing Vol. 3, Nos. 1–5, October pp.233-245 (2004); A. Persaud, S. J. Park, J. A. Liddle, I. W. Rangelow, J. Bokor, R. Keller, F. I. Allen, D. H. Schneider, T. Schenkel
• Formation of impurity spin qubit test structures in silicon by scanning probe aligned single ion implantation
  APS March (2004) A. Persaud, S. J. Park, F. I. Allen, J. A. Liddle, I.W. Rangelow, J. Bokor, D. H. Schneider, T. Schenkel
• Integration of ion beams with scanning probes for single atom device formation
  APS March (2004) A. Persaud, S. J. Park, F. I. Allen, J. A. Liddle, I. W. Rangelow, J. Bokor, D. H. Schneider, T. Schenkel
• Microfabricated cantilever with metallic tip for electrostatic and capacitance microscopy and its application to investigation of semiconductor devices
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B0, (1) pp.506-509 (2004)
  T. Gotszalk, P. Czarnecki, P. Grabiec, K. Domanski and I. W. Rangelow
• Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three mask
  Thin Solid Films, Volume 458, Issues 1-2, 30 June 2004, Pages 227-232
  L. Dreeskornfeld, G. Haindl, U. Kleineberg, U. Heinzmann, F. Shi, B. Volland, I.W. Rangelow, E. Majkova, S. Luby, Kostic et al.
  
• Chromium nano-width ribbons by standard lithography and wet etching
  Microelectronic Engineering, Volumes 73-74, June 2004, Pages 588-593
  M. Zaborowski, P. Grabiec and I.W. Rangelow
• NANOJET as a chemical scalpel for accessing the internal 3D-structure of biological cells
  Microelectronic Engineering Volumes 73-74, June 2004, Pages 843-846
  O. Rabinovych, R. Pedrak, I.W. Rangelow, H. Ruehling and M. Maniak
• An Interrogation Unit for Passive Wireless SAW Sensors Based on Fourier Transform
  IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control, pp. 1449-1456 (2004) workshop on "Piezoelectric Resonators for Sensor Applications", 24th-26.th September (2003) Villach, Austria
  M. Hamsch, R. Hoffmann, W. Buff, M. Binhack and St. Klett
• Rechtsfragen bei der Integration und Migration von Open Source Software
  LinuxWorld Conference 2004, Tagungsunterlagen Frankfurt am Main 2004
  J. False
• Linux, Tux & Co Markenrecht im Open Source Projekt
  Eirund, H.; Jasper, H.; Zukunft, O. (Hrsg.): ISOS-2004: Informationssysteme mit Open Source.
  Tagungsband GI-Workshop. Bremen 2004, S. 39-50; J. False
• Quantum Computer Development with Single Ion Implantation
  A. Persaud, S.J. Park, J.A. Liddle, I.W. Rangelow, J. Bokor, R. Keller, F.I. Allen, D.H. Schneider and T. Schenkel
  Quantum Information Processing 2004, Volume 3, Numbers 1-5, pp. 233-245

Kongressbeiträge

• Fabrication of High Temperature, Surface Acoustic Wave Devices for Sensor Applocations
  Eurosensors Rome, Italy, 2004, to be published
  M.N. Hamidon, V. Skarda, N. White, F. Krispel, M. Binhack and W. Buff

• Sensors for scanning probe miscrocopy
  Appl. Phys. A (2003) 76: 907; Doi: 10.1007/s00339-002-1974-7
  R. Kassing, I.W. Rangelow, E. Osterschulze, et. al.
  
• Fabrication of large-area gratings by e-beam lithograhpy and examples of their applications
  EBT, pp. 485-491 (2003) Y. Sarov, I. Kostic, R. Andok, Tzv. Ivanov and I. W. Rangelow
• Fabrication of large-area gratings by e-beam lithography and examples of their applications
  7th International Conference on Electron Beam Technologies EBT 2003 submitted Vacuum (2003)
  I. Kostic, R. Andok, Y. Sarov, Tzv. Ivanov, I. W. Rangelow
• High energy ion projection for deep ion implantation as a low cost, high throughput alternative for subsequent epitaxy processe
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B0, (1) pp. (2003)
  K. Ivanova, B. E. Volland, J. Meijer, B. Burchard, G. Deboy and I.W. Rangelow
• Chemical recognition based on micromachined silicon cantilever arra
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B0, (1) pp. 2931-2936 (2003)
  N.Abedinov, C. Popov, J. Jordanov, Tzv. Ivanov, T. Gotszalk, P. Grabiec, D. Filenko, Yu. Shirshov and I. W. Rangelow
• Batch fabricated SNOM/AFM microprobe integrated with piezoresistive cantilever beam with highly reproducible FIB micromachined aperture
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B0, (1) pp. (2003) P. Grabiec, T. Gotszalk, M. Zaborowski, T. Schenkel and I. W. Rangelow
• Investigation in the deposition of the sidewall passivation layer in Gas Chopping deep RIE processes
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B (2003) B. E. Volland and I. W. Rangelow
• Micromachined AFM sensor with integrated piezoresistive sensor and thermal bimorph actuator for high-speed tapping-mode AFM and phase-imaging in higher eigenmodes
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B 21N60, Nov/Dec pp. 3102-3107 (2003)
  R. Pedrak, Tzv. Ivanov, T. Gotszalk, P. Hudek, O. Fortagne and I. W. Rangelow
• Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
  Thin Solid Films 458 pp. 227-232 (2003) L. Dreeskornfeld, G. Haindl, U. Kleineberg, U. Heinzmann, F. Shi, B. E. Volland, I. W. Rangelow, E. Majkova, S. Luby*, Kostic, L. Matay, P. Hrkut, P. Hudek, Hsin-Yi Lee
• Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures A 21 N40, Jul/Aug 2003, pp. 1550-1562 I. W. Rangelow
• The influence of reactant transport on the profiles of gas chopping etching processes: a simulation approach
  Microelektronic Engineering, Volumes 67-68, June 2003, pp. 338-348
  B. E. Volland and I. W. Rangelow
• Thermally driven micromechanical beam with piezoresistive readout
  Microelectronic Engineering, Volumes 67-68, pp. 550-556 (2003)
  Tzv. Ivanov, T. Gotszalk, P. Grabiec, E. Tomerov and I.W. Rangelow
• AFM cantilever with ultra thin transistor-channel piezoresistor: Quantum confinement
  Microelectronic Engineering, 67-68C pp. 534-541 (2003)
  Tzv. Ivanov, T. Gotszalk, T. Sulzbach, I. Chakarov and I.W.Rangelow
• Optical nanoprobe combined with AFM piezoresistive/optical cantilever
  Ultramicroscopy, Volume: Issue: pp. (in press), (2003)
  T. Gotszalk1, P. Grabiec, J.Radojewski and I.W. Rangelow
• Quantum size aspects of the piezorestive effect in ultra thin piezoresistors
  Ultramicroscopy, Volume 97, Issues 1-4, pp.377-384 (2003)
  Tzv. Ivanov, T. Gotszalk, T. Sulzbach and I.W. Rangelow
• Calibration and examination of piezoresistive Wheatstone bridge cantilevers for scanning probe microscopy
  Ultramicroscopy, Volume 97, Issues 1-4, pp.385–389 (2003) T. Gotszalk, P. Grabiec and I. W. Rangelow
• Silicon Cantilever Beam with Porous Silicon Element
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B21, pp. 48-52, B 21.1., Jan/Feb (2003)
  K. Domanski, P. Grabiec, R.B. Beck, T. Gotszalk and I.W. Rangelow
• AFM cantilever with ultra-thin transistor-channel piezoresistor: quantum confinement
  Microelectronic Engineering, Volumes 67-68, June 2003, pp. 534-541
  Tzv. Ivanov, T. Gotszalk, T. Sulzbach, I. Chakarov and I.W. Rangelow
• Markenrecht und Open Source - Sinn oder Unsinn?
  LinuxTag 2003. Tagungsunterlagen/DVD freier Kongreß. Karlsruhe 2003
  J. False

Kongressbeiträge

• Modeling of Sensor Function for Matched SAW Resonators
  Acta Acustica, 2004, to be published DEGA/DPG workshop on "Akustische Sensorik", 11th-13th September, 2003, Bad Honnef, Germany
  S. Klett, M. Binhack, W. Buff, M. Hamsch and R. Hoffmann
• SAW Resonators at High Temperatures
  Proceedings 2003 IEEE International Ultrasonics Symposium, Honolulu, USA, pp. 187-191
  W. Buff, M. Binhack, S. Klett, M. Hamsch, R. Hoffmann, F. Krispel and W. Wallnöfer
• Modeling of Double SAW Resonator Remote Sensor
  Proceedings 2003 IEEE International Ultrasonics Symposium, Honolulu, USA, pp. 1416-1419
  M. Binhack, S. Klett, E. Guliyev, W. Buff, M. Hamsch and R. Hoffmann
• A Combination of SAW-Resonators and Conventional Sensing Elements for Wireless Passive Remote Sensing
  48. Internationales Wissenschaftliches Kolloquium, Technische Universität Ilmenau
  M. Binhack, W. Buff, S. Klett, M. Hamsch and R. Hoffmann
• Die Modellierung der Sensorfunktion von SAW-Resonatoren
  48. Internationales Wissenschaftliches Kolloquium, Technische Universität Ilmenau
  S. Klett, M. Binhack, W. Buff, M. Hamsch and R. Hoffmann
• Die Modellierung der Sensorfunktion von SAW-Resonatoren
  DAGA 2003, Aachen, Germany, pp. 688-689
  S. Klett, M. Binhack, W. Buff, M. Hamsch and R. Hoffmann
• SAW Based Temperature Sensor System for Remote Measurement
  Proceedings Sensoren und Messsysteme 2003, Nürnberg, Germany, pp. 97-102
  W. Buff, S. Klett, M. Binhack, R. Hoffmann and M. Hamsch

• An overview: critical issues in the high aspect ratio dry etching
  I.W. Rangelow
  LE VIDE N° 303 - 1/4 - 2002
• Thermal imaging of microwave power GaAs-FET with scanning thermal nanoprobe
  Nanoscale Optics and Applications. Edited by Cao, Guozhong; Kirk, Wiley P. Proceedings of the SPIE, Volume 4809, pp. 202-207 (2002)
  J. Mojtaba, P. Gotszalk,G. Kompa, Kl. Edinger and I.W. Rangelow
• Profile simulation of gas chopping based etching processes
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 20 (6), pp. 3111-3117(2002), B.E. Volland, Tzv. Ivanov and I.W. Rangelow
• Invited, "An overview: critical issues in the high aspect ratio dry etching"
  LE VIDE, N°303, 1/4, pp. 24-39, (2002) I.W. Rangelow
• Piezoresistive SXM sensors
  Surface and Interface Analysis, Vol. 33, pp. 59-64, (2002)
  I.W. Rangelow, P. Grabiec, T. Gotszalk and K. Edinger
• SNOM/AFM microprobe integrated with piezoresistive cantilever beam for multifunctional surface analysis
  Microelectronic Engineering 2002, Volume/Issues 61-62 pp. 981-986 (2002)
  P. Grabiec, T. Gotszalk, J. Radojewski, K. Edinger, N. Abedinov and I.W. Rangelow
• Electrostatically Driven Microgripper
  Microelectronic Engineering 2002, Volume / Issues 61-62 pp. 907-915 (2002)
  B.E. Volland, H. Heerlein and I.W. Rangelow
• An optimized piezoresistive AFM sensor for three-dimensional surface characterization
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, A0, (1) pp., (2002) T. Gotszalk, P. Grabiec and I.W. Rangelow
• Heavy Ion Micro Projection System for Material Modification at High Ion Energy
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B20 (1), pp. 246-249 (2002)
   U. Weidenmüller, J.Meijer, A. Stephan, H. Bukov, E. Sossna, B.E. Volland and I.W. Rangelow

Kongressbeiträge

• Progress in Modeling of Sensor Function for Matched SAW Resonators
  Proceedings 2002 IEEE International Ultrosonics Symposium, München, Germany, pp. 455-458; S. Klett, M. Binhack, W. Buff, M. Hamsch and R. Hoffmann

• Piezoresistive sensors for atomic force microscopy – numerical simulations by means of virtual wafer fab
  Journal of Telecommunications and Information Technology, 1(2001) pp. 35-39 (2001)
  T. Debski, W. Barth, I.W.Rangelow

• Fabrication and properties of the field emission array with self-alignment gate electrode
  Journal of Telecommunications and Information Technology, pp. 49-521 (2001)
  W. Barth, T. Debski, I. W. Rangelow

• Adsorption properties of porous silicon
  Journal of Telekommunications and Information Technology, pp. 53-55, 1 (2001)
  K. Domanski, P. Grabiec, T. Gotszalk, R.B. Beck, T. Debski and I.W. Rangelow

• Simulation of latent image formation for ion beam projection lithography
  Microelectronic Engineering 57-58 pp.335-342 (2001)
  G. Mladenov, K. Vutova, I. Raptis, P. Argitis and I.W. Rangelow

• Gated field emitter arrays
  Microelectronic Engineering 57-58 pp.813-818 (2001)
  T. Debski, W. Barth, S. Biehl, P. Grabiec, I.I. Bekh, A.E. Lushkin, L.G.Il`chenko, V.V. Il`chenko, I. Kostic, P. Hudek, S. Mitura and I.W. Rangelow

• Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes
  Microelectronic Engineering 57-58 pp.475-479 (2001)
  B. Weiss, M. Klein, E. Sossna, B.E. Volland and I.W. Rangelow
  

• A Novel High Resolution Scanning Thermal Probe
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B19, pp. 2856-2860 (2001) K. Edinger, I.W. Rangelow and T. Gotszalk
  

• Proc. "Progress in placement control for ion beam stencil mask technolog
  SPIE Vol. 4349, pp.18-22, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, Uwe F.Behringer; Ed. 4 / (2001)
  F-M. Kamm, A. Ehrmann, T. Struck, K. Kragler, J. Butschke, F. Letzkus, R. Springer, E. Haugeneder, A. Degen, J. Voigt, M. Kratzenberg and I.W. Rangelow

• Field Emission Emitter Array with Self-Aligned Volcano Type Gate: Fabrication and Characterization
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B19, pp. 2789-2792 (2001) Tzv. Ivanov, I.W. Rangelow and S. Biehl

• Investigation of Radical - Surface Reactions with Nanojet
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B19, (1) pp. 2727-3731 (2001) J. Voigt and I.W. Rangelow

• Fabrication and electrical charaterization of high aspect ratio silicon field emitter arrays
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B19, pp. 916-919 (2001) I.W. Rangelow and St. Biehl

• Nanojet: Tool for the Nanofabrication
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B19, pp.2723-2726 (2001) I.W. Rangelow, J. Voigt and K. Edinger

• Geometrical and Electrical Characterization of Silicon Membranes for Open Stencil Masks
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B19, pp.2665-2670 (2001)
  E. Sossna, A. Degen, I.W. Rangelow, M. Drzik, T.E. Tiwald and J.A. Wollam, Mechnical

• A temperature Microsensor for biological investigations
  Microelectronic Engineering 57-58, pp. 787-792 (2001)
  M. Zaborowski, P. Grabiec, T. Gotszalk and I.W. Rangelow

• Thermal Nano-Probe
  Microelectronic Engineering, Volume 57-58, pp. 737-748 (2001)
  I.W. Rangelow, T. Gotszalk, N. Abedinov, P. Grabiec and K. Edinger

• Nanofabrication with Scanning Nanonozzle - "NANOJET"
  Microelectronic Engineering 57-58, pp. 1035-1042 (2001)
  J. Voigt, F. Shi, K. Edinger, P. Güthner and I.W. Rangelow

• Micromachined piezoresistive cantilever array with integrated resistive microheater for colorimetry and mass detection
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures A,19(6), Nov/Dec, pp. 2884-2888 (2001)
  N. Abedinov, T. Gotszalk, P.B. Grabiec, J. Voigt and I.W. Rangelow

• The heavy ion micro-projection setup at Bochum
  Nuclear Instruments and Methods in Physics Research Section B:Beam Interactions with Materials and Atoms, Volume 181, Issues 1-4, pp. 39-43 (2001)
  A. Stephan, J. Meijer, U. Weidenmüller, H. Röcken, H.H. Bukow, M. Burchard, A. Zaitsev and I.W. Rangelow

• Stress analysis in Si membranes for open stencil masks and mini-reticles using double bulging and resonance methods
  Microelectronic Engineering, Volumes 57-58, September 2001, Pages 425-432
  A. Degen, N. Abedinov, T. Gotszalk, E. Sossna, m. Kratzenberg and I.W. Rangelow

• Noncontacting laser-based techniques for the determination of elastic constants of thin silicon membranes
  Microelectronic Engineering, Volumes 57-58, September 2001, Pages 475-479
  B. Weiss, M. Klein, E. Sossna, B. Volland and I.W. Rangelow

• High aspect ratio silicon tips field emitter array
  Microelectronic Engineering, Volumes 57-58,September 2001, Pages 613-619
  I.W. Rangelow and St. Biehl

• The application of secondary effects in high aspect ratio dry etching for the fabrication of MEMS
  Microelectronic Engineering, Volumes 57-58, September 2001, Pages 641-650
  B. Volland, H. Heerlein, I. Kostic and I.W. Rangelow

• Thermal nano-probe
  Microelektronic Engineering, Volume 57-58, September 2001, Pages 737-748
  I.W. Rangelow, T. Gotszalk, N. Abedinov, P. Grabiec and K. Edinger

• Evaluation and fabrication of AFM array for ESA-Midas/Rosetta space mission
  Microelectronic Engineering, Volumes 57-58, September 2001, pages 825-831
  W. Barth, T. Debski, N. Abedinov, Tzv. Ivanov, H. Heerlein, B. Volland, T. Gotszalk, I.W. Rangelow, K. Torkar, K. Fritzenwallner, P. Grabiec, K. Studzinska, I. Kostic and P. Hudek
  

• Dry etching-based silicon micro-machining for MEMS
  Vacuum, Volume 62, Issues 2-3,2001, Pages 279-291
  I.W. Rangelow

• Improvements of the membrane bulging method for stress determination of silicon open stencil masks for ion projection lithograph
  Proc. SPIE Vol. 3996, pp. 97-104, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents,U. F. Behringer; Ed.2, (2000)
  A. Degen, J. Voigt, E. Sossna, F. Shi, E. Haugeneder, H. Loeschner and I.W. Rangelow

• Stress engineering of SOI silicon stencil masks by boron doping concentration
  Proc. SPIE Vol. 3997. pp. 395-404, Emerging Lithographic Technologies IV, Elizabeth A. Dobisz; Ed.7, (2000)
  A. Degen, J. Voigt, M. Kratzenberg, F. Shi, Univ. of Kassel; J. Butschke, Institut für Mikroelektronik Chips; H. Löschner, R. Käsmaier, A. Ehrmann and I.W. Rangelow

• High Aspect Ratio Silicon Tips Field Emitter Array
  Microelectronic Engineering 57-58, pp. 613-619 (2000) I.W. Rangelow and S. Biehl

• Micromachining and Electrical Characterisation of Gated Field Emitter Array
  Microelectronic Engineering 57-58, pp. 813-818 (2000)
  T. Debski, W. Barth, S. Biehl, P. Grabiec, P. Hudek, I. Kostic, S. Mitura and I.W. Rangelow

• Secondary Effects in High Aspect Ratio Dry Etching
  Microelectronic Engineering 57-58, pp. 641-650 (2000)
  B.E. Volland, H. Heerlein, I, Kostic and I.W. Rangelow

• Noncontacting laser based techniques for the determination of elastic constants of thin Silicon membranes for open stencil masks
  Microelectronic Engineering 57-58, pp. 475-479 (2000) B. Weiss, M. Klein, E. Sossna, B.E. Volland and I.W. Rangelow

• High Deflection Comb Micro-actuators
  Microelectronic Engineering 57-58, pp. 641-650 (2000)
  B.E. Volland, H. Heerlein, I. Kostic and I.W. Rangelow

• Field Emission cathode array with self aligned gate electrode fabricated by silicon micromachining
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B 18, pp. 3544-3548 (2000)
  W.Barth, T. Debski, F. Shi, P. Hudek, I. Kostic, S. Biehl, T. Iwert, P. Grabiec, K. Studzinska, S. Mitura, I.I. Bekh, A.E. Lushkin, L.G. Il'chenko, V.V. Il'chenko, G. Haindl and I.W. Rangelow

• Progress on nanostructuring with nanojet
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B 18, pp. 3525-3529 (2000)
  J. Voigt, A. Iline, F. Shi, P. Hudek, I.W. Rangelow, G. Mariotto, I. Shvets, P. Güthner, H. Löschner and K. Edinger

• Fabrication of open stencil masks with asymmetric void ratio for the ipl space charge experiment
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B 18, pp. 3202-3206 (2000)
  B.E. Volland, F. Shi, H. Heerlein, I.W. Rangelow, P. Hudek, I. Kostic, E. Cekan, H. Vonach, H. Löschner, C. Horner, G. Stengl, H. Buschbeck, M. Zeininger, A. Bleeker and J.Benschop

• Thickness analysis of silicon membranes for open stencil masks
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B 18, pp. 3259-3263 (2000)
  E. Sossna, R. Kassing, C.M. Herzinger, T.E. Tiwald, J.A. Woollam and I.W. Rangelow

• Lithographie der nächsten Generation
  Physikalische Blätter, 56 Nr.2. pp. 31-36 (2000) R. Kassing, R. Käsmaier and I.W. Rangelow

• Gas sensitive properties of nitrogen rich carbon nitride films
  Advanced Materials 12, No.9, pp. 656-660 (2000)
  L.M. Zambov, C. Popov, N. Abedinov, M.F. Plass, W. Kulisch, T. Gotszalk, P. Grabiec, I.W. Rangelow and R. Kassing

• Piezoresistive sensors for scanning probe microscopy
  Ultramicroscopy Volume 82, Issues 1-4, February 2000, pp. 39-48 (2000)
  T. Gotszalk, P. Grabiec and I.W. Rangelow

• Whisker Probes
  Ultramicroscopy Volume: 82, Issues: 1-4, pp. 57-61, February (2000)
  E.I. Givargizov, A.N. Stepanova, E.S. Mashkova, V.A. Molchanov, M.E. Givargizov and I.W. Rangelow

• Field emission arrays by silicon micromachining
  Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures B 18, pp. 896-899 (2000)
  T. Debski, P. Grabiec, J. Szmidt, W. Barth, J. Voigt, F. Shi, P. Dumania, P. Hudek and I.W. Rangelow
  
  
• The heavy ion micro projection setup at Bochum
  7th INTERNATIONAL CONFERENCE ON NUCLEAR MICROPROBE TECHNOLOGY AND APPLICATIONS (ICNMTA-2000) 10.-15. September 2000 in Bordeaux
  A. Stephan, J. Meijer, U. Weidenmüller, H. Röcken, H.Bukow, M. Burchard, A. Zaitsev and I.W. Rangelow
  
  
• Structured high temperature implantation in diamon
  Abstract Booklet EIPBN 2000; J. Meijer, M. Burchard, A. Zaitsev, A. Stephan, U. Weidenmüller, H. Röcken, S. Kubsky, H. Bukow, C. Rolfs and I.W. Rangelow
  
  
• Progress in Placement Control for Ion Beam Stencil Mask Technology
  17th European Conference on `Mask Technology for Integrated Circui and Micro-Compenents`organized by the VDE/VDI-Society Microelectronics, Micro and Precision Engineering (GMM) and the Institute for Microstructure Technology at the Forschungszentrum Karlsruhe in cooperation with SEMI-Europe, SPIE and BACUS
  F.M. Kamm, A. Ehrmann, A. Degen and I.W. Rangelow
  
  
• ARCH Invited: Actives within the MEDEA IPL-Project
  ASM Lithography, Veldhoven, Proceedings of ARCH`s 6th European Litho Workshop Antwerp, January 24-25, 2000, pp. 26-34; I.W. Rangelow, et al.

12 GHz Coplanar quasi-monolithic oscilator
IEEE MTT-S, Digest, Denver, Colorado USA (1999) pp. 227 - 228
E. Wasige, G. Kompa, van Raay F., I.W. Rangelow, F. Shi, W. Scholz and R. Kassing

GaAs FET Characterization in a quasi-monolithic Si environment
IEEE MTT-S (1999) pp. 1889 - 1892
E. Wasige, G. Kompa, van Raay F., I.W. Rangelow, F. Shi, W. Scholz and R. Kassing

Micromachining by lithography and reactive ion etching (LIRIE)
"Proceedings of Ion Tech. Workshop" pp. 65 - 72, JT`99, 03.-05.1999, Szklarska Poremba, Poland, ISBN 83-7085-438-9
Invited: P.B. Grabiec, R. Sunyk, F. Shi, T. Gotszalk, G. Popovic, P. Hudek, P. Dumania and I.W. Rangelow

Plasma based 3d-structuring of silicon
"Ion Technology Workshop" pp. 23 - 33, JT`99,03.-05.03.1999, Szklarska Poemba, Poland, ISBN 83-7085-438-9
Invited: I.W. Rangelow

GaAs FET Characterization in Quasi-Monolitic Si Environment
IEEE MTT-S, Paper THF5-5, Anaheim, CA.
E. Wasige, G. Kompa, F. van Raay, I.W. Rangelow, W. Scholz, R. Kassing, S. Bertram and P. Hudek

12 GHz Coplanar Quasi-Monolitic Oscilator
IEEE MTTS, June 1999, Paper MO3B-5, Anaheim, CA.
E. Wasige, G. Kompa, F. van Raay, I.W. Rangelow, W. Scholz, R. Kassing, S. Bertram and P. Hudek

Fabrication and properties of micromechanical caloimeter with piezoresistive detection sensor and resistive microheater
Abstract book of MNE`1999, pp. 345 - 346
T. Gotszalk, N. Abedinov, W. Barth, E. Lorenz, P. Hudek, T. Debski,P. Janus, P.B. Grabiec, M. Zaborowski and I.W. Rangelow

Placement measurement and FE modeling results for distortion control of stencil masks
Proc. of SPIE-PM, 1999 pp. 172 - 174
Ehrmann, R. Käsmaier, K. Kragler, T. Struck, E. Haugeneder, H. Löschner, J. Lutz, J. Butschke, F. Letzkus, R. Springer, M. Drzik, P. Hrkut, P. Hudek, A. Degen, F. Shi, B. Volland, E. Sossna, I.W. Rangelow and R. Engelstad

Placement measurement and FE modeling results for distortion control of stencil masks
19th BACUS Symposium on Photomask Technology and Management, Proc. of SPIE 3873 (1999)
Ehrmann, R. Käsmaier, K. Kragler, T. Struck, E. Haugeneder, H. Löschner, J. Lutz, J. Butschke, F. Letzkus, R. Springer, M. Drzik, P. Hrkut, P. Hudek, A. Degen, F. Shi, B. Volland, E. Sossna, I.W. Rangelow and R. Engelstad

Stress engineering of SOI Silicon Open Stencil Masks by Boron doping concentration
Proc. of SPIE 3873, 1999, pp. 354 - 357
A. Degen, J. Voigt, E. Sossna, F. Shi, J. Butschke, E. Haugeneder, H. Löschner and I.W. Rangelow

Preparation of STM/AFM probes of special shape with diamond tips
MRC 1999 Spring Meeting RE:2671, April 5th-9th, San Francisco, CA, USA
E.I. Givargizov, L.H. Obolenskaya, N.A. Stepanova, M.E. Givargizov and I.W. Rangelow

Novel Plasma Enhanced Bulk Micromachining Process for MEMS
B. Volland F. Shi, P. Hudek and I.W. Rangelow
ASDAM `98, 2nd International Conference on Advanced Semiconductor Devices and Microsystems, Smolenice Castle, Slovakia, 5-7 October 1998
ISBN: 0-7803-4909-1; 0-7803-4910-5

Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable fieldemission electron source and a scanning probe microscopy sensor with atomic sharpness
Journal of Vacuum Science & Technology (B) 16, 3185 (1998); doi: 10.1116/1.590348
I.W. Rangelow, F. Shi, P. Hudek, P. Grabiec, B. Volland, E.I. Givargizov, A.N. Stepanova, L.N. Obolenskaya, E.S. Mashkova and V.A. Molchanov

Stencil Mask Technology for Ion Beam Lithography
Proceedings of SPIE BACUS-6. May 1998 S.F. CA, pp. 345 - 346
I.W. Rangelow, A. Ehrmann, A. Oelmann, R. Springer, H. Löschner and K. Kragler

Dry Etching based High Aspect Ratio Silicon Micromachining for MEMS
Proceedings of NEXUSPAN Session "micro-S/Mtech" on micro-Structuring and micro-Machining Technologies, Smoleniec Castle, Slovakia October 4, 1998, pp. 32 - 37
NEXUS Invited: I.W. Rangelow

Black silicon as secondaey standard of black body
Proceedings of Eurotherm Seminar, n°60, Quantitative InfraRed Thermography 4, QIRT`98, 1998, pp. 338 - 341
R.F. Szeloch, T.P. Gotszalk, Z. Borkowicz and I.W. Rangelow

Determination of Residual Stress and Elastic Constants of Silicon Open Stencil Masks for Ion Projection Lithography
16th European Conference on `Mask Technology for Integrated Circuit and Micro-Components`, VDE/VDI-Society Microelectrinics, (GMM) SPIE, BACUS
Degen, F. Shi, E. Sossna, R. Sunyk, J. Voigt, B. Volland, B. Reinker and I.W. Rangelow

Novel Plasmaenhanced Bulk Micromachining Process for MEMS
"The Second International Conference on Advanced Semiconductor Devices and Microsystems, Smolenice Castle, Slovakia October 5-7, 1998, Conference Proc. pp. 315 - 318
B.E. Volland, F. Shi, P. Hudek and I.W. Rangelow

Silicon Integrated Piezoresistive Probes
IEEE Proc. of the MICROTHERM`98, Microtechnology and Thermal Problems in Electronics Workshop, Zakopane September 21-27.1998, pp. 41 - 49
P. Dumania, P. Grabiec, T. Gotszalk and I.W. Rangelow

Pn and SOI wafer flow process for stencil mask fabrication
GMM-Conference: SPIE Mask Technology for IC and Micro-Components`98, pp. 29 - 38
J. Butschke, A. Ehrmann, E. Haugeneder, M. Irmscher, R. Läsmaier, K. Kragler, F. Letzkus, H. Löschner, J. Mathuni, I.W. Rangelow, C. Reuter, F. Shi and R. Springer

Calibration of piezoresistive Wheaaston bridge cantilever for scanning probe microscopy
IEEE Proc. of the MICROTHERM`98 Microtechnology and Thermal Problems in Electronics Workshop, Zakopane September 21 - 27, 1998 pp. 54 - 59
T. Gotszalk, P. Dumania, P. Grabiec, P. Janus, W. Orawski, R. Pedrak. J. Radujewski and I.W. Rangelow

Integration several sensors devices in one AFM microprobe microsystem chip
SPMM`97, June 5-7, 1997 Krobielowice Palace, Poland (1997), P.B. Grabiec, P. Dumania, P. Hudek and I.W. Rangelow

Sensor for simultaneous determination of the topography and the tribological properties of technical surfaces
Eurosensor ISBN 83-908335-0-6 (1997) pp. 579-582, T. Gotszalk, F. Shi, S. Skocki, P.B. Grabiec and I.W. Rangelow

Silicon fusion bonding
VI-ELTE`97, Section Microsystems, Krakow (1997) pp. 721-724, J. Lozinko, A. Panas, T. Piotrowski, I.W. Rangelow and P.B. Grabiec

Dry Etching of Silicon
Swiss Foundation for Research in Microtechnology (FSRM), Training in Microsystems: Manufacturing Processes for Micromechanical Components (1997) pp. VII-1-73, I.W. Rangelow

Laser Induces Processes
Swiss Foundation for Research in Microtechnology (FSRM), Training in Microsystems: Manufacturing Processes for Micromechanical Components (1997) pp. IX-1-31, I.W. Rangelow, B. Ivanov and C. Popov

Thin Film Technique
Swiss Foundation for Research in Microtechnology (FSRM), Training in Microsystems: Manufacturing Processes for Micromechanical Components (1997) pp. V-1-51, P.B. Grabiec and I.W. Rangelow

Bulk micromachining of Si by lithography and reactive ion etching (LIRIE)
MICROELECTRONICS and RELIABILITY 37, Iss.3, March (1997) pp. 543-562, I.W. Rangelow, P. Hudek and F. Shi

A New Technological Conceptfor Optimum Design at Microwave and Milltmetr-wave Frequencies
IEEE, Workshop "Experimentally Based FET Device Modelling & Related Non-linear Circuit Design, July 17-18 (1997) pp. 23.1-23.5, E. Wasige, G. Kompa, F. van Raay, W. Scholz, I.W. Rangelow, F. Shi, R. Kassing, R. Meyer and M.-C. Amann

Surface analysis of semiconductor materials with AFM
VI-ELTE`97, Section Microsystems, Krakow (1997) pp. 501-505, T. Gotszalk, I.W. Rangelow, P. Dumania, P. Grabiec and J. Raddojewki

Integration`s problems of micro-machined AFM sensors with CMOS technology
VI-ELTE`97, Section Microsystems, Krakow (1997) pp. 581-584, P. Grabiec, T. Budzinski, P. Dumania, K. Studzinska, M. Zaborowski, T. Gotszalk and I.W. Rangelow

Thermal behaviour of piezoresistive AFM cantilever
VIELTE`97, Section Microsystems, Krakow (1997) pp. 649-652, T. Gotszalk, R.F. Szeloch, I.W. Rangelow, P. Dumania, P. Grabiec and L. Raddojewki

Sensivity for nN range interaction of piezoresistive AFM sensor, measurement circuit
VI-ELTE`97, Section Microsystems, Krakow (1997) pp. 653-656, T. Gotszalk, I.W. Rangelow, P. Dumania, P. Grabiec and J. Raddojewki

""Black Silicon" as absolute black body in thermography of IC"
VI-ELTE`97, Section Microsystems, Krakow (1997) pp. 673-676, R.F. Szeloch, T. Gotszalk, I.W. Rangelow and Z. Borkowicz

Air Bridge Based Planar Hybrid Technology for Microwave and Millimeter-wave Applications
Proceedings of European Microwave Conference, September Jerusalem, Israel (1997) pp. 302-305, E. Wasige, G. Kompa, van Raay F., I.W. Rangelow, F. Shi, W. Scholz, R. Kassing, R. Meyer, M.-C. Amann and P. Hudek

Development of a multifunctional microprobes for scanning probe microscopy using dry and wet etching techniques
in Transactions on the precision and electronic technology, vol.3 (1997), ISBN 83-904975-1-4, pp. 217-222, P.B. Grabiec, K. Studzinska, P. Dumania, T. Gotszalk, F. Shi, R. Sunyk and I.W. Rangelow

Ion energy distributions in SF6 plasmas at a radio-frequency powered electrode
F. Becker, I.W. Rangelow, R. Kassing
J. Appl. Phys. 80(1), 56 - 65 (1996); https://doi.org/10.1063/1.362761

Atomic force microscopy and lateral force microscopy using piezoresistive cantilevers
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement and Phenomena 14, 856 (1996); https://doi.org/10.1116/1.589161
R. Linnemann, T. Gotszalk, I.W. Rangelow, P. Dumania and E. Oesterschulze

BILAYER RESIST PROCESS FOR EXPOSURE WITH LOW-VOLTAGE ELECTRONS (STM-LITHOGRAPHY)
Microelectronic Engineering 30 (1996) 447-450
R. Leuschner, E. Günther, G. Falk, A. Hammerschmidt, K. Kragler, I.W. Rangelow and J. Zimmermann

Herstellung von trockengeätzten Silizium-Spitzen mit integriertem Detektorsystem für die SXM-Technik
VDI-Bericht, 13N6354, 31. Jan. (1996), I.W. Rangelow

Chemically Amplified Deep UV Resist For Micromachining
SPIE Vol. 2879, Micromachining & Microfabrication Conference, Austin, Texas, USA, 14-15. Oct. (1996) pp. 182-194, P. Hudek, I.W. Rangelow, I. Kostic, P. Grabiec, F. Shi, N. Münzel and I. Daraktchiev

Fabrication of piezoresistive sensed AFM cantilever probe with integrated tip
SPIE Vol. 2879, Micromachining & Microfabrication Conference, Austin, Texas, USA, 14-15. Oct. (1996) pp. 56-65, I.W. Rangelow, T. Gotszalk, P. Hudek, F. Shi, P.B. Grabiec and P. Dumania

CMOS Technology Integration with Bulk Sislicon Micromachining
SPIE Vol. 2879, Micromachining & Microfabrication Conference, Austin, Texas, USA, 14-15. Oct. (1996) pp. 56-65, I.W. Rangelow, M. Zaborowski, J. Lysko, F. Shi, P.B. Grabiec, J. Korycinski, P. Hudek and P. Dumania

Optimization of LPCVD silicon nitride as a material for microfabrication
SPIE Vol. 2879, Micromachining & Microfabrication Conference, Austin, Texas, USA, 14-15. Oct. (1996), I.W. Rangelow, F. Shi, P.B. Grabiec, P.B. Grabiec, T. Budzynski, T. Piotrowski, K. Studzinska and P. Dumania

Lateral Force Microscopy using cantilevers with integrated Wheatstone bridge piezoresistive deflection sensor
SPIE Vol. 2880, Micromachining & Microfabrition Conference, Austin, Texas, USA, 14-15. Oct. (1996), T. Gotszalk, I.W. Rangelow, P. Dumania and P. Grabiec

Cantilever with integrated Wheatstone bridge piezoresistive deflection sensor-analysis of vertical/lateral force and displacement sensitivity
SPIE Vol. 2880, Micromachuining & Microfabrication Conference, Austin, Texas, USA, 14-15. Oct. (1996), T. Gotszalk, I.W. Rangelow, P. Dumania and P. Grabiec

Herstellung und Einsatz von Cantilevern mit integriertem Detectorsystem und Si-Spitze für die SXM-Technik
VDI Analyse & Bewertung Zukünftiger Technologien,Spitzentechnologie mit Nanowerkzeugen SXM März (1996) pp. 72-83, R. Kassing, I.W. Rangelow, T. Gotszalk and R. Linnemann

A new silicon micro-fixture facilitates the re-usability of accurately characterised lowpower FET devices
Proceedings of Internationale Conference Desined for the Microwave Community, Prague, 9-12 September 1996, pp. 78-83, E. Wasige, G. Kompa, I.W. Rangelow, F. Shi and W. Scholz

Simple fabrication process of high-density field-emission arrays
MST News, II International Nexuspan workshop on microsystem technology, Szczyrk, Poland, 16-18. May 1996, pp. 82-83
Z. Borkowicz, W. Czarczanski, I.W. Rangelow, P. Hudek, I. Kostic and M. Below

CMOS Process modules - a versatile tool for microsystem fabrication
MST News, 3 (1996) pp. 16-18; P.B. Grabiec, P. Dumania and I.W. Rangelow

Reactive Ion Etching for High Aspect Ratio Silicon Micromachining
Proceedings of PSE`96 Conference, Garmisch Partenkirchen, 9.-13. September 1996, pp. 231-234; I.W. Rangelow

Bulk micromachining of Si by Lithography and Reactive Ion Etching (LIRIE)
I.W. Rangelow, P. Hudek and F. Shi
Vacuum, Vol. 46, pp. 1361-1369 (1995)

MEMS Fabrication by Lithography and Reactive Ion Etching (LIRIE)
I.W. Rangelow and P. Hudek
Microelectronic Engineering 27 (1995) pp. 471-474

Reactive ion etching for microelectrical mechanical system fabrication
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, B 13, 2394 (1995); http://dx.doi.org/10.1116/1.588007
H. Löschner and I.W. Rangelow

AFM with Piezoresistive Wheatstone bridge Cantilever - Analysis of Technological Surfaces
Proceedings of SXT-Meeting, BTB, Braunschweig 1995, pp. 43-48, I.W. Rangelow, T. Gotszalk, P. Dumania and P. Grabiec

Application of Chemically Amplified Resists in direct Electron-Beam Writing for Submicro- and Nanometer Deep Anisotropical Structure Transfer
in: Proc. of "Grundlagen und Technologie elektronischer Bauelemente", Fortbildungsseminar der TU-Wien, 5-8 April, Grossarl im Pongau (Austria), 1995, pp. 85-88, P. Hudek, G. Stangl, I. Kostic, I.W. Rangelow, W. Fallmann and W. Friza

Advanced Technological Processes in Fine Microstructuring
MBB`95 - 7th International IMEKO TC-13 Symp. on Measurement in Clinical Medicine, Tatranska Lomnica (Slovakia), Proc. MBB (1995) pp. 95-97, P. Hudek, I.W. Rangelow, I. Kostic, F. Shi and M. Belov

Stencil Masken für die Ionen Projektions Lithographie und für die Maskierte Ionenstrahl Lithographie
VDI-Bericht von VDI Fachtagung "Maskentechnik für Mikroelektronik-Mikrotechnik-Bausteine" München 25-26 Oct. 1995, pp. 113-118, I.W. Rangelow, P. Hudek, F. Shi, I. Kostic, R. Kassing, H. Löschner, A. Chalupka, E. Hammel, G. Stengl and H. Vonach

Silicon Technology - a versatile tool for microsystems technology
Transactions on the precision and electronic technology (INSEL`95), Vol.2. (1995) pp. 31-36, P.B. Grabiec, I.W. Rangelow, M. Pilch, W. Slysz and P. Dumania

AFM mit piezoresistivem Cantilever Charakterisierung und Anwendungen
In Verhandlungen DPG Berlin 1995, T. Gotszalk, R. Linnemann, I.W. Rangelow and R. Kassing

AFM and LFM using piezoresistive cantilevers
In STM`95, Proceedings of Eight Int`l Conference on Scanning Tunelling/Spectroscopy and Related Techneques, New York, USA, 1995, pp. 765-767
I.W. Rangelow, R. Linnemann, T. Gotszalk, P. Dumania and E. Osterschulze

Plasma etching for micromechanical sensor applications
Microelectronic Engineering, Volume 23, Issues 1-4, January 1994, Pages 365-368
I.W. Rangelow, S. Skocki and P. Dumania

Dry Etching for Microfabrication, International Meeting on Chemical Engineering and Biotechnology, Symposium "Microtechnology", Frankfurt am Main, Germany, 5-11 June (1994), I.W. Rangelow and R. Kassing

Submicro- and Nanometer Structure Fabrication using Direct Electron-Beam Writing and Reactive Ion Etching
Proc. "NANO`94"- Int`l. Conf. on Nanometrology Scanning Probe Microscopy and Related Techniques, 29-30. Aug. 94, Brno (Czech Republic) 1994, pp. 76-79, P. Hudek, I.W. Rangelow, I. Kostic, G. Stangl, Z. Borkowicz, R. Linnemann, L. Hadjiiski and T. Gotszalk

Electron-Beam Lithography and Reactive Ion Etching for Niobium Nanobridges Fabrication
Proc. of Symp. on Weak Superconductivity `94, Smolenice-Castle, Juni 1994 (Slovakia) 1994 pp. 121-127, I. Kostic, P. Hudek, I.W. Rangelow, Z. Borkowicz, S. Benacka and G. Stangl

Submicro- and Nanometer Structure Fabrication using Direct-Beam Writing and Reactive Ion Etchin
Proc. NANO`94- Int`l. Conf. on Nanometrology Scanning Probe Microscopy and Related Techniques, 29-30.8. Brno (Czech Republic) 1994 pp. 76-79, P. Hudek, I.W. Rangelow, I. Kostic, G. Stangl, Z. Borkowicz, R. Linnemann, L. Hadjiiski and T. Gotszalk

Lithography and reactive ion etching in microfabrication
NATO advenced research workshop, Reichenau, Konstanz Germany, September 11-17.94 published by Kluwer Publ.: NATO ASI Series, Vol. 300 (1994) pp. 325-344, I.W. Rangelow and P. Hudek

Cantilever mit integriertem Detektionsmechanismus auf piezoresistiver Basis
SXM1- Workshop über methodische Entwicklungen und industrielle Anwendungen der Nahfeld-Rastersondentechnik, Münster (1994) pp. 45-51, R. Linnemann, J. Schulte, I.W. Rangelow and R. Kassing

Lithography and reactive ion etching in microfabrication, Proceedings of NATO advanced research workshop, Reichenau, Konztanz, Germany, September, 1994, pp. 83-85; I.W. Rangelow and P. Hudek

Dry Etching for Microfabrication
International Meeting on Chemical Engineering and Biotechnology, Symposium Proceedings "Microtechnology", Frankfurt am Main, Germany, 5-11 June, 1994, pp. 23-25; I.W. Rangelow

Simulation of Plasma etching and Deposition Processes for the Microsystem-Technology
I.W. Rangelow
Electron Technology 26, No.1, pp. 59-64, Institute of Electron Technology, Warszawa 1993
ISBN 83-01-11293-X

Potentiometry and capacitance-measurements using a modular nearfield-microscope
In Verhandlungen DPG, Regensburg (1993) R. Linnemann, J. Schulte, S. Feng, B. Halstrup, I.W. Rangelow and R. Kassing

Very Deep Controlled Profile Silicon Reactive Ion Etching for Microsystem Application
Abstract Booklet of ME`93, Maastricht, Netherlands (1993) pp. 153-154; Z. Borkowicz and I.W. Rangelow

GaAs MSM Photodetectors Fully Compatible with Pseudomorphic Heterostructure MESFETS
Proc. on Heterostructure, Epitaxy and Devices, Smolenice Castle, Slovakia, 17-21 October (1993); J. Safrànkovà, M. Porges, T. Lalinsk`y, Z. Mozolovà, P. Hudek, I. Kostic, J. Kraus, W. von Wendorff, T.J. Tegude, D. Jäger and I.W. Rangelow

Transport Properties of Submicron Schottky Gates of GaAs Heterostructure FET
to be published in Proc. on Heterostructure, Epitaxy and Devices, Smolenice Castle, Slovakia, 17-21 October (1993); T. Lalinsky, M. Porges, P. Hudek and I.W. Rangelow

Experimental and Numerical Study of the Effects of Neutral Transport and Chemical Kinetics on the Plasma Etching System CF4/Si
Proceedings of the 11th International Symposium on Plasma Chemistry, Loughborough, UK, 22-27 August (1993) pp. 909-914; K. Wechsler, I.W. Rangelow, Z. Borkowisz, F. Durst, L. Kadinski and M. Schäfer

Simulation von Trockenätz- und Zerstäubungsdepositionsprozessen für die Mikrosystemtechnologie
Proc. of Gerätetechnik und Mikrosystemtechnik, VDI Berichte 960 Chemnitz, March 16-18 (1992), pp. 749-754, I.W. Rangelow

Simulation of Plasma Etching and Deposition Processes for the Microsystem-Technology
Proc. of 3rd Mid-European Symposium & Exhibition on Semiconductor Engineering and Technology-SET`92, October 12-14, Warsaw, Poland (1992) pp. 78-79, I.W. Rangelow

Extending of Electron Beam Lithography Capabilities Using New Highly Sensitive and Dry Etch Resistive Resists
Proc. of 3rd Mid-European Symposium & Exhibition  on Semiconductor Engineering and Technology-SET`92, Warsaw, Poland, October 12-14 (1992) pp. 252-253, I. Kostic, P. Hudek, I.W. Rangelow, Z. Borkowicz and G. Stangl

Some Experiments with Polymer Thick-Film Resistors
Proceedings of the 16th Conference of ISHM, Poland, 28-29. Sept. (1992) pp. 51-56, Dziedzic, H. Czarczynska, B.W. Licznerski, A. Severin anhd I.W. Rangelow

High-resolution tri-level process by downstream-microwave RF-biased etching
I.W. Rangelow; SPIE Vol. 1392 Advanced Techniques for Integrated Circuit Processing (1990)

Chlorine or bromine chemistry in RIE Si-Trench etching?
I.W. Rangelow and A. Fichelscher; SPIE Vol. 1392 Advanced Techniques for Integrated Circuit Processing (1990)

Trocken Ätz-Prozesse in Mikromechanik
VDI Verlag, "Mikroperipherik" Oktober (1988) pp. IV-V, R. Kassing and I.W. Rangelow

Grundlagen und Prinzipien der Wechselwirkung von Ionen-Strahlen mit Festkörpern (eine Übersicht)
21 Kolloquium des Arbeitskreises für Elektronenmikroskopische Direktabbildung und Analyse von Oberflächen (EDO), BEDO-21 (1988) pp. 171 - 178, I.W. Rangelow

Untersuchungen auf dem Gebiet der Simulation und Analyse der beim Ionenätzen entstehenden Kontamination - Teil III
Abschlußbericht zum Forschungsvorhaben f. Fa. Siemens VPA VA/GW/EL, Dec. (1987), I.W. Rangelow

Entwicklung von Plasma-Ätzprozessen für Herstellung von Si-Sensormembranen
Abschlußbericht zum Forschungsvorhaben 750/73037684, Januar (1987), I.W. Rangelow

Untersuchungen auf dem Gebiet der Simulation und Analyse der beim Ionenätzen entstehenden Kontamination - Teil II
Abschlußbericht zum Forschungsvorhaben VPA VA/GW/EL, Dec. 1986, I.W. Rangelow

Quntitative Analysis of Ion Reflection During Implantation of Trench-Cells in MBit DRAMs
Proceedings of the Conference 4th International Conference, National Physical Laboratory, Teddington, UK, 1986, pp. 234 - 239, K. Masseli, I.W. Rangelow, S. Saler, R. Kassing and R. Kakoschke

Ion Implantation into Three-Dimensional Structures
Proceedings of 6th Ion Implantation Conference on Ion Imp. Technol., Univ. of CA. Berkeley, July-Aug. 1986, pp. 432-436, R. Kakoschke, H. Binder, S. Röhl, K. Masseli, I.W. Rangelow, S. Saler and R. Kassing

Untersuchungen auf dem Gebiet der Simulation und Analyse der beim Ionenätzen entstehenden Kontamination
Abschlußbericht zum Forschungsvorhaben VPA VA/GW/EL, Dec. 1985, I.W. Rangelow

Charakterisierung Ionengeätzter Palladiumfolien mit SIMS, AES und REM
17. Kolloquium über Mikromorphologie und Mikroanalyse von Oberflächen, 16.-19. Sept. Homburg/Saar, BEDO-Band 17 (1984) pp. 81 - 86, I.W. Rangelow, H.G. Schöneich and H. Züchner

Ion Current Density Dirstibution in 12 cm Diameter Ion Source with Ion Source with Slot Extraction System
17. Kolloquium über Mikromorphologie und Mikroanalyse von Oberflächen, 16.-19. Sept. Homburg/Saar, BEDO-Band 17 (1984) pp. 69 - 74, S. Laszisz, Z. Radimski and I.W. Rangelow

Großflächiges Reliefätzen zur Materialdifferenzenzierung im REM
17. Kolloquium über Mikromorphologie und Mikroanalyse von Oberflächen, 16.-19. Sept. Homburg/Saar, BEDO-Band 17 (1984) pp. 75 - 79, I.W. Rangelow, R. Blaschke, R. Borchardt, G. Pfefferkorn and K. Schur

Computer Simulation of Ion Milling Processes for Pattern Fabrication
Gemeinsames Kolloquium über Oberflächenabbildung und Mikrobereichsanalyse, BEDO, Band 16, Joint Meeting on Electron Microscopy, Antwerp, Belgium, Sept. 11-16. (1983) pp. 135 - 142, I.W. Rangelow

Modification of the Surface Morphology of Biological Implant Material by Ion Beam Sputtering
Gemeinsames Kolloquium über Oberflächen-Abbildung und Mikribereichsanalyse, BEDO Band 15, Bremen - Vegesack, Germany (1982) pp. 27 - 32, I.W. Rangelow and Z. Kowalski

The Time-Geometrical Dependence`s for the Topography of the Sputtered Amorphous Solids
Proceedings of the 10th International Congress on Electron Microscopy, Hamburg, Germany, BEDO Vol. 2, August 17.-24. (1982) pp. 183-184, Mulak, H. Szymanski and I.W. Rangelow

Ion Milling Simulation
Proceedings of the Third Microelectronic Conference, Siofok-Hungary, May (1982) pp. 191-192, I.W. Rangelow

The Modified Kaufman Type Ion Source For Microfabrication
Proceedings of the Third Microelectronics Conference Siofok-Hungary, May (1982) pp. 107-108, I.W. Rangelow and Z. Radzimski

Application of Ion Etching to the Examination of Thick Films
Proceedings of the 26th International Colloquium, Ilmenau, 1981, pp. 67-69, A. Darlinski and I.W. Rangelow

An Extracting System of Ion Stream from Gas Discharge Plasma
Proceedings of the Conference 8th International Conference on Plasma Sci., Santa Fe, New Mexico, USA 18-20 May 1981, pp. 252-259, I.W. Rangelow

Profiles of Al, Sio2 Pattern Obtained by Ion Beam Etching
Proceedings of the Conference of Electron Technology, Karpcz, 1980, pp. 230-233 I.W. Rangelow and A. Darlinski

SEM Observation of Line Edge Profiles of Microelectronic Structure
Proceedings of the Conference of Electron Technology, Karpcz, 1980, pp. 203-205, A. Darlinski and I.W. Rangelow

Ion Beam Etching of Al, Si and SiO2
Proceedings of the Conference of Electron Technology, Karpcz 1980, pp. 227-229, Z. Radzimski and I.W. Rangelow

Ion Beam Etching System
Proceedings of the Conference of Electron Technology, Karpcz, 1980, pp. 224-227, Z. Radzimski and I.W. Rangelow

Properties of Ion Sources UTRR-1
Proceedings of the Conference of Electron Technology Wroclaw-Karpcz, Poland, 1980, pp. 221-223, I.W. Rangelow and Z. Radzimski