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Ivo W. Rangelow

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INHALTE

Publications

2017

2017

Articles

Excited states and quantum confinement in room temperature few nanometre scale silicon single electron transistors
Z. A. K. Durrani et al.
Nanotechnology 28 (2017) 125208

Advanced oxidation Scanning Probe Lithography
Y. K. Ryu, et al.
Nanotechnology 28 (2017) 142003

Scanning probe-based high-accuracy overlay alignment concept for lithography applications
V. Ishchuk, et al.
Applied Physics A, 123 (2017) 1

Simulation of field emission from volcano-gated tips for scanning probe lithography
S. Lenk et al.
Microelectron. Eng. 177 (2017) 19

Atomic layer etching in close-to-conventional plasma etch tools
A. Goodyear, et al.
J. Vac. Sci. Technol. A 35, 01A105 (2017)

Conference Contributions

1 conference contributions in the last 3 months of the project.

2016

2016

Articles

Subsurface imaging of silicon nanowires circuits and iron oxide nanoparticles with sub-10 nm spatial resolution
A.P. Perrino, et al.
Nanotechnology 27 (2016) 275703

Sub-20 nm patterning of thin layer WSe2 by scanning probe lithography
Arancha I. Dago,  et al.
Appl. Phys. Lett. 109 (2016) 163103

Athermal Azobenzene-Based Nanoimprint Lithography
Christian Probst,et al.
Adv. Mater. 28 (2016) 2624–2628

Tip Motion—Sensor Signal Relation for a Composite SPM/SPL Cantilever
Dennis Roeser, et al.
IEEE Journal of Microelectromechanical Systems, JMEMS 25 (2016) 78

Helium Ion Beam Lithography on Fullerene Molecular Resists for Sub-10 nm Patterning
X Shi, et al.
Microelectronic Engineering 155 (2016) 74

Thermo-mechanical transduction suitable for high-speed scanning probe imaging and lithography
T. Angelov, et al.
Microelectronic Engineering 154 (2016) 1-7

Sensitivity of secondary electron yields and SEM images to scattering parameters in MC simulations
T. Verduin et al.
Microelectronic Engineering 155 (2016) 114

Special Issue of Microelectronic Engineering on Micro- and Nanopatterning 2015
C.W. Hagen et al.
Microelectronic Engineering 155 (2016) ppA1

Six - axis AFM in SEM with self-sensing and self-transduced cantilever for high speed analysis and nano-lithography
T. Angelov, et al.
J. Vac. Sci. Technol. B34 (2016) 06KB01

2D simulation of Fowler-Nordheim electron emission in scanning probe lithography
S. Lenk et al.
J. Nanomater. Mol. Nanotechnol. 5:6 (2016) 10000201

Evaluating the compressive stress generated during fabrication of Si doubly clamped nanobeams with AFM
J. Llobet, et al.
J. Vac. Sci. Technol. B34 (2016) 06KK02

Pattern-generation and pattern-transfer for single-digit nano devices
I. W. Rangelow, et al.
J. Vac. Sci. Technol. B34 (2016) 06K202

Large area fast-AFM scanning with active “Quattro” cantilever arrays
A. Ahmad, et al.
J. Vac. Sci. Technol. B34 (2016) 06KM03

Book Chapter

Thermal scanning probe lithography
Philip C. Paul
Frontiers of Nanoscience; Materials and Processes for Next Generation Lithography
ISBN: 9780081003541

Conference Proceedings

Modelling and Compensation of Thermally Induced Positioning Errors in a High Precision Positioning Application
Simon Züst et al.
IFAC-PapersOnLine 49 (21), , 2016. ISSN 2405-8963,

Molecular glass resists for scanning probe lithography
Christian Neuber, et al.
Proc. of SPIE Vol. Vol. 9779 (2016) 97791C

Simulation of shotnoise induced side-wall roughness in electron lithography
T. Verduin et al.
Proc. of SPIE Vol. Vol. 9778 (2016) 97781Z

Conference Contributions

47 conference contribution in this year

2015

2015

Articles

Large-Area MoS2 Grown Using H2S as the Sulphur Source
D. Dumcenco, D. Ovchinnikov, O. L. Sanchez, P. Gillet, D. T. L. Alexander, Sorin Lazar, A. Radenovic, A. Kis
2D Materials 2 (2015) 044005

Athermal Azobenzene-Based Nanoimprint Lithography
C. Probst, C. Meichner, K. Kreger, L. Kador, C. Neuber, and H.-W. Schmidt (UBT)
Advanced Materials (accepted, doi:10.1002/adma.201505552)

Refractive-index determination of solids from first- and second-order critical diffraction angles of periodic surface patterns
Christoph Meichner, Andreas E. Schedl, Christian Neuber, Klaus Kreger, Hans-Werner Schmidt and Lothar Kador
AIP Advances 5 (2015) 087135

Large-Area Epitaxial Monolayer MoS2
D. Dumcenco, D. Ovchinnikov, K. Marinov, P. Lazić, M. Gibertini, N. Marzari, O. L. Sanchez, Y.-C. Kung, D. Krasnozhon, M.-W. Chen, S. Bertolazzi, P. Gillet, A. Fontcuberta i Morral, A. Radenovic, A. Kis
ACS Nano 9 (2015) 4611

Accurate Location and Manipulation of Nanoscaled Objects Buried under Spin-Coated Films
Colin Rawlings, Heiko Wolf, James L. Hedrick, Daniel J. Coady, Urs Duerig, and Armin W. Knoll
ACS Nano 9 (2015) 6188

Direct fabrication of thin layer MoS2 field-effect nanoscale transistors by oxidation scanning probe lithography
F.M. Espinosa, Y.K. Ryu, K. Marinov, D. Dumenco, A. Kis, R. Garcia
Appl. Phys. Lett. 106 (2015) 103503

Tuning piezoresistive transduction in nanomechanical resonators by geometrical asymmetries
J. Llobet, M. Sansa, M. Lorenzoni, X. Borrisé, A. San Paulo, and F. Perez-Murano
Appl. Phys. Lett. 107 (2015) 073104

Resonant tunnelling features in a suspended silicon nanowire single-hole transistor
J. Llobet, E. Krali, C. Wang, J. Arbiol, M. E. Jones, F. Pérez-Murano, Z. A. K. Durrani
Appl. Phys. Lett.  107 (2015) 2235021

Boosting local anodic oxidation of silicon through carbon nanofiber AFM probes
G. Rius, M. Lorenzoni, S. Matsui, M. Tanemura and F. Perez-Murano
Beilstein J. Nanotech. 6 (2015) 215

Active Microcantilevers for High Material Contrast in Harmonic Atomic Force Microscopy
A. Schuh, M. Hofer, Tzv. Ivanov and I.W. Rangelow
IEEE Journal of Microelectromechanical Systems, JMEMS (2015) 2428677

Tip Motion—Sensor Signal Relation for a Composite SPM/SPL Cantilever
D. Roeser, S. Gutschmidt, T. Sattel, and I. W. Rangelow
J-MEMS (Journal of Microelectromechnical Systems) (2015) (accepted)

Profile simulation model for sub-50nm cryogenic etching of silicon using SF6/O2 inductively coupled plasma
V. Ishchuk, D.L. Olynick, Z. Liu and I.W. Rangelow
J. Appl. Phys. 118 (2015) 053302

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics
J.-F. de Marneffe, L. Zhang, M. Heyne, M. Lukaszewicz, S. B. Porter, F. Vajda, V. Rutigliani, Z. el Otell, M. Krishtab, A. Goodyear, M. Cooke, P. Verdonck, and M. R. Baklanov
J. Appl. Phys. 118 (2015) 133302

Vacuum ultra-violet emission of CF4 and CF3I containing plasmas and Their effect on low-k materials
Z el Otell, V Šamara, A Zotovich, T Hansen, J-F de Marneffe and M R Baklanov
J. Phys. D: Appl. Phys. 48 (2015) 395202

Sub-20nm silicon patterning and metal lift-off using thermal scanning probe lithography
H. Wolf, C. Rawlings, P. Mensch, J. L. Hedrick, D. J. Coady, U. Duerig, A. W. Knoll
J. Vac. Sci. Technol. B 33 (2015) 02B102

Selective Laser Ablation in Resists and Block Copolymers for High Resolution Lithographic Patterning
D. L. Olynick, P. Perera, A. Schwartzberg, P. Kulshreshta, D. G. De Oteyza, N. Jarnagin, C. Henderson, Z. Sun, I. Gunkel, T. Russell, M. Budden, and I. W. Rangelow
Journal of Photopolymer Science and Technology 28 (2015) 663

Fabrication of functional electromechanical nanowire resonators by focused ion beam implantation
J. Llobet, M. Gerbolés, M. Sansa, J. Bausells, X. Borrisé, F. Pérez-Murano
Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) Accepted

Advanced electric-field scanning probe lithography on molecular resist using active cantilever
Kaestner, M., Aydogan C., Lipowicz, H.-S., Ivanov, T., Lenk, S., Ahmad, A., Angelov, T., Reum, A., Ishchuk, V., Atanasov, I., Krivoshapkina, Y., Hofer, M., Holz, M., Rangelow, I. W.
Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) 14 (2015) 031202

Nanomechanical properties of solvent cast polystyrene and poly(methyl methacrylate) polymer blends and self-assembled block copolymers
M. Lorenzoni,  L. Evangelio,  C. Nicolet,  C. Navarro,  A. San Paulo,  G. Rius,  F. Pérez-Murano
Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3)14 (2015) 033511

Effects of current on early stages of focused ion beam nano-machining
A. Sabouri, C. J. Anthony, P. D. Prewett, J. Bowen, H. Butt
Mater Res Express 2 (2015) 055005

Electromechanical Oscillations in Bilayer Graphene
M. M. Benameur, F. Gargiulo, S. Manzeli, G. Autès, M. Tosun, O. V. Yazyev, A. Kis
Nature Communications 6 (2015) 8582

Nanoscale reduction of graphene oxide thin films and its characterization
M. Lorenzoni, A. Giugni, E. Di Fabrizio, F. Perez-Murano, A. Mescola and B. Torre
Nanotechnology 26 (2015) 285301

Single-electron and quantum confinement limits in length-scaled silicon nanowires
Z. Durrani, C. Wang, M. E. Jones
Nanotechnology (2015) Accepted

Piezoresistivity and Strain-Induced Band Gap Tuning in Atomically Thin MoS2
S. Manzeli, A. Allain, A. Ghadimi, A. Kis
Nano Letters 15 (2015) 5330

Extraction and neutralization of positive and negative ions from a pulsed electronegative inductively coupled plasma
D. Marinov, Z. el Otell, M. D. Bowden and N. St. J. Braithwaite
Plasma Sources Sci. Technol. 24 (2015) 065008

Conference Proceedings

Advanced electric-field scanning probe lithography on molecular resist using active cantilever
Kaestner, M., Aydogan C., Lipowicz, H.-S., Ivanov, T., Lenk, S., Ahmad, A., Angelov, T., Reum, A., Ishchuk, V., Atanasov, I., Krivoshapkina, Y., Hofer, M., Holz, M., Rangelow, I. W.
Proc. of SPIE Vol. 9423 (2015) 94230E

Self-actuated, self-sensing cantilever for fast CD measurement
Ahmad, A., Ivanov, T., Reum, A., Guliyev, E., Angelov, T., Schuh, A., Kaestner, M., Atanasov, I., Hofer, M., Holz, M., Rangelow, I. W.
Proc. of SPIE Vol. 9424 (2015) 94240P

The effect of sidewall roughness on line edge roughness in top-down scanning electron microscopy images
T. Verduin; S. R. Lokhorst; P. Kruit; C. W. Hagen
Proc. SPIE 9424 (2015) 942405

Pattern transfer into silicon using sub-10 nm masks made by Electron Beam Induced Deposition
M. Scotuzzi, M.J. Kamerbeek, A. Goodyear, M. Cooke and C.W. Hagen
Proc. SPIE 9423 (2015) 94230I

Tailored molecular glass resists for Scanning Probe Lithography
Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Andreas Ringk, Tristan Kolb, Andreas Schedl, Vincent Fokkema, Marijn G.A. van Veghel, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean- François de Marneffe, Ziad el Otell, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo W. Rangelow
Proc. of SPIE Vol. 9425 (2015) 94250E

Molecular glass resist performance for nano-pattern transfer
Z. el Otell, A. Ringk, T. Kolb, C. Neuber, L. Hansel, JF de Marneffe
Proc of SPIE 9428 (2015) 94280J

Ar and H2 plasma and ion/neutral beam treatment of EUV resists
P. De Schepper, D. Marinov, Z. el Otell, E. Altamirano-Sanchez, J.-F. de Marneffe, S. De Gendt, N. St. J. Braithwaite
Proc of SPIE 9428 (2015) 94280C

Conference contributions

57 conference contributions in this year.

2014

2014

Review Article(s)

Advanced scanning probe lithography
Ricardo Garcia, Armin W. Knoll and Elisa Riedo
NATURE NANOTECHNOLOGY 9 (2014) 577

Articles

The effects of dwell time on focused ion beam machining of silicon
A. Sabouri, C.J. Anthony, J. Bowen, V. Vishnyakov, P.D. Prewett
Peer-Reviewed Article, Microelectronic Engineering 121 (2014) 24

Seebeck coefficient of one electron
Z. A. K. Durrani
Peer-Reviewed Article, J. Appl. Phys. 115 (2014) 094508

Fabrication of sub-12 nm thick silicon nanowires by processing scanning probe lithography masks
Y. K. Ryu, P. A. Postigo, F. Garcia and R. Garcia
Peer-Reviewed Article, Appl. Phys. Lett. 104 (2014) 223112

Scanning probes in nanostructure fabrication
M. Kästner, T. Ivanov, A. Schuh, A. Ahmad, T. Angelov, Y. Krivoshapkina, M. Budden, M. Hofer, S. Lenk, J.-P. Zöllner, I. W. Rangelow, A. Reum, E. Guliyev, M. Holz, and N. Nikolov
Peer-Reviewed Article, J. Vac. Sci. Technol. B 32 (2014) 06F101

Line edge and width roughness smoothing by plasma treatment
P. De Schepper, T. Hansen, E. Altamirano-Sanchez, A. Vaglio Pret, Z. el Otell, W. Boulart, S. De Gendt
Peer-Reviewed Article, J. Micro/Nanolith. MEMS MOEMS 13 (2014) 023006

Nanometer accurate markerless pattern overlay using thermal Scanning Probe Lithography
C. Rawlings, U. Duerig, J. Hedrick, D. Coady, A. W. Knoll
Peer-Reviewed Article, IEEE TRANSACTIONS ON NANOTECHNOLOGY, 13 (2014) 1204

Electrical Transport Properties of Single-Layer WS2
D. Ovchinnikov, A. Allain, Y.-S. Huang, D. Dumcenco, A. Kis
Peer-Reviewed Article, ACS Nano 8 (2014) 8174

Sub-10 nm Resistless Nanolithography for Directed Self-Assembly of Block Copolymers
M. Fernández-Regúlez, L. Evangelio, M. Lorenzoni, J. Fraxedas, and F. Pérez-Murano
Peer-Reviewed Article, ACS Applied Materials & Interfaces 6 (2014) 21596

High-sensitivity linear piezoresistive transduction for nanomechanical beam resonators
M. Sansa, M. Fernández-Regúlez, J. Llobet, Á. San Paulo, F. Pérez-Murano
Peer-Reviewed Article, Nature Communications 5 (2014) 4313

Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing
S. Hari, C. W. Hagen, T. Verduin, and P. Kruit
Peer-Reviewed Article, J. Micro/Nanolith. MEMS MOEMS 13 (2014) 033002

Determination of line edge roughness in low-dose top-down scanning electron microscopy images
T. Verduin, P. Kruit, and C. W. Hagen
Peer-Reviewed Article, J. Micro/Nanolith. MEMS MOEMS 13(2014) 033009

Pattern Roughness Mitigation of 22nm Lines and Spaces:  The Impact of a H2 Plasma Treatment
De Schepper, A. V. Pret, Z. el Otell, T. Hansen, E. Altamirano-Sanchez, S. De Gendt
Peer-Reviewed Article, Plasma Process. Polym. … (2014) … online

The influence of H2 plasma treatment on LWR mitigation: The importance of EUV photoresist composition
P. De Schepper, Z. el Otell, A. V. Pret, E. Altamirano-Sanchez, S. De Gendt
Peer-Reviewed Article, Plasma Process. Polym. … (2014) … online

Conference Proceedings

Closed-loop high-speed 3D thermal probe nanolithography
A. W. Knoll, M. Zientek, L. L. Cheong, C. Rawlings, P. Paul, F. Holzner, J. L. Hedrick, D. J. Coady, R. Allen, U. Dürig
Conference Proceeding, Proc. of SPIE Vol. 9049 (2014) 90490B

Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever
Marcus Kaestner, Konrad Nieradka, Tzvetan Ivanov, Steve Lenk, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Elshad Guliyev, Alexander Reum, Matthias Budden, Tomas Hrasok, Manuel Hofer, Christian Neuber, Ivo W. Rangelow
Conference Proceeding, Proc. of SPIE Vol. 9049 (2014) 90490C

Size and shape control of sub-20 nm patterns fabricated using focused electron beam induced processing
S. Hari, C. W. Hagen, T. Verduin, P. Kruit
Conference Proceeding, Proc. of SPIE Vol. 9049 (2014) 90490M

Molecular glass resists for scanning probe lithography
Christian Neuber, Andreas Ringk, Tristan Kolb, Florian Wieberger, Peter Strohriegl, Hans-Werner Schmidt, Vincent Fokkema, Mike Cooke, Colin Rawlings, Urs Dürig, Armin W. Knoll, Jean-Francois de Marneffe, Peter De Schepper, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo W. Rangelow
Conference Proceeding, Proc. of SPIE Vol. 9049 (2014) 90491V

BEST STUDENT PAPER AWARD: Determination of line edge roughness in low dose top-down scanning electron microscopy images
T. Verduin, P. Kruit, and C.W. Hagen
Conference Proceeding, Proc. of SPIE Vol. 9050 (2014) 90500L

Tone-Switching Scanning Probe Lithography for Sub-10 nm Patterning
M. Kästner, M. Budden, Y. Krivoshapkina, S. Lenk, A. Ahmad, T. Angelov, A. Reum, M. Hofer, T. Ivanov, C. Neuber, H.-W. Schmidt and I. W. Rangelow
Conference Proceeding , MNE2014 Paper ID: A5L-A-1

High Frequency and Low Stiffness Cantilever for High Speed AFM
T. Ivanov, M. Hofer, M. Kaestner, A. Ahmad, T. Angelov, A. Reum, E. Guliyev, M. Holz, I. W. Rangelow
Conference Proceeding, MNE2014 Paper ID: P2-16-Wd

Backside Actuated Heatable Cantilevers for Thermal Scanning Probe Lithography
S. Bonanni, P. Paul, F. Holzner, U. Drechsler, U. Dürig, M. Despont, A. W. Knoll
Conference Proceeding , MNE2014 Paper ID: P2-18-Th

Topography Prediction Following Spin Coating for Markerless Overlay using Thermal Scanning Probe Lithography
C. Rawlings, H. Wolf, D. Coady, J. Hedrick, P. Mensch, U. Dürig, A. Knoll
Conference Proceeding , MNE2014 Paper ID: A5L-A-2

Nano-Pattern Transfer Into Silicon using Masks Made by Electron Beam Induced Deposition
M. Scotuzzi, M. Kamerbeek, A. Goodyear, C.W. Hagen
Conference Proceeding, MNE2014 Paper ID: P3-42-Th

Reproducibility and Size Control of Lines Fabricated by Electron Beam Induced Deposition,
S. Hari, T. Verduin, P. Kruit, C.W. Hagen (TUD)
Conference Proceeding, MNE2014 Paper ID: P4-70-Th

Determination of Line Edge Roughness in the Limit of CD-SEM Image Shotnoise             
T. Verduin, P. Kruit, C.W. Hagen
Conference Proceeding, MNE2014 Paper ID: P4-91-Tu

The Influence of Hydrogen Plasma Treatment on LWR Mitigation: the Importance of EUV Photoresist Composition
P. De Schepper, Z. el Otell, A. Vaglio-Pret, J.-F. de Marneffe,  E. Altamirano-Sanchez, S. De Gendt
Conference Proceeding, MNE2014 Paper ID: C4L-A-3

Plasma Etch Challenges of Directed Self-Assembly (DSA) for Fin and Contact Holes Patterning in 7nm (N7) Technology Node
B. T. Chan, S. Sayan, J. Bekaert, J. Doise, R. Gronheid, J.-F. de Marneffe, K. Xu (IMEC)
Conference Proceeding, MNE2014 Paper ID: D1L-A-2

Seebeck Coefficient in Si Nanowires and Single-Electron Effects
E. Krali, K. Fobelets, Z.A.K. Durrani
Conference Proceeding, MNE2014 Paper ID: A2L-B-4

Nanowire Single Electron Devices Defined by EBL
C. Wang, M. Jones, Z. A. K. Durrani
Conference Proceeding, MNE2014 Paper ID: P3-14-Tu

Micro enables Nano - Active Cantilever for Single Digit Nanofabrication
Marcus Kaestner, Tzvetan Ivanov, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Hubert Lipowicz, Matthias Budden, Steve Lenk, Manuel Hofer, Cemal Aydogan, Mathias Holz, Ivaylo Atanasov, Elshad Guliyev, Katarzyna Szostak, Valentyn Ishchuk, Andreas Schuh, Jens-Peter Zoellner, and Ivo W. Rangelow
Conference Proceeding , Conf. Proc. Of 5th GMM Workshop Mikro-Nano-Integration 8th-9th Oct 2014

Conference Contributions

2013

2013

Status and Challenges for Probe Nanopatterning
U. Duerig
Exhibition at SemiCon 2013

28nm pitch of line/space pattern transfer into silicon substrates with chemo‐epitaxy directed self‐assembly (DSA) process flow
Chan Boon Teik, S. Tahara, D. Parnell, P. A. R. Delgadillo, R. Gronheid, J.‐F. de Marneffe, K. Xu, E. Nishimura, W. Boullart
Micro and nano fabrication, Poster MNE 2013

Scanning Probes in Nanostructures Fabrication
I. W. Rangelow
Invited talk, MNE 2013

Nanowire single-electron transistors with varying gate layouts
W. Chen
Micro and nano fabrication, Poster MNE 2013

Investigating the etching process on improving contact hole local CD uniformity and CD shrinkage for 30nm contact hole patterning and beyond with EUV lithography
M. Mao, J. Hermans, J.‐F. de Marneffe, K. Xu, Shaunee C.
Micro and nano fabrication, Proc. MNE 2013

Molecular glass resists for all‐dry high‐resolution scanning probe lithography
C. Neuber, M. Cooke, M. Despont, U. Dürig, M. Kästner, A. W. Knoll, J.‐F. de Marneffe, I. W. Rangelow, C. Rawlings, P. De Schepper, H.-W. Schmidt
Micro and nano lithography, Proc. MNE 2013

AFM nanolithography for creating guiding patterns for direct self‐assembly of block co‐polymers
M. Fernandez‐Regulez, L. Evangelio, L. Oria, F. Perez‐Murano
Micro and nano lithography, Proc. MNE 2013

Effects of focused ion beam dwell time on Nano fabrication
A. Sabouri, C. Anthony, P. Prewett, J. Bowen
Micro and nano fabrication, Poster MNE 2013

Angular effects in focused ion beam milling of silicon
A. Sabouri, C. Anthony, P. Prewett, J. Bowen
Micro and nano fabrication, Poster MNE 2013

Electrical characteristics of silicon nanowire transistors fabricated by scanning probe and electron beam lithographies
Y. K. Ryu., M. Chiesa, R. Garcia
Nanotechnology 24 (2013) 315205

Pattern Overlay using Thermal Scanning Probe Lithography
C. Rawlings, A. Knoll, U. Drechsler, J. L. Hedrick, D. J. Coady, M. Despont, U. T. Duerig
Micro and nano lithography, Proc. MNE 2013

Closed-loop 3D thermal scanning probe lithography
M. Zientek, J. L. Hedrick, D. J. Coady, M. Despont, U. Duerig, A.W. Knoll
Micro and nano lithography, Proc. MNE 2013

Scanning probe lithography for electronics at the 5nm scale
Z. Durrani, M. Kaestner, M. Hofer, Tzv. Ivanov and I.W. Rangelow
SPIE 2013 Advanced Lithography 24-28 February
SPIE Newsroom (Cache)

Scanning Probe Lithography approach for beyond CMOS devices
Z. Durrani, M. Jones, M. Kaestner, M. Hofer, E. Guliyev. A. Ahmad, Tzv. Ivanov, J.-P. Zoellner and I.W. Rangelow
Advanced Lithography, Proc. of SPIE Vol. 8680 (2013) 868017

0.1-nanometer resolution positioning stage for sub-10nm scanning probe Lithography
N. Vorbringer-Doroshovets, F. Balzer, E. Manske, M. Kaestner, A. Schuh, J.-P. Zoellner, M. Hofer, E. Guliyev, A. Ahmad, Tzv. Ivanov and I.W. Rangelow
Advanced Lithography, Proc. of SPIE Vol. 8680 (2013) 868018

Mix & Match Eelctron Beam & Scanning Probe Lithography for high troughput sub-10nm Lithography
M. Kaestner, M. Hofer and I.W. Rangelow
Advanced Lithography, Proc. of SPIE Vol. 8680 (2013) 868019

Nanolithography by scanning probes on calixarene molecular glass resist using Mix & Match Lithography
M. Kaestner, M. Hofer and I.W. Rangelow
Invited Special Section Paper, JM3 (Journal of Micro/Nanolithography, MEMS and MOEMS) 12 (2013) 031111

Block co-polymer multiple patterning directed self-assembly on PS-OH brush layer and AFM based nanolithography
L. Oria, A. R. de Luzuriaga, J. A. Alduncín, F. Pérez-Murano (CSIC)
Proc. of SPIE Vol. 8680 (2013) 868022

Thermal Probe Nanolithography: in-situ inspection, high-speed, high-resolution, 3D F. Holzner, P. Paul, M. Despont, L. L. Cheong, J. Hedrick, U. Dürig, A. Knoll (SL and IBM)
Proc. of SPIE Vol. 8886 (2013) 888605