Mehrlagige diffraktive Alvarez-Lohmann Linsen für polychromatische Anwendungen :
Multi-layer diffractive Alvarez-Lohmann lenses for polychromatic applications. - In: DGaO-Proceedings, ISSN 1614-8436, Bd. 120 (2019), A21, insges. 2 S.
https://nbn-resolving.org/urn:nbn:de:0287-2019-A021-7
Optimierung der Abbildungseigenschaften eines Lichtschichtmikroskops durch die Beleuchtung mit einem Talbotteppich :
Optimization of the imaging properties of a light sheet fluorescence microscope (LSFM) by illumination with Talbot carpets. - In: DGaO-Proceedings, ISSN 1614-8436, Bd. 120 (2019), A6, insges. 2 S.
https://nbn-resolving.org/urn:nbn:de:0287-2019-A006-1
Applications of a fiber coupled chromatic confocal sensor in nanopositioning and nanomeasuring machines :
Anwendungen eines fasergekoppelten chromatisch konfokalen Sensors in Nanopositionier- und Nanomessmaschinen. - In: Technisches Messen, ISSN 2196-7113, Bd. 86 (2019), S. S17-S21
https://doi.org/10.1515/teme-2019-0041
Comparision of deep etched borosilicate glasses in a fluorine based plasma. - In: 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems & Eurosensors XXXIII (Transducers & Eurosensors XXXIII), (2019), S. 1678-1681
https://doi.org/10.1109/TRANSDUCERS.2019.8808269
Extended characterization of multispectral resolving filter-on-chip snapshot-mosaic CMOS cameras. - In: Algorithms, Technologies, and Applications for Multispectral and Hyperspectral Imagery XXV, (2019), S. 109860I-1-109860I-11
https://doi.org/10.1117/12.2518842
Micro- and nanofabrication technologies using the nanopositioning and nanomeasuring machines. - In: Optical Measurement Systems for Industrial Inspection XI, (2019), S. 1105637-1-1105637-13
To keep up with Moore's law in future, the critical dimensions of device features must further decrease in size. Thus, the nano-electronics and nano-optics manufacturing is based on the ongoing development of the lithography and encompasses also some unconventional methods. In this context, we use the Nanopositioning and Nanomeasuring Machine (NPMM) to generate features in resist layers by means of Direct Laser Writing (DLW),1 Field Emission Scanning Probe Lithography (FE-SPL)2 and Soft UV-Nanoimprint Lithography (Soft UV-NIL)3 with highest accuracy. The NPMM was collaboratively developed by TU Ilmenau and SIOS Meßtechnik GmbH.4 The tool provides a large positioning volume of 25 mm × 25 mm × 5 mm with a positioning resolution of 0.1 nm and a repeatability of less than 0.3 nm over the full range. Previously a single electron transistor (SET) working at room temperature generated by FE-SPL has been demonstrated.5 However, the throughput is limited because of the serial writing scheme making Tennant's law (At R5 ) valid.6 Here, At is the areal throughput and R the lithographic resolution. Thus, patterning of the whole NPMM positioning area by FE-SPL is very time consuming. In order to address this problem, different strategies and/or combinations are conceivable. In this work a so-called Mix-and-Match lithography is conducted. A fast generation of structures in the sub-micron range is possible by means of DLW. By this, features such as electrical wires, contact patches for bonding or labels are generated in resist. Subsequently, we use FE-SPL in order to define the actual nano-scaled features for quantum or single electron devices. In combination, DLW and FE-SPL are maskless lithography strategies, hence, offering completely novel opportunities for rapid nanoscale prototyping of largescale resist patterns. An explanation of this technique is given in a previous publication.7 Furthermore, after reactive ion etching, the sample can be used as template for Soft UV-NIL, thus resulting in a high-throughput process chain for future quantum and/or single electron devices.
https://doi.org/10.1117/12.2528136
Intrinsic surface feature based subaperture stitching of freeform wavefront. - In: Modeling Aspects in Optical Metrology VII, (2019), S. 1105708-1-1105708-10
The subaperture stitching technique requires the registration of freeform subapertures into global coordinate frame before stitching in order to compute entire freeform wavefront. A scanning Shack-Hartman Sensor (SHS) utilizes translation stages to scan the freeform surface in XY plane and measure the slope data of various subapertures. The measured slope data is then integrated using weighted cubic spline (WCSLI) based integration method to compute the phase data. The positioning error during scanning causes misalignments between the measured subapertures and their nominal values. The least square based subaperture stitching methods are not capable to minimize lateral misalignment errors of freeform subapertures and therefore degrade the performance of subaperture stitching process. In this work, we have utilized fiducial added planes for correction of angular and rotation misalignments of an extended cubic phase plate. An intrinsic surface feature (ISF) based registration method is used for lateral misalignment corrections. Gaussian curvature is used as an intrinsic pattern which can be defined as one of the fundamental second order geometric properties of a surface. Any shift in the peaks of the Gaussian curvature of reference and measured subaperture corresponds to lateral misalignments in X and Y directions and need to be minimized before registration of subaperture into global frame of reference. After precise registrations, all the subapertures are stitched with consistent overlapping area by using least square fitting method. A numerical validation of the proposed scheme is carried out which demonstrates the effectiveness of the proposed method to improve the subaperture stitching accuracy.
https://doi.org/10.1117/12.2526037
Super-directional light emission from arrays of deformed microcavities. - In: DPG-Frühjahrstagung 2019 (DPG Spring Meeting 2019) of the Condensed Matter Section (SKM) together with the Division Radiation and Medical Physics and the Working Groups Equal Opportunities, Industry and Business, Young DPG; Symposia, exhibition of scientific instruments and literature, (2019), KFM 4.10
Control of projection uniformity and fidelity in spatial light modulator-based holography. - In: Proceedings, 2019 IEEE International Conference on Mechatronics (ICM), (2019), S. 129-134
This work describes the steps necessary for a holographic pattern projection of high quality with a phase-only Liquid crystal on silicon spatial light modulator (LCoS-SLM). The aim is high-throughput optical lithography on nonplanar surfaces. Aspects of diffractive optical element calculation as well as aspects of aberration compensation are needed to increase the uniformity and fidelity of intricate patterns.
https://doi.org/10.1109/ICMECH.2019.8722858
Opto-mechatronic system for control and characterization of the coherence properties of light sources. - In: Proceedings, 2019 IEEE International Conference on Mechatronics (ICM), (2019), S. 141-145
Two opto-mechatronic systems for optical measurements are proposed and realized. The first experimental setup is applied for determining the temporal coherence of light sources. The other opto-mechatronic system is used to study the Lau effect with a partially coherent light source, which is unconventional in Lau's experiment.
https://doi.org/10.1109/ICMECH.2019.8722891