Field-emission scanning probe lithography is a capable nanofabrication technique to define structures for advanced nanosensors and devices beyond CMOS. Nevertheless, a significant increase in writing speed from µm/s to mm/s is required to meet the demand for efficient nanostructuring on a large scale. In this regard, multiple strategies should be evaluated in this project that comprise the parallel use of scanning probes, improved writing algorithms and the evaluation of the scanning probe architecture itself. Tip-based patterning should be realized with high velocity and reproducibility on wafers of up to 4 inch and on 3D patterned surfaces using, for instance, a 5-axis nanopositioning stage. Key categories: - nanometrology
- atomic force microscopy / scanning probe techniques
- electronics
- microtechnology
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