Sub-project A

Scanning probe techniques such as atomic force microscopy are highly relevant tools within the field of nanotechnology. In this project, field-emission scanning probes shall be explored for precise electron induced modifications of sensitive resists and 2D materials. The interaction of the field-emission tip with these materials and with the environment should be explored to enable new strategies for 3D nanopatterning with single-digit nanometer precision. In combination with a nanopositioning and nanomeasuring device and further techniques in a so-called “mix-and-match” approach, quantum electronic nanoscale devices should be assembled at large-scale and characterized with respect to the material and the electronic properties.

Key categories:

• semiconductor and materials science
• electronic devices
• microtechnology
• atomic force microscopy / scanning probe techniques

Field-emission scanning probe lithography is a capable nanofabrication technique to define structures for advanced nanosensors and devices beyond CMOS. Nevertheless, a significant increase in writing speed from µm/s to mm/s is required to meet the demand for efficient nanostructuring on a large scale. In this regard, multiple strategies should be evaluated in this project that comprise the parallel use of scanning probes, improved writing algorithms and the evaluation of the scanning probe architecture itself. Tip-based patterning should be realized with high velocity and reproducibility on wafers of up to 4 inch and on 3D patterned surfaces using, for instance, a 5-axis nanopositioning stage.

Key categories:

• nanometrology
• atomic force microscopy / scanning probe techniques
• electronics
• microtechnology

Compliant mechanisms are indispensable and functionally important parts of systems in nanofabrication technology. Synthesis of compliant mechanisms is often done using the rigid-body mechanisms as a model. Although these methods are always converging, the question of independently designing compliant mechanisms arises to use the vast variety of shapes that compliant mechanisms can have. Initial attempts have already been made to use neural networks. This is expected to enable advanced and novel solutions for nanopositioning and nanofabrication. The aim of this project is therefore to develop methods that bypass rigid-body mechanisms and directly generate new compliant mechanisms according to criteria from the field of nanopositioning, nanometrology and nanofabrication.

Key categories:

• compliant mechanisms
• mechanical simulations
• artificial intelligence and neural networks
• manufacturing technology