Kalibrierung eines Wärmestromsensors - Prozess, Einflüsse und die Unsicherheit. - In: Messunsicherheit praxisgerecht bestimmen – Prüfprozesse in der industriellen Praxis 2023, (2023), S. 131-146
https://doi.org/10.51202/9783181024287-131
Unsicherheit bei der Bestimmung der Oberflächentemperatur bei Messungen mit Koordinatenmessgeräten. - In: Messunsicherheit praxisgerecht bestimmen – Prüfprozesse in der industriellen Praxis 2023, (2023), S. 95-108
https://doi.org/10.51202/9783181024287-95
Planck-Erweiterung für hochgenaue Vakuum-Massekomparatoren : ein Konzeptnachweis. - In: Messunsicherheit praxisgerecht bestimmen – Prüfprozesse in der industriellen Praxis 2023, (2023), S. 17-28
Im Rahmen dieser Arbeit wird eine technische Umsetzung zur Bestimmung der Masse nach der neuen Definition des Internationalen Einheitensystems (SI) von 2019 beschrieben. Als Grundlage dient ein handelsüblicher Hochvakuum Prototyp Massekomparator der Firma Sartorius. Mit Massekomparatoren wurden Kilogramm Prototypen, wie das Urkilogram (ℜ), mit anderen Kilogramm Massenormalen direkt verglichen, um eine Kalibrierkette zu realisieren. Nach der Neudefinition des SI im Jahr 2019 ist das Kilogramm über die Planck-Konstante (h) definiert. Die hier vorgestellte Planck-Erweiterung soll es ermöglichen, durch technische Modifikationen und einigen Zusatzkomponenten, Hochvakuum-Massekomparatoren so umzubauen, dass sie Kilogramm Prototypen und Massenormale nach der neuen Definition kalibrieren können. Zusätzlich soll dadurch eine durchgehende Kalibrierung von Massenormalen im Bereich von 1 mg bis 1 kg nach dem E1-Standard der OIML R 111-1 (2004) ermöglicht werden. Gleichzeitig bleiben alle Funktionen der Massekomparatoren erhalten, wodurch es möglich ist Messungen nach der alten und der neuen Massendefinition miteinander zu vergleichen. Im Verlauf dieser Ausarbeitung wird das Funktionsprinzip der Planck-Erweiterung beschrieben. Weiterhin werden Messergebnisse aus ersten Testmessungen mit einer relativen Standardabweichung von 0,65 ppm gezeigt, analysiert und bewertet. Anhand der Erfahrungen mit der ersten Prototyp-Planck-Erweiterung werden Verbesserungsmöglichkeiten und zukünftige Arbeiten vorgeschlagen.
https://doi.org/10.51202/9783181024287-17
Planck extension for high-precision vacuum mass comparators. - Ilmenau : TU Ilmenau, Universitätsbibliothek, ilmedia. - 1 Online-Ressource (Seite 1-10)Final author's version of the article submitted to the following conference: Understanding climate change through metrology : proceedings of the 2023 NCSL International Workshop & Symposium, July 8-12, 2023, Orlando, Florida. - Lafayette, Colorado : NCSL International, 2023
This paper describes a technical implementation for the realization of the kilogram according to the new definition of the International System of Units (SI) of 2019. A commercially available high-vacuum prototype mass comparator from Sartorius serves as the basis. Mass comparators were used to directly compare kilogram prototypes, such as the International Prototype of the Kilogram (IPK or ℜ), with other kilogram prototypes to realize a calibration chain. Since the redefinition of the SI in 2019, the kilogram is defined by Planck's constant (ℎ). The Planck extension presented here is intended to make it possible, through technical modifications and some additional components, to convert high-vacuum mass comparators so that they can calibrate kilogram prototypes and mass standards according to the new definition. In addition, this should allow the continuous calibration of mass standards up to 1 kg in accordance with the E1 standard of OIML R 111-1 (2004). At the same time, all functions of the mass comparators are retained, which makes it possible to compare measurements according to the old and the new mass definition. During this elaboration, the functional principle of the Planck extension is described. Furthermore, measurement results from initial test measurements of 100 g with a relative standard deviation of 0.68 ppm are presented, analyzed, and evaluated. Based on the experience with the first prototype Planck extension, possible improvements and future work are proposed.
https://doi.org/10.22032/dbt.59125
Resolution enhancement in Fabry-Perot interferometers through evaluation of multiple reflection using range-resolved interferometry. - In: Engineering for a changing world, (2023), 1.1.104, S. 1-8
This work presents a novel approach for improving interferometer resolution with a relatively simple setup by combining the use of range-resolved interferometry and a high-finesse Fabry-Perot setup utilizing multiple reflections in the cavity to gradually increase the resolution. This approach could enable the measurement of small displacements with a potentially much higher resolution than current interferometry methods. A simple proof-of concept setup demonstrated the evaluation of up to four Fabry-Perot passes, while theoretically much higher sensitivity improvement factors should be possible.
https://doi.org/10.22032/dbt.58695
Absolute determination of a large mirror surface from spatial gradients using a coordinate measuring machine. - In: Applied Optical Metrology V, (2023), 1267205, S. 1267205-1-1267205-7
This investigation proposes a method for absolute surface determination in a coordinate measuring machine (CMM) with a planar extension of 200 x 200 mm² which is based on the measurement of two spatial gradient fields. The gradient field data was obtained by measuring a test mirror in two equidistant shifted positions along two orthogonal axes while the reference mirror stayed in a steady position. The comparison of experimental data measured in an area of 192 × 192 mm² showed a small root-mean-square deviation of 5.3 nm between the reconstruction result and a regular measurement result. For an a priori estimation of the influence of experimental error sources on the reconstruction deviation, simulations of the measurement process were carried out. Alongside determining the optimal measurement strategy, the focus was investigating positional and orientational deviations of the test surface caused by the shifting motions. While the translational deviations have a subordinate effect, the simulated results show that small orientation deviations around the motion axes cause high reconstruction deviations. To eliminate the motion-induced share of the gradient fields orientation a separation from the topography intrinsic share, which has to remain part of the data, is necessary. This is achieved by the combination of the high-precision design of the mechanical shifting stage and the implementation of an additional boundary condition in the data processing using a least square algorithm.
https://doi.org/10.1117/12.2675734
Investigation on the lithographic process of a high-precision direct laser writing system. - In: Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX, (2023), 126530A, S. 126530A-1-126530A-7
The semiconductor industry is an unbelievable fast-growing field with an exponential growth in the space optimization. But also, other large industrial field are getting smaller in the structure size, for example the field of optics. On the other hand, the customer demands get more and more complex and individual. This leads to an enormous growth potential for micro- and nanofabrication with direct laser writing. Under this circumstance the idea for a micro- and nanostructuring possibility with high precision on large areas was born. A setup was developed to combine a nanopositioning and nanomeasuring machine (NMM-1) with an extremely high precision and a two-photon based illumination system to realize a high-precision direct laser writing system. Besides its high positioning resolution of 0.1 nm and its metrological traceability based on an interferometrical measurement setup, the NMM-1 offers a positioning range of 25 mm x 25 mm x 5 mm. The aim is to design a direct laser writing setup, which enables a trans-scale fabrication without any stitching or combination of different positioning systems necessary. In order to benefit from this high positional accuracy, studies have been made to investigated the two photon absoption process and reduce line widths. The presented research shows investigations, which were made with the developed laser writing setup, to invested illumination dose and the voxel position of the writing laser, in order to improve microstructuring and to reduce structure widths.
https://doi.org/10.1117/12.2677297
Modularer Aufbau für das direkte Laserschreiben für Hochpräzise Nanostrukturierung :
Modular Direct Laser Writing setup for high precision nanostructuring. - In: Technisches Messen, ISSN 2196-7113, Bd. 90 (2023), 11, S. 749-758
The increasing demand for micro- and nanofabrication and in parallel the increasing requirements on feature size and resolution is leading to an enormous growth in the field of multi-photon three-dimensional fabrication. To enable new and diverse investigations in this field and to enable high precision for nanofabrication on large areas, a high precision positioning system is combined with an ultra-short pulse laser system. The aim is a modular setup with constant adherence to the Abbe-comparator principle in order to achieve systematic improvements in the area of Direct Laser Writing. For a high-quality identification of the microstructures a measurement tool based on atomic force microscopy is used. To enable the fabrication of continuous micro- and nanostructures on large area, an extremely high positioning precision is used, where no further stitching methods are necessary. Therefore as base of the Direct Laser Writing system the nanopositioning and nanomeasuring machine (NMM-1) is used, which was developed at Technische Universität Ilmenau together with SIOS Meßtechnik GmbH, with a positioning volume of 25 mm × 25 mm × 5 mm and a positioning resolution in the sub-nanometer range. First investigations already confirmed that microfabrication with a Femtosecond Laser and the NMM-1 could be realized and showed the possibility of further developments in the field of Direct Laser Writing. Now the modular structure as a research platform is designed in such a way that the various extensions and measurement setups for large-scale investigations can always be implemented in a metrologically traceable manner. The presented work shows the development of a modular functional setup of an exposure system and NMM-1, which enables micro- and nanofabrication and an improvement in the structure size over large areas.
https://doi.org/10.1515/teme-2023-0025
Double-pass modulated differential confocal microscopy for closed-loop axial control of direct laser writing. - In: Optical Measurement Systems for Industrial Inspection XIII, (2023), 126180R, S. 126180R-1-126180R-11
Direct laser writing is a popular method for mask-less lithography that already achieved commercial grade. However, it is still challenging to realize homogeneously exposed structures on 3D-shaped substrates. A common source of the variation in exposure is a changing distance of the substrate surface with the photoresist towards the plane of the narrowest waist of the exposure beam. To tackle this issue, we propose a differential confocal probe that employs a spatially modulated pinhole. This phase-modulated lock-in principle enables highly resolved depth sensing without ambiguity about the direction of the deviation from the focal plane. However, the modulation contrast must be high enough to achieve this, which is why the measuring beam passes the pinhole twice. This probe is integrated into the nanopositioning and nanomeasuring machine via a position-based controller. We demonstrate the capability to follow 10◦ inclined substrates.
https://doi.org/10.1117/12.2673874
Development of microinterferometers based with fiber coupling :
Entwicklung von Mikrointerferometern mit Faserkopplung. - In: Technisches Messen, ISSN 2196-7113, Bd. 90 (2023), S. S108-S113
Die Einsatzmöglichkeiten von konventionellen Interferometersystemen sind oft aufgrund ihrer Baugröße eingeschränkt. Weiterhin stellen sie noch immer preisintensive, manuell gefertigte Präzisionsbaugruppen dar. Ihr Einsatz ist daher ökonomisch nur für Nischenanwendungen in der Hochtechnologie gerechtfertigt. Aus diesem Grund wird ein neues kompaktes Mikrointerferometer entwickelt, welches auf dem Michelson-Prinzip basiert. Die gesamte Baugröße dieses Mikrointerferometer beträgt 40 mm x 20 mm x 15 mm. Als Strahlteiler wird eine Strahlteilerplatte verwendet, der nicht auf beiden Seiten parallel ist, sondern einen Keilwinkel hat. Dadurch wird der Interferenzwinkel erzeugt. Außerdem sind beide Seiten mit Polarisationsbeschichtung und Entspiegelungsbeschichtung versehen. Zukünftig können die Beschichtungen auf eine große Platte vorbereitet werden und dann ist eine Massenfertigung für die Strahlteilerplatten möglich, sodass die Herstellungskosten dieser Strahlteilerplatten reduziert werden.
https://doi.org/10.1515/teme-2023-0073