TU Ilmenau/ IPMS

From June 23rd to 26th, we—Johannes Belkner, Jaqueline Stauffenberg, Jiekai Wang, Maximilian Hoffmann, Simon Eisele, and Thomas Kissinger had the pleasure of attending SPIE Optical Metrology 2025 in Munich, Germany. The conference, held in conjunction with Laser World of Photonics, brought together international experts to discuss the latest developments in optical measurement technology.

Our delegation of the Institute of Process measurement and Sensor Technology at TU Ilmenau, was proud to contribute to the conference with five oral presentations—a strong presence that reflects our team’s ongoing commitment to advancing research in optical metrology:

  • Johannes Belkner introduced a phase-modulated differential confocal microscopy method with a compensating algorithm for specimen-induced aberrations.
  • Jaqueline Stauffenberg showcased her work on range-resolved interferometry using retroreflective microspheres for metrological applications.
  • Maximilian Hoffmann discussed an active control technique for the refractive index of air to enhance the performance of optical systems.
  • Jiekai Wang demonstrated a fiber-optic shape sensing approach aimed at motion compensation in vibration-prone optical measurements.
  • Simon Eisele presented a novel concept for a 5D nanopositioning and nanomeasuring machine for the precise fabrication and measurement of complex free-form surfaces.

Beyond the presentations, we engaged in many inspiring conversations with researchers and industry experts from across the globe. We return to Ilmenau with new ideas, valuable feedback, and fresh momentum for future work.