TU Ilmenau


The ZMN offers two important semiconductor thin film deposition technologies for different nanofabrication processes: Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD).

Chemical vapor deposition includes equipment and processes (MOCVD, ICP) in which a substance is deposited from the gas phase on the heated surface of a substrate as a result of a chemical reaction. The ZMN has thermal vaporizers, various PVD cluster systems for electron beam vaporization, sputter etching and magnetron sputtering available in the area of physical vapor deposition. A fully equipped molecular beam epitaxy completes the range of services.