The investigations of well-defined surfaces are carried out in two complex ultra-high vacuum apparatuses used by the department. The most important experimental methods are:
- Ultraviolet Photoelectron Spectroscopy (UPS)
- X-ray Photoelectron Spectroscopy (XPS)
- Auger Electron Spectroscopy (AES)
- Atomic Force Microscopy (AFM)
- Scanning Tunneling Microscopy (STM)
- Quadrupole Mass Spectroscopy (QMS)
- Low Energy Electron Diffraction (LEED)
- Reflection of High Energy Electron Diffraction (RHEED)
- Photoemission Electron Microscopy (PEEM)
- (Plasma Assisted) Molecular Beam Epitaxy ((PA)MBE)
Furthermore the following techniques are used by the department
- modulation spectroscopy:
- Electroreflection (ER) with metal contacts [T > 2K].
- Electroreflection (ER) with electrolyte contact
- photoreflection (PR) [T > 2K]
- Photoluminescence spectroscopy (PL) Excitation: HeCd, Ar-ion, Ti-sapphire laser [T > 2K]
- Photoluminescence excitation spectroscopy (PLE) Excitation: Ti-sapphire laser or monochromator with lamp [T > 2K].
- Photoluminescence mapping spectroscopy for 2" wafers Excitation: HeNe or various semiconductor lasers [T > 10K].
- Spectral ellipsometry from IR to UV range
- Reflectivity from IR to UV range
- Photocurrent measurement [T > 2K]
- One-wavelength ellipsometry for layer thickness determination
- Microscopy station for the determination of µm-dimensions
- Test stand for characterization of solar thermal systems
- Magnetotransport and -optics [B ~ 9.5 T]
