In the second generation of PhD students, the research work from B1 and TP1 on interference optical and SLM based exposure approaches will be continued. To extend the flexibility and applicability for sub-micrometer patterning in large working volumes, the integration of an SLM-based exposure setup into the nanopositioning and nanometrology machine (NPMM) is explored. The goal is large-area exposure taking advantage of the sub-nanometer accurate alignment and stitching accuracy of the equipment. Using the experience from SP1 and the expertise at the Department of Technical Optics, innovative concepts for micro-optical system integration with optimized numerical algorithms and optical system designs have to be developed for this purpose.
Project leader: Prof. Sinzinger, Prof. Theska