Sub-project B

In the second generation of PhD students, the research work from B1 and TP1 on interference optical and SLM based exposure approaches will be continued. To extend the flexibility and applicability for sub-micrometer patterning in large working volumes, the integration of an SLM-based exposure setup into the nanopositioning and nanometrology machine (NPMM) is explored. The goal is large-area exposure taking advantage of the sub-nanometer accurate alignment and stitching accuracy of the equipment. Using the experience from SP1 and the expertise at the Department of Technical Optics, innovative concepts for micro-optical system integration with optimized numerical algorithms and optical system designs have to be developed for this purpose.

Project leader: Prof. Sinzinger, Prof. Theska

The work in continuation project B2 pursues the goal of bringing the structuring precision of laser writing in the NPM machine of 2PP processes into the sub-10 nm range and demonstrating ridge widths significantly smaller than 10 nm at 25 mm line length (theoretically, even 1 nm ridge widths seem feasible). Better understanding and thus targeting the "memory for sub-threshold exposures" represents a highly charged area of investigation. Finally, increasing the writing speed (at high web precision) and thus optimizing the dynamics of the writing process is an important goal of the project.

Project leader: Prof. Manske, Prof. Reinhardt