Konferenzschriften (Kongressbeiträge, Tagungsbeiträge-Abstracts)

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Krüger, Jan; Manley, Phillip; Bergmann, Detlef; Köning, Rainer; Bodermann, Bernd; Eder, Christian; Heinrich, Andreas; Schneider, Philipp-Immanuel; Hammerschmidt, Martin; Zschiedrich, Lin; Manske, Eberhard
Introduction and application of a new approach for model-based optical bidirectional measurements. - In: Measurement science and technology, ISSN 1361-6501, Bd. 35 (2024), 8, 085014, S. 1-10

Accurate measurements of micro- and nanoscale features in optical microscopy demand comprehensive modelling approaches. In this study, we introduce an enhanced evaluation method, utilizing rigorous simulations based on a finite element method algorithm within an advanced Bayesian optimization framework. We provide an in-depth explanation of the measurement process, including the dimension reduction techniques applied to the acquired measurement data. Additionally, we employ Hopkins’ approximation or also referred to as local Hopkins’ methods for an efficient microscopic image simulation, resulting in a significant reduction of the computing time. We applied this method to measure the linewidths of six different chrome lines, nominally 300 nm-1000 nm wide, on a glass substrate. Our results show an excellent agreement with previous investigations conducted using various measurement systems, including atomic force microscopy, scanning electron microscopy, and optical microscopy in combination with different measurement evaluation techniques.

Stauffenberg, Jaqueline; Belkner, Johannes; Dontsov, Denis; Herzog, Ludwig; Hesse, Steffen; Rangelow, Ivo W.; Ortlepp, Ingo; Kissinger, Thomas; Manske, Eberhard
Investigations on tip-based large area nanofabrication and nanometrology using a planar nanopositioning machine (NFM-100). - In: Measurement science and technology, ISSN 1361-6501, Bd. 35 (2024), 8, 085011, S. 1-14

This paper explores large area application of tip-based nanofabrication by field emission scanning probe lithography and showcases the simultaneous possibility of atomic force microscopy on macroscopic scales. This is made possible by the combination of tip-based technology and a planar nanopositioning and nanomeasuring machine. Using long range atomic force microscopy measurement of regular grating structures, the performance of the machine is thoroughly characterized over the full 100 mm range of motion of the positioning machine, which was confirmed by repeated measurements. After initially focussing on achieving the minimum line width of 40 nm in microscopic areas, a grating with a pitch of 1 μm is additionally fabricated over a total length of 10 mm, whereby the dimensions and deviations are also considered.

Ortlepp, Ingo;
High-precision nanopositioning and nanomeasuring machines for alternative nanofabrication. - In: Novel Patterning Technologies 2024, (2024), 129560D, S. 129560D-1-129560D-17

For two decades, the Technische Universität Ilmenau has been developing high precision Nanopositioning and Nanomeasuring machines (NPMMs). These have proven their potential for nanometer accurate measurements in large volumes up to 200mm x 200mm x 25mm with 5 axis operation in several fields. As these machines operate according to the highest standards of metrology, offer picometer resolution and nanometer uncertainty, the goal is to transfer their unique precision to fabrication and patterning. So far, the NPMMs have been equipped with laser-based as well as tip-based patterning tools, including one photon and two photon polymerization, nanoimprint, scanning probe lithography and combinations of these technologies. The goal is basic research on these technologies, to tackle the evident challenges and explore the concealed limits to estimate the potential for later use in an industrial scale. In this paper, the specifics and advantages of the NPMMs will be described as well as the micro- and nanofabrication tools that are currently worked on. Focus is on the parameters in measurement mode and the accomplished fabrication results.

Jahn, Hannes; Fröhlich, Thomas; Zentner, Lena
Analytical description of transversally symmetric hinges with semicircular contours. - In: Advances in mechanism and machine science, (2024), S. 502-509

Compliant mechanisms are becoming increasingly important, especially in force measurement and weighing technology, due to their zero backlash, wear resistance, and zero friction. Their deformation under external forces can be analyzed well with analytical calculations and FEM simulations. Analytically, only mechanisms with symmetrical and longitudinally symmetrical hinges are described. This paper presents a method that allows transversally symmetric hinges to be described analytically. The model must be computed numerically due to the built neutral fiber and the nonlinearities in the used calculation method. The developed method is then compared with FEM calculations in a parameter study and considered to be validated. Finally, outlooks are formulated on how the created method can for instance be used to develop load cells for later calculations. Moreover, it is shown to what extent it is possible to implement this method for general calculations of compliant mechanisms.

Rogge, Norbert; Dannberg, Oliver; Kühnel, Michael; Fröhlich, Thomas
A novel EMFC tiltmeter with extended measurement range. - In: 24th IMEKO TC3 International Conference on Measurement of Force, Mass and Torque 2022, (2023), S. 252-257

This work presents a new tiltmeter that utilises the principle of electromagnetic force compensation (EMFC) in order to increase its measurement range and measurement dynamics compared to an uncompensated pendulum tiltmeter. The development included investigations on the design of the pendulum mechanics, the position sensor and the actuators. With the chosen parameters a resolution of 1 μrad in a measurement range of 20 mrad can be achieved currently on a short-term timescale.

Cherkasova, Valeriya; Fröhlich, Thomas
Capacitive calibration capabilities in an EMFC balance. - In: 24th IMEKO TC3 International Conference on Measurement of Force, Mass and Torque 2022, (2023), S. 236-241

The article describes the possibilities of calibrating the force constant in an electromagnetic force compensation (EMFC) load cell using the electrostatic force compensation principle. The static and dynamic principles of calibration of the Kibble balance for the electrostatic force constant, as well as calibration by means of compensation of the electrostatic force by the electromagnetic force, are considered. The combination of the two compensation principles in the load cell allows the measurement of forces in the range of 20 pN to 2.2 mN and ensures traceability to national standards. The relative uncertainty in the measurement of forces of about 100 nN is estimated to be about 0.001.

Pabst, Markus; Fröhlich, Thomas
Centre of gravity measuring device. - In: 24th IMEKO TC3 International Conference on Measurement of Force, Mass and Torque 2022, (2023), S. 138-143

This paper describes a new method to measure the height of the centre of gravity of high-sensitive mass artefacts. A measuring device is presented and tested with mass samples of various shapes and densities. The results of the measurements are compared to the geometrical estimated heights of the centre of gravity and further developments of the new instrument are presented.

Darnieder, Maximilian; Wittke, Martin; Pabst, Markus; Fröhlich, Thomas; Theska, René
Monolithic compliant mechanism for an EMFC mass comparator weighing cell. - In: Engineering for a changing world, (2023), 1.4.112, S. 1-14

Mass comparator weighing cells based on electromagnetic force compensation (EMFC) find application in the most demanding force and mass measurement applications. The centerpiece of these devices is a highly sensitive compliant mechanism with thin flexure hinges. The compliant mechanism forms the mechanical part of the mechatronic overall system. A novel mechanism based on an advanced adjustment concept has been developed, manufactured, and experimentally investigated. The adjustment is designed to further reduce the measurement uncertainty for mass comparisons by canceling out first-order error components. The focus is on the mechanical properties: stiffness, tilt sensitivity, and off-center load sensitivity. The elastic stiffness of the compliant mechanism is compensated by introducing a negative gravitational stiffness to enable the compensation of manufacturing deviations and to increase mass resolution.

Marin, Sebastian; Augustin, Silke; Hein, Georg; Fröhlich, Thomas
Uncertainty of temperature measurement on road samples :
Unsicherheit der Temperaturmessung an Fahrbahnproben. - In: Messunsicherheit praxisgerecht bestimmen – Prüfprozesse in der industriellen Praxis 2023, (2023), S. 221-236

Beerel, Joseph; Bartz, Frederik; Fröhlich, Thomas
Messunsicherheit einer Kalibriereinrichtung für Wärmestromsensoren - Unsicherheit der Temperaturdifferenz. - In: Messunsicherheit praxisgerecht bestimmen – Prüfprozesse in der industriellen Praxis 2023, (2023), S. 147-160