Vorstellung des Konzepts eines keramischen Wärmestromsensors. - In: Sensoren und Messsysteme, (2022), S. 336-340
Amplituden- und Phasenmodulation in der Lock-In-gefilterten differentiellen konfokalen Profilometrie. - In: Sensoren und Messsysteme, (2022), S. 235-244
Nanopositionier- und Nanomessmaschinen - Herausforderungen bei der Visualisierung großer Messvolumina mit Übersichtsbildern im Gigapixel-Bereich. - In: Sensoren und Messsysteme, (2022), S. 224-234
Die Orientierung im Messvolumen von Nanopositionier- und Nanomessmaschinen mit großen Messbereichen (z.B. NPMM200 mit 200x200x25 mm Messbereich) ist speziell bei unbekannten Proben anspruchsvoll. Ein grobes Scannen mit AFM- oder Laserfokus-Sensoren (z.B. mit einem Pixelabstand von ca. 500 nm) ist extrem zeitaufwendig. Verwendet man zum Erstellen eines 3D-Übersichtsbildes Mikroskope und Kameras, kann in überschaubarer Zeit ein 3D-Abbild des Messobjektes erstellt werden. Durch eine Konvertierung in spezielle Datenformate ist eine nahezu verzögerungsfreie Navigation innerhalb der Grenzen des Messobjektes möglich. Die Herausforderungen und Probleme bei der Entwicklung derartiger Software bzgl. Rechnerarchitekturen, Datenspeicherung und Parallelisierung werden in dieser Abhandlung näher untersucht.
Prüfstand für temperatursensitive Farben und grundlegende Untersuchung von Oberflächentemperaturen. - In: Sensoren und Messsysteme, (2022), S. 39-43
Neuerscheinung der VDI-Richtlinie 3520 "Oberflächentemperaturmessung mit elektrischen Berührungsthermometern" - Inhalte und Hintergründe der Erarbeitung. - In: Sensoren und Messsysteme, (2022), S. 34-38
Nanofabrication and -metrology by using the nanofabrication machine (NFM-100). - In: Novel Patterning Technologies 2022, (2022), 120540A, S. 120540A-1-120540A-12
The feature dimensions of integrated circuits are becoming smaller and the fabrication, metrology and inspection is becoming harder to be fulfilled. Fast-writing of long respectively large nano-features with Scanning-ProbeLithography and their inspection with an Atomic Force Microscope (AFM) is a challenge, for the accomplishment of which the Nanofabrication Machine (NFM-100) can serve as a beneficial experimental platform for basic research in the field of scale-spanning nanomeasuring and nanofabrication. The NFM-100 has an integrated tipbased system, which can be used as an AFM as well as for Field-Emission Scanning Probe Lithography (FESPL). The combination of both systems offers the possibility to fabricate and analyze micro- and nanostructures with high resolution and precision down to a single nanometre over a large area of 100 mm in diameter in a single configuration without tool or sensor change. Thus, in contrast to conventional optical inspection and alignment systems, the NFM-100 offers the potential for full lithographic and metrological automation. For FESPL, the implemented active probes enable an in-situ inspection capability, a quantitative mapping at unprecedented resolution, as well as an integrated overlay alignment system. In this paper, the basic set-up of the NFM-100 as well as the capability of the system for long range AFM scans and FESPL is demonstrated.
https://doi.org/10.1117/12.2615118
Einfluss von Formabweichungen auf die Radius und Rundheitsmessung von Mikrokugeln :
Influence of form deviations on the radius and roundness measurement of micro spheres. - In: Technisches Messen, ISSN 2196-7113, Bd. 89 (2022), 10, S. 704-713
Micro and nano coordinate measuring machines (CMMs) require small and well characterized micro spheres as probing elements. However, established strategies and instruments have mostly been designed for and applied to the characterization of larger spheres in the range of millimetres or above. That is why we have recently focused our attention towards a novel strategy which is based on a set of atomic force microscope (AFM) surface scans in conjunction with a stitching algorithm. Initial experimental results are promising, but point to several influences which require further attention. We have, therefore, begun to model the measurement strategy and applied it on simulated spheres, in order to investigate and reduce some of these influences. The model is currently limited to effects which are related to the radius and form of the sphere. Other influences, like the AFM tip, are being ignored. In this paper, we introduce the essential parts of this model and apply it on spheres of different mean radii (60 µm, 100 µm and 150 µm) and of different qualities (Grade 3 and Grade 5). The investigations illustrate that the measurement object can have a significant influence on the measurement result and needs to be considered.
https://doi.org/10.1515/teme-2022-0007
Metrologische Nanopositionierung kombiniert mit Zwei-Photonen-Laserdirektschreiben :
Metrological nanopositioning combined with two-photon direct laser writing. - In: Technisches Messen, ISSN 2196-7113, Bd. 89 (2022), 7/8, S. 507-514
The extension of nanopositioning and nanomeasuring machines (NPM-machines) to fabrication machines by using a femtosecond laser for the implementation of direct laser writing by means of two-photon absorption (2PA) is a promising approach for cross-scale metrological fabrication in the field of lithographic techniques [24]. To this end, a concept for integrating two-photon technology into an NPM machine was developed and implemented, followed by a characterization of the system and targeted investigations to provide evidence for the synergy of the two techniques. On this basis, a new approach to high-throughput micro- and nano-fabrication was developed and investigated, demonstrating new possibilities in cross-scale, high-precision manufacturing [6]. This mix-and-match approach is based on a combination of 2PA laser writing with field emission lithography to fabricate masters for subsequent nanoimprint lithography. Not only the advantages of the large positioning range of the NMM-1 could be highlighted, but also the advantages resulting from the highly accurate positioning. A systematic reduction of the distance between two adjacent lines resulted in a minimum photoresist width of less than [Math Processing Error] [16], which can be classified among the smallest distances between two laser-written lines described in the literature [4], [10], [20]. The center-to-center distance of the lines of about [Math Processing Error] at a numerical aperture of 0.16 and a wavelength of 801 nm is only about [Math Processing Error] of the Rayleigh diffraction limit extended for the two-photon process. Thus, for the first time, a resist width far below the diffraction limit could be realized with conventional two-photon laser writing in positive photoresist.
https://doi.org/10.1515/teme-2021-0127
Modifications to a high-precision direct laser writing setup to improve its laser microfabrication. - In: Laser-Based Micro- and Nanoprocessing XVI, (2022), 119890U, S. 119890U-1-119890U-7
Two-photon-absorption (2PA) techniques enables the possibility to create extremely fine structures in photosensitive materials. For direct laser writing as micro- or nanofabrication a laser system can be combined with highly precise positioning systems. These are mostly limited by a few hundreds micrometer positioning range with applications based on piezoelectric stages or even just relatively few tens micrometer positioning range with applications based on galvanometer scanners. Although these techniques are precise, but stitching methods are required for larger fabrication areas. Therefore, a setup consisting of a femtosecond laser for 2PA and a nanopositioning and nanomeasuring machine (NMM-1) was developed for high precision laser writing on lager surfaces. Further developments of the system should enable a significant improvement in high-precision and stitching free direct laser writing. In order to combine the the femtosecond laser and the NMM-1 into a functional unit, to write complex structures with highest accuracy and homogeneity, further improvements like a beam expansion for a better use of the numerical aperture of the objective and a new femtosecond laser with a integrated power measurement are realized. This showed improvements in line width for nano strucuring. Advantages and disadvantages as well as further developments of the NMM-1 system will be discussed related to current developments in the laser beam and nanopositioning system optimization.
https://doi.org/10.1117/12.2609417
Nanoscale surface morphology modulation of graphene - i-SiC heterostructures. - In: Materials today, ISSN 2214-7853, Bd. 53 (2022), 2, S. 289-292
A multitude gratings design consists of gratings with different pitches ranging from the micrometre down to sub 40 nm scale combined with sub 10 nm step heights modulating the surface morphology for length scale measurements is proposed. The surface morphology modulation was performed using electron beam lithography incorporating a standard semiconductor processing technology. The critical dimension, edge roughness, step heights and line morphology in dependence on the grating pitch is studied.
https://doi.org/10.1016/j.matpr.2021.06.427