GRK 2182: Part A3 "Design Fundamentals for Nanofabrication Systems"

Prof. R. Theska
Prof. L. Zentner

In sub-project A3, the second-generation PhD student will be devoted to implementing new design fundamentals needed to realize linear positioning systems with previously unattainable resolution in the picometer range. Combining compliant mechanisms with electrostatic drive systems is the most viable approach to create the prerequisites for the next generations of nanopositioning and fabrication systems. A planar, monolithic, silicon-based structure is specifically micro-engineered to meet the very high demands on the mechanical and electrical properties of the new nanopositioning and fabrication systems, which can then operate at maximum repeatability without backlash and free of friction.
Since understanding and predicting the behavior of compliant mechanisms is of the essence in target-oriented applications, their static and dynamic behavior is first determined using models. To obtain the accurate and speedy state-based behavioral predictions needed to better control compliant mechanisms, model-based analyses as well as numerical and experimental investigations are developed and applied.

In a first step, suitable structural variants of mechanisms and drive concepts are to be modeled and designed. In a second step, a comparison of variants is to be carried out, from which a preferred variant will emerge. In step three, the selected actuator system is to be further optimized on the basis of a model and then designed. This will be based on the assumption that the system will be manufactured on the basis of silicon-based MEMS. In particular, the kinematic behavior, the travel, the spring stiffnesses and the transverse sensitivities are to be optimized, and an uncertainty analysis is also to be carried out. In further steps, the actuator system will be manufactured and a suitable measurement setup will be designed. Finally, quantitative metrological investigations are carried out to verify the desired parameters and properties. Based on this, approaches for further optimization will be designed. The knowledge gained is to be transferred into design guidelines in order to increase the efficiency of the methodical approach in subsequent work.

TU Ilmenau - Compliant Systems Group
TU Ilmenau - Institute of Process Measurement and Sensor Technology
TU Ilmenau - Precision Engineering Group
TU Ilmenau - Micro- and Nanoelectronic Systems Group
TU Ilmenau - Microsystems Technology Group
TU Ilmenau - Control Engineering Group
TU Ilmenau - Optical Engineering Group

(... to Research Training Group NanoFab)

01.04.2017 - ...

DFG - German Research Foundation; Project: https://gepris.dfg.de/gepris/projekt/274711337
DFG Reference: GRK 2182/2 - 2021