Microsystems Technology Group Am Helmholtzring 12 (Werner-Bischoff-Bau room 3110) 98693 Ilmenau
Phone: +49 3677 69-2485 Fax: +49 3677 69-1801
The most important goal of the 2nd generation is the realization of precisely positioned nanostructures by exploiting the NMP technique and NIL. A cross-scale implementation of NIL with highest precision will be carried out using the example of probes for highly local (bio)-sensing by means of surface-enhanced Raman spectroscopy. Here, metallic structures have to be generated highly locally and with precisely defined spacing of a few nanometers. It will be investigated to what extent miniaturized stamps, a highly local exposure, "mix-and-match" strategies and the precision of the NMP technique can be used for large-area and reproducible NIL nanostructuring.
Project leader: Prof. Strehle, Prof. Sinzinger
The goal of the second generation is to even better combine highly localized and highly dynamic laser writing processes with the NPM technique, both in the plane and on curved surfaces. For this purpose, the second generation includes the implementation of a differential chromatic approach based on a high-frequency oscillating micromechanical pinhole using Lockin technology as a confocal sensor. Minimal structures are to be fabricated through a combination of improved laser beam focusing and a better understanding of the resist chemistry, which apparently allows patterning well below the Rayleigh criterion. Finally, nanometer-precision writing on large areas (25 mm x 25 mm) at high speeds will be demonstrated.