Konferenzbeiträge

Manske, Eberhard; Baitinger, Henner; Mastylo, Rostyslav; Doroshovets, Nataliya; Sinzinger, Stefan; Jäger, Gerd
Investigations for the improvement of optical edge detection with a laser focus probe. - In: Portrait - Faculty of Mechanical Engineering, (2008), insges. 4 S.
Publ. entstand im Rahmen der Veranst.: ICPM 2008

Sinzinger, Stefan; Amberg, Martin; Oeder, Andreas
Integrated micro-opto-fluidic systems for optical manipulation of cell cultures. - In: 4. Workshop "Chemische und biologische Mikrolabortechnik", (2008), insges. 2 S.

Wippermann, Frank C.; Dannberg, Peter; Bräuer, Andreas; Sinzinger, Stefan
Improved homogenization of fly's eye condenser setups under coherent illumination using chirped microlens arrays. - In: MOEMS and miniaturized systems VI, ISBN 978-0-8194-6579-5, 2007, 64660R, insges. 9 S.

Oeder, Andreas; Amberg, Martin; Hands, Phil J. W.; Love, Gordon D.; Sinzinger, Stefan
Adaptive planar integrierte Freiraum-optische Systeme. - In: DGaO-Proceedings, ISSN 1614-8436, Bd. 108.2007, B20, insges. 2 S.

Planar integrierte Freiraum-optische Systeme sind für eine Vielzahl an Anwendungen sehr gut geeignet. Dazu gehören die optische Verbindungstechik und Sicherheitsanwendungen. Durch die Integration adaptiver Flüssigkristallelemente (LC-Elemente) können wir hier zum ersten Mal dynamische Funktionen in solchen mikrooptischen Systemen demonstrieren.

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Hoffmann, Meike; Stoebenau, Sebastian; Teschke, Marcel; Sinzinger, Stefan
Holographic lithography for continuous-relief diffractive optical elements. - In: Information technology and electrical engineering - devices and systems, materials and technologies for the future, (2006), insges. 9 S.

Diffractive optical elements (DOE) offer new design flexibility for classical optics as well as for integrated microoptical systems. As the efficiency of those elements increases with the number of phase levels, the fabrication of elements with multiple phase levels or continuous profiles is necessary. The fabrication of multilevel diffractive structures requires multi-mask processing with several exposure-development-etching steps. In this case significant effort is necessary to align the masks accurately. - Alternatively grey-scale illumination can be applied for the fabrication of continuous phase profile elements. This is for example possible in holographic lithography through interferometric illumination. In this maskless approach the superposition of at least two coherent wavefronts (object and reference) leads to an intensity pattern which is used for the illumination of a photoresist layer. Thus the continuous phase profiles can be fabricated with a single exposure. - For this technique two main challenges have to be solved, i.e. the generation of arbitrary illumination patterns and their transfer into physical profiles. In holographic lithography the illumination pattern depends on the object wavefront which for arbitrary distributions can be generated e.g. by computer generated holograms (CGH). After illumination of the photoresist with such a grey-scale intensity pattern the resist processing has to be controlled precisely to generate analog profiles. The response of the resist to exposure depends on a variety of parameters such as the exposure wavelength, energy regime and the resist processing (temperature range, prebake, development conditions etc.). For applications in holographic lithography a linear response is desired. - We present the methods necessary for analyzing a resist-developer system with respect to its suitability for continuous-relief structures. Based on our results concerning the resist SX AR-P 3500/6, Allresist GmbHъ we show the fabrication of first components like sinusoidal phase gratings and Fresnel zone lenses.

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