This project targets the parallelization and fast position control of beams in an optical lithography process by means of optical beam shaping and beam steering elements with freely selectable 3D beam distribution. This shall allow to write different structures simultaneously at different positions and depths of the sample and a fast local dose control. To meet metrological requirements, the positions of the writing beams must be actively controlled. In addition, efficient writing strategies have to be developed to fully exploit the potential of the new approach. The achieved performance should be demonstrated in suitable example applications within the scope of NanoFab. Key categories: - optics / optical lithography
- nanometrology
- control engineering
- resist technology
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