Microsystems Technology Group Am Helmholtzring 12 (Werner-Bischoff-Bau room 3110) 98693 Ilmenau
Phone: +49 3677 69-2485 Fax: +49 3677 69-1801
In the second phase, research will focus on the potential of optimizing 3D micro- and nanostructures with optimized etch/development processes and strategies. To this end, the fundamental understanding of plasma-based etching processes will be extended. Suitable processes will be optimized and used for the targeted realization of three-dimensional microstructures with adapted morphology. In combination with targeted e.g. thermal treatment, micro- and nanostructured 3D surfaces of outstanding quality are realized in this way.