Nanoimprint lithography (NIL) has a great potential for economic mass production of nanostructures and makes other fabrication technologies economically viable by means of "mix-and-match" lithography. However, there is a need for positioning and angular control of the NIL stamp and the measurement of the contact pressure to ensure uniform imprint results. In this project, new approaches to record and control position, angle and forces over the entire imprint process, e.g. by fibre-coupled interferometers are to be investigated. Additionally, changes in the stamp morphology shall be as well recorded and corrected within the printing process and yield finally an increased reproducibility of NIL nanofabrication that should be demonstrated for selected exemplary applications.
- nanoimprint lithography
- fibre optic interferometry
- micro- and nanofabrication
- mechanical and optical simulations