Konferenzbeiträge ab 2018

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Schwind, Andreas; Berlt, Philipp; Lorenz, Mario; Schneider, Christian; Hein, Matthias
Implementation of a MIMO channel emulator for over-the-air LTE testing using software defined radio. - In: Riding the green waves, (2018), S. 307-310

https://doi.org/10.23919/GEMIC.2018.8335091
Silva Cortes, Victor; Stehr, Uwe; Stegner, Johannes; Nowak, Jacek; Hein, Matthias; Sommer, Ralf; Fischer, Georg; Hagelauer, Amelie
Multiphysical design methodology for the heterogeneous integration of an RF receiver. - In: Riding the green waves, (2018), S. 67-70

https://doi.org/10.23919/GEMIC.2018.8335030
Loracher, Stefanie; Blau, Kurt; Stehr, Uwe; Hein, Matthias
An electronically tuneable inductance with extended frequency range. - In: Riding the green waves, (2018), S. 172-175

https://doi.org/10.23919/GEMIC.2018.8335057
Berthold, Theresa; Katzer, Simeon; Rombach, Julius; Krischok, Stefan; Bierwagen, Oliver; Himmerlich, Marcel
Towards understanding the cross-sensitivity of In2O3 based ozone sensors: effects of O3, O2 and H2O adsorption at In2O3(111) surfaces. - In: Physica status solidi, ISSN 1521-3951, Volume 255 (2018), issue 4, 1700324, Seite 1-8
Im Titel sind "2" und "3" tiefgestellt

https://doi.org/10.1002/pssb.201700324
Stegner, Johannes; Fischer, Michael; Gropp, Sebastian; Stehr, Uwe; Müller, Jens; Hoffmann, Martin; Hein, Matthias
Design and implementation of a MEMS-based RF oscillator on a unique silicon-ceramic composite substrate. - In: Riding the green waves, (2018), S. 71-74

https://doi.org/10.23919/GEMIC.2018.8335031
Rangelow, Ivo W.; Lenk, Claudia; Hofmann, Martin; Lenk, Steve; Ivanov, Tzvetan; Ahmad, Ahmad; Kästner, Marcus; Guliyev, Elshad; Reuter, Christoph; Budden, Matthias; Zöllner, Jens-Peter; Holz, Mathias; Reum, Alexander; Durrani, Zahid; Jones, Mervyn; Aydogan, Cemal; Bicer, Mahmut; Alaca, B. Erdem; Kühnel, Michael; Fröhlich, Thomas; Füßl, Roland; Manske, Eberhard
Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions. - In: Novel Patterning Technologies 2018, (2018), 1058406, 13 Seiten

https://doi.org/10.1117/12.2299955
Fischer, Robert; Bichra, Mohamed; Straube, Anja; Stubenrauch, Mike; Sinzinger, Stefan; Witte, Hartmut
Adaptable, automated platform for miniaturized cell cultivation experiments including Fourier-optical analytics. - In: Basic & clinical pharmacology & toxicology, ISSN 1742-7843, Bd. 122 (2018), Supplement S1, ICBB17-13, Seite 6-7

https://doi.org/10.1111/bcpt.12952
Rangelow, Ivo W.; Lenk, Claudia; Hofmann, Martin; Ivanov, Tzvetan; Lenk, Steve; Guliyev, Elshad; Kästner, Marcus; Aydogan, Cemal; Bicer, Mahmut; Alaca, B. Erdem; Ates, Onur; Torun, Hamdi; Yalcinkaya, Arda D.; Ahmad, Ahmad; Reum, Alexander; Holz, Mathias
Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices. - In: Nanophotonics Australasia 2017, (2018), S. 1045621, insges. 10 S.

https://doi.org/10.1117/12.2282606
Osten, Wolfgang; Haist, Tobias; Manske, Eberhard
How to drive an optical measurement system to outstanding performance?. - In: Ultra-High-Definition Imaging Systems, (2018), 105570Q, insges. 15 S.

In the context of measurement technology, optical methods have a number of unique features. These features include in particular the non-contact and high speed interaction with the object under test, the largely free scalability of the dimension of the probing tool, the high resolution of the data, the diversity of information channels in the light field, and the flexible adaptability of the comparative standard - the wavelength. On the other hand the user is confronted with a number of serious challenges. Two of the biggest challenges that currently attract high attention in both the technical as well as life sciences, relate to exceeding the physical limits of resolution and to improve the precision of the measurement. Therefore optical measurement methods are subject to constant improvement. The characteristics that give rise to improve the performance of the systems are obviously dependent on the purpose of the measurement and the object under test. But there are also general features that can be used to assess the performance of a measurement system. Here we refer to the spatial and temporal resolution, the area related resolution, the precision and trueness of the results, the robustness, the degree of automation, the process capability and the ability to work as close as possible to the process. In this contribution we describe the current challenges for measurement systems. Based on this we discuss general and application dependent features for the assessment of modern optical measurement systems. Afterwards, we describe measures to assess and to improve their performance. Finally, we show an advanced optical measurement system where several of these features were considered with regard to ensuring a high performance.



https://doi.org/10.1117/12.2300856
Mohr-Weidenfeller, Laura; Schienbein, Ralf; Kirchner, Johannes; Reinhardt, Carsten; Manske, Eberhard
Development of laser positioning system of high accuracy in the nanometer range. - In: Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI, (2018), 105440E, insges. 7 S.

Direct Laser Writing techniques like two-photon-polymerization or UV-lithography have become common tools for the micro- and nanofabrication of precise devices like photonic crystals. A decrease in the size of structures of special devices requires a significant better resolution of the laser beam system that can be determined by using different photoinitiators or a second depletion laser for STED-lithography. However, besides the optical limits for the resolution of the laser system due to diffraction effects, the positioning systems for the laser beam or the sample stage lead to further imprecisenesses. To benefit from the high resolution techniques for the structuring process, the need for highly accurate positioning systems has dramatically grown during the last years. A combination of lithographic techniques with a nanopositioning and nanomeasuring machine NMM-1, developed at the TU Ilmenau, enables high precision structuring capability in an extended range. The large positioning volume of 25mm x 25mm x 5mm with a resolution in the sub-nanometer range is a good condition for ultra precision manufacturing with large area 3D-Laser-Lithography. Advantages and disadvantages as well as further developments of the NMM-1 system will be discussed related to current developments in the laser beam and nanopositioning system optimization. Part of the further development is an analysis of the implementability of additional ultra precise rotational systems in the NMM-1 for the unlimited addressability perpendicular to the surface of a hemisphere as key strategy for multiaxial nanopositioning and nanofabrication systems.



https://doi.org/10.1117/12.2312704