Meinhardt, Jürgen;
Entwicklung nanostrukturierter Kohlenstoff-Fluor-Plasmapolymerschichten für Mikrosysteme. - Getr. Zählung Ilmenau : Techn. Univ., Habil.-Schr., 2011
Entwicklung nanostrukturierter Kohlenstoff-Fluor-Plasmapolymerschichten für Mikrosysteme. - Getr. Zählung Ilmenau : Techn. Univ., Habil.-Schr., 2011
Hotový, Ivan; Kups, Thomas; Hotový, Juraj; Liday, Jozef; Búc, Dalibor; Čaplovičová, Mária; Reháček, Vlastimil; Sitter, Helmut; Simbrunner, Clemens; Bonnani, Alberta; Spieß, Lothar
Structural evolution of sputtered indium oxide thin films. - In: Journal of electrical engineering, ISSN 1339-309X, Bd. 61 (2010), 6, S. 382-385
https://doi.org/10.2478/v10187-010-0059-7
Structural evolution of sputtered indium oxide thin films. - In: Journal of electrical engineering, ISSN 1339-309X, Bd. 61 (2010), 6, S. 382-385
https://doi.org/10.2478/v10187-010-0059-7
Skriniarov`a, J.; Novotn`y, I.; Tonisch, Katja; Schaaf, Peter
UV-source assisted GaN wet etching. - In: Programme and book of abstracts, ISBN 978-80-7399969-8, (2010), S. 61
UV-source assisted GaN wet etching. - In: Programme and book of abstracts, ISBN 978-80-7399969-8, (2010), S. 61
Grosser, Michaela; Münch, M.; Brenner, J.; Wilke, Marcus; Seidel, H.; Bienert, C.; Roosen, A.; Schmid, U.
Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering. - In: Microsystem technologies, ISSN 1432-1858, Bd. 16 (2010), 5, S. 825-836
http://dx.doi.org/10.1007/s00542-009-0993-0
Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering. - In: Microsystem technologies, ISSN 1432-1858, Bd. 16 (2010), 5, S. 825-836
http://dx.doi.org/10.1007/s00542-009-0993-0
Schaaf, Peter; Günschmann, Sabine; Hopfeld, Marcus; Wilden, Johannes; Drescher, Viktor; Borschel, Christian; Ronning, Carsten
Self-organized nanostructuring of composite coatings at high temperatures for drag reduction and self-cleaning. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 205 (2010), 5, S. 1584-1588
https://doi.org/10.1016/j.surfcoat.2010.10.012
Self-organized nanostructuring of composite coatings at high temperatures for drag reduction and self-cleaning. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 205 (2010), 5, S. 1584-1588
https://doi.org/10.1016/j.surfcoat.2010.10.012
Carpene, Ettore; Höche, Daniel; Schaaf, Peter
Fundamentals of laser-material interactions. - In: Laser processing of materials, (2010), S. 21-44
Fundamentals of laser-material interactions. - In: Laser processing of materials, (2010), S. 21-44
Kups, Thomas;
Crystalline calibration standard for NPM : the use of well known lattice plane distances. - In: Imaging & microscopy, ISSN 1439-4243, Bd. 12 (2010), 2, S. 38-39
Crystalline calibration standard for NPM : the use of well known lattice plane distances. - In: Imaging & microscopy, ISSN 1439-4243, Bd. 12 (2010), 2, S. 38-39
Kosc, Ivan; Hotovy, Ivan; Kompitsas, Michael; Grieseler, Rolf; Wilke, Marcus; Rehacek, Vlastimil; Predanocy, Martin; Kups, Thomas; Spieß, Lothar
The compound oxides based on TiO2 and NiO thin films for low temperature gas detection. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, ISBN 978-1-4244-8572-7, (2010), S. 337-340
http://dx.doi.org/10.1109/ASDAM.2010.5666355
The compound oxides based on TiO2 and NiO thin films for low temperature gas detection. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, ISBN 978-1-4244-8572-7, (2010), S. 337-340
http://dx.doi.org/10.1109/ASDAM.2010.5666355
Predanocy, Martin; Fasaki, I.; Wilke, Marcus; Hotovy, Ivan; Kosc, Ivan; Spieß, Lothar
Study of optical and electrical properties of sputtered indium oxide films. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, ISBN 978-1-4244-8572-7, (2010), S. 297-300
http://dx.doi.org/10.1109/ASDAM.2010.5667003
Study of optical and electrical properties of sputtered indium oxide films. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, ISBN 978-1-4244-8572-7, (2010), S. 297-300
http://dx.doi.org/10.1109/ASDAM.2010.5667003